Patents by Inventor Atsushi Hidaka

Atsushi Hidaka has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200199753
    Abstract: In order to appropriately control temperatures of fluid heating sections that are maintained at different temperatures, the fluid control device (100) comprises a plurality of fluid heating sections (1) connected to each other and each having a flow path or a fluid accommodating portion inside, heaters (10) configured to heat each of the plurality of fluid heating sections to different temperatures, and heat insulating members (13, 13?) disposed between adjacent fluid heating sections.
    Type: Application
    Filed: July 20, 2018
    Publication date: June 25, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Keisuke NAKATSUJI, Keiji HIRAO, Yukio MINAMI, Nobukazu IKEDA
  • Publication number: 20200149162
    Abstract: In order to optimally supply a raw material by using a heater, the fluid control device (100) includes a fluid heating section (1) provided with a flow path or a fluid accommodation portion inside, and a heater (10) for heating the fluid heating section, the heater having a heating element (10a) and a metallic heat transfer member (10b) thermally connected to the heating element and arranged so as to surround the fluid heating section, and the surface of the heat transfer member facing the fluid heating section includes a surface (S1) subjected to surface treatment for improving heat dissipation.
    Type: Application
    Filed: July 20, 2018
    Publication date: May 14, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Keisuke NAKATSUJI, Keiji HIRAO, Yukio MINAMI, Nobukazu IKEDA
  • Patent number: 10646844
    Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.
    Type: Grant
    Filed: April 11, 2016
    Date of Patent: May 12, 2020
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Katsuyuki Sugita, Takatoshi Nakatani, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda, Keiji Hirao
  • Patent number: 10604840
    Abstract: To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.
    Type: Grant
    Filed: November 2, 2015
    Date of Patent: March 31, 2020
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20200088561
    Abstract: The liquid level meter according to the present invention includes a resistive temperature detector, a temperature measuring body located above it, a temperature detecting unit detecting temperatures of the resistive temperature detector and the temperature measuring body, a current controlling unit determining a current value to be flowed through the resistive temperature detector so that the resistive temperature detector and the temperature measuring body become a predetermined temperature difference, a power supply unit supplying the current of the determined current value to the resistive temperature detector, and a liquid level detecting unit detecting a position of a liquid level.
    Type: Application
    Filed: December 22, 2017
    Publication date: March 19, 2020
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Takatoshi NAKATANI, Satoru YAMASHITA, Katsuyuki SUGITA, Kaoru HIRATA, Masaaki NAGASE, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 10274356
    Abstract: A liquid level meter includes a first resistive temperature detector; a first temperature measuring body a liquid level detection section a temperature detection section detecting the temperatures of the first resistive temperature detector and the first temperature measuring body; a current control section determining a value of a current to apply to the first resistive temperature detector such that a difference between the temperatures of the first resistive temperature detector and the first temperature measuring body detected by the temperature detection section to be a first constant value; and a power supply unit supplying a current of the determined current value to the first resistive temperature detector; wherein the liquid level detection section determines whether the first resistive temperature detector is present in a liquid or outside of the liquid using the value of the current applied to the first resistive temperature detector.
    Type: Grant
    Filed: November 24, 2015
    Date of Patent: April 30, 2019
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Katsuyuki Sugita, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 10073469
    Abstract: A flow meter includes an inlet side switching valve, an outlet side switching valve on a downstream of the inlet side valve, and a control valve on a downstream of the outlet side valve that are connected with each other by flow passages having internal volumes, a pressure sensor on an upstream side of the control valve, and a larger flow rate measuring section for calculating a flow rate based on a build-down volume of an internal volume of the passage between an outlet of the inlet side valve and an inlet of the control valve, and a smaller flow rate measuring section for calculating a flow rate based on a build-down volume of an inner capacity of the passage between an outlet of the outlet side valve and the inlet of the control valve.
    Type: Grant
    Filed: October 21, 2014
    Date of Patent: September 11, 2018
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Nobukazu Ikeda, Kouji Nishino, Ryousuke Dohi, Atsushi Hidaka, Katsuyuki Sugita
  • Patent number: 9994955
    Abstract: The present invention provides a raw material vaporization and supply device including a raw material receiving tank, a vaporizer for vaporizing liquid pressure-fed from the liquid receiving tank, a flow rate control device for adjusting a flow rate of raw material gas from the vaporizer, and a heating device for heating the vaporizer, the high-temperature pressure-type flow rate control device, and desired sections of flow passages connected to these devices, wherein Al2O3 passivation treatment, Cr2O3 passivation treatment, or FeF2 passivation treatment is applied to liquid contact parts or gas contact parts of metal surfaces of at least any of the raw material receiving tank, the vaporizer, the flow rate control device, the flow passages that links these component devices, or opening-and-closing valves that are disposed in the flow passages.
    Type: Grant
    Filed: November 20, 2013
    Date of Patent: June 12, 2018
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Satoru Yamashita, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20180071702
    Abstract: A vaporization supply apparatus comprises a vaporizer which heats and vaporize a liquid, a flow-rate control device which controls a flow rate of a gas sent out from the vaporizer, a first control valve interposed in a supply channel of a liquid to the vaporizer, a pressure detector for detecting a pressure of a gas vaporized by the vaporizer, a liquid detection part for measuring parameters of a liquid in an amount higher than a predetermined amount in the vaporizer, and a control device which controls the first control valve to supply a predetermined amount of a liquid to the vaporizer based on the pressure value detected by the pressure detector, and to close the first control valve when the liquid detection part detect a liquid in an amount higher than the predetermined amount.
    Type: Application
    Filed: April 11, 2016
    Publication date: March 15, 2018
    Applicant: FUJIKIN INCORPORATED
    Inventors: Atsushi HIDAKA, Masaaki NAGASE, Kaoru HIRATA, Katsuyuki SUGITA, Takatoshi NAKATANI, Satoru YAMASHITA, Kouji NISHINO, Nobukazu IKEDA, Keiji HIRAO
  • Publication number: 20170364099
    Abstract: To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.
    Type: Application
    Filed: June 26, 2017
    Publication date: December 21, 2017
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20170327949
    Abstract: [Problem] To provide a liquid level indicator and a liquid raw material vaporization feeder, in which the time to detect a switch from the liquid phase to the gas phase has reduced flow rate dependence, and also the detection time can be shortened. [Means for Resolution] The present invention includes a chamber 2 that stores a liquid raw material, at least one protection tube 3 housing a resistance temperature detector for detecting the liquid level L1 in the chamber 2, and a flow controller 4 that controls the flow rate of the gas flowing out from the chamber 2 and feeds the same. The protection tube 3 is horizontally inserted into a sidewall 2a of the chamber 2 and fixed thereto.
    Type: Application
    Filed: November 2, 2015
    Publication date: November 16, 2017
    Inventors: Atsushi Hidaka, Masaaki Nagase, Kaoru Hirata, Satoru Yamashita, Keiji Hirao, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 9791867
    Abstract: A flow control device equipped with flow monitor includes a build-down type flow monitor unit provided on an upstream side, a flow control unit provided on a downstream side of the build-down type flow monitor unit, a signal transmission circuit connecting the build-down type flow monitor unit and the flow control unit and transmitting a monitored flow rate of the build-down type flow monitor unit to the flow control unit, and a set flow rate value adjustment mechanism being provided in the flow control unit and adjusting a set flow rate of the flow control unit based on the monitored flow rate from the build-down type flow monitor unit.
    Type: Grant
    Filed: March 17, 2014
    Date of Patent: October 17, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20170268919
    Abstract: A liquid level meter includes a first resistive temperature detector; a first temperature measuring body a liquid level detection section a temperature detection section detecting the temperatures of the first resistive temperature detector and the first temperature measuring body; a current control section determining a value of a current to apply to the first resistive temperature detector such that a difference between the temperatures of the first resistive temperature detector and the first temperature measuring body detected by the temperature detection section to be a first constant value; and a power supply unit supplying a current of the determined current value to the first resistive temperature detector; wherein the liquid level detection section determines whether the first resistive temperature detector is present in a liquid or outside of the liquid using the value of the current applied to the first resistive temperature detector.
    Type: Application
    Filed: November 24, 2015
    Publication date: September 21, 2017
    Applicant: FUJIKIN INCORPORATED
    Inventors: Kaoru HIRATA, Katsuyuki SUGITA, Atsushi HIDAKA, Kouji NISHINO, Nobukazu IKEDA
  • Patent number: 9746856
    Abstract: A multi-hole orifice plate for flow control includes an orifice plate for controlling the flow rate of a fluid, wherein the opening area of one orifice necessary for the passage of a predetermined flow rate of fluid is divided to provide a plurality of orifices having a total opening area equal to said opening area.
    Type: Grant
    Filed: April 9, 2014
    Date of Patent: August 29, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Kaoru Hirata, Atsushi Hidaka, Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino, Katsuyuki Sugita, Takashi Hirose
  • Patent number: 9733649
    Abstract: To provide a flow control system with build-down system flow monitoring that realizes flow monitoring close to real-time monitoring by combining build-down system flow rate measurement with the upstream side of the flow control system without using a thermal type flow sensor by effectively utilizing high pressure fluctuation resistance characteristics of the flow control system, and can be significantly downsized and reduced in cost.
    Type: Grant
    Filed: April 15, 2013
    Date of Patent: August 15, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kouji Nishino, Nobukazu Ikeda
  • Patent number: 9574917
    Abstract: A pressure type flow rate control device provides flow rate control for gas at 100-500° C. with an error not more than 1.0% F.S. The pressure type flow rate control device includes a valve body with a fluid passage, a valve portion interposed in the passage, a valve drive unit driving the valve portion to open/close the passage, a restriction mechanism on the downstream side of the valve portion in the passage, a temperature detector detecting gas temperature between the valve portion and restriction mechanism, a pressure detector detecting gas pressure between the valve portion and restriction mechanism, and an arithmetic control device controlling flow rate of gas in the restriction mechanism based on values detected by the temperature detector and the pressure detector, wherein the temperature detector is inserted in an attachment hole of the valve body at a position just above an outlet side fluid passage.
    Type: Grant
    Filed: May 30, 2012
    Date of Patent: February 21, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Atsushi Hidaka, Masaaki Nagase, Ryousuke Dohi, Nobukazu Ikeda, Kouji Nishino
  • Patent number: 9556518
    Abstract: A raw material gas supply apparatus includes a liquid raw material gas supply source, a source tank storing liquid raw material, a gas distribution passage through which raw material gas comprising steam of the liquid raw material is supplied to a process chamber from the source tank, an automatic pressure regulator installed on an upstream side of the gas passage, wherein the automatic pressure regulator keeps supply pressure of the raw material gas at a set value, a supply gas switching valve installed on a downstream side of the gas passage, wherein this valve opens and closes the gas passage, an orifice provided on at least one of an inlet side or outlet side of the valve, wherein the orifice regulates flow rate of the raw material gas, and a constant temperature heating device heats the source tank, the gas passage, the valve and the orifice to a set temperature.
    Type: Grant
    Filed: January 8, 2014
    Date of Patent: January 31, 2017
    Assignee: FUJIKIN INCORPORATED
    Inventors: Masaaki Nagase, Atsushi Hidaka, Kaoru Hirata, Ryousuke Dohi, Kouji Nishino, Nobukazu Ikeda
  • Publication number: 20160282880
    Abstract: A flow control device equipped with flow monitor includes a build-down type flow monitor unit provided on an upstream side, a flow control unit provided on a downstream side of the build-down type flow monitor unit, a signal transmission circuit connecting the build-down type flow monitor unit and the flow control unit and transmitting a monitored flow rate of the build-down type flow monitor unit to the flow control unit, and a set flow rate value adjustment mechanism being provided in the flow control unit and adjusting a set flow rate of the flow control unit based on the monitored flow rate from the build-down type flow monitor unit.
    Type: Application
    Filed: March 17, 2014
    Publication date: September 29, 2016
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Atsushi HIDAKA, Kouji NISHINO, Nobukazu IKEDA
  • Publication number: 20160239026
    Abstract: A flow meter includes an inlet side switching valve, an outlet side switching valve on a downstream of the inlet side valve, and a control valve on a downstream of the outlet side valve that are connected with each other by flow passages having internal volumes, a pressure sensor on an upstream side of the control valve, and a larger flow rate measuring section for calculating a flow rate based on a build-down volume of an internal volume of the passage between an outlet of the inlet side valve and an inlet of the control valve, and a smaller flow rate measuring section for calculating a flow rate based on a build-down volume of an inner capacity of the passage between an outlet of the outlet side valve and the inlet of the control valve.
    Type: Application
    Filed: October 21, 2014
    Publication date: August 18, 2016
    Applicant: FUJIKIN INCORPORATED
    Inventors: Masaaki NAGASE, Nobukazu IKEDA, Kouji NISHINO, Ryousuke DOHI, Atsushi HIDAKA, Katsuyuki SUGITA
  • Publication number: 20160070271
    Abstract: A multi-hole orifice plate for flow control includes an orifice plate for controlling the flow rate of a fluid, wherein the opening area of one orifice necessary for the passage of a predetermined flow rate of fluid is divided to provide a plurality of orifices having a total opening area equal to said opening area.
    Type: Application
    Filed: April 9, 2014
    Publication date: March 10, 2016
    Applicant: FUJIKIN INCORPORATED
    Inventors: Kaoru HIRATA, Atsushi HIDAKA, Masaaki NAGASE, Ryousuke DOHI, Nobukazu IKEDA, Kouji NISHINO, Katsuyuki SUGITA, Takashi HIROSE