Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.

Abstract: A cast insulation resin for an electric apparatus having an improved fracture toughness is provided. The cast insulation resin for an electric apparatus is a cast insulation resin used in an electric apparatus, comprising at least either a polar fine elastomer particle or a liquid elastomer having a polar molecule dispersed in an epoxy resin, and a filler formed of at least either an inorganic compound or an inorganic compound having a modified surface thereon with an organic compound.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.

Abstract: In a method for mass spectrometry, a plurality of juxtaposed chromatography apparatus connected to a mass spectrometer start eluting at a predetermined time difference and the following mass spectrometer conducts mass spectrometry. A chromatogram in a preceding chromatography apparatus is analyzed on real time base and results of the analysis are used on real time base to change an elusion condition of a succeeding chromatography apparatus. A mass spectrometric system suitable for carrying out the method is also provided.

Abstract: A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein R1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1 and R2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 car

Abstract: A polymer contains a constituent unit having a specific acetal skeleton. This polymer is able to be used as a resist resin in DUV excimer laser lithography, electron beam lithography, EUV lithography, or the like.

Abstract: To provide a resist polymer comprising, as a structural unit, an acid-decomposable unit having a structure represented by formula (1) or (2) which exhibits a small line edge roughness and produces little defects in DUV excimer laser lithography or the like.

Abstract: A rectangular conductor for a solar battery and a lead wire for a solar battery, in which warping or damaging of a silicon crystal wafer is hard to occur at the time of bonding a connection lead wire even when a silicon crystal wafer is configured to have a thin sheet structure, can be provided. A conductor 1 having a volume resistivity equal to or less than 50 ??·mm, and a 0.2% yield strength value equal to or less than 90 MPa in a tensile test is formed into a rectangular conductor 10 for a solar battery having a rectangular cross section, and a surface of the rectangular conductor 10 for a solar battery is coated with a solder plating film 13, to provide a lead wire 20 for a solar battery.

Abstract: The resist polymer of the present invention comprises a specific constitutional unit having a cyano group, a constitutional unit having an acid-dissociable group, and a specific constitutional unit having a lactone skeleton. When the above polymer is used as a resist resin in DUV excimer laser lithography or electron beam lithography, it exhibits high sensitivity and high resolution, and provides a good resist pattern shape, having a small degree of occurrence of line edge roughness or generation of microgels.

Abstract: In a method for mass spectrometry, a plurality of juxtaposed chromatography apparatus connected to a mass spectrometer start eluting at a predetermined time difference and the following mass spectrometer conducts mass spectrometry. A chromatogram in a preceding chromatography apparatus is analyzed on real time base and results of the analysis are used on real time base to change an elusion condition of a succeeding chromatography apparatus. A mass spectrometric system suitable for carrying out the method is also provided.

Abstract: The measurement throughput and the precision in sample identification are improved in a tandem type mass spectrograph. Thus, in a mass spectrum analyzing system utilizing a tandem type mass spectrograph in which the selection of an ionic species to serve as the measurement target, dissociation thereof and spectral measurement are repeated in n stages, the ionic species to be measured in MSn is selected based on the mass-to-charge ratios (m/z values) obtained as a result of the spectral analysis in MSn?1 (n?2), and this procedure is repeated until the sequence of a required number of amino acids is determined.

Abstract: The 5-methylene-1,3-dioxolan-4-one derivative of the present invention is represented by the formula (1) indicated below, and it is a novel monomer from which a homopolymer and a copolymer excellent in light transparency and heat stability are obtained. Moreover, the polymer obtained by (co)polymerizing a monomer composition comprising the derivative represented by the formula (1) indicated below is excellent in the resist performance such as sensitivity, resolution and dry etching resistance, and solubility in an organic solvent, also having little line edge roughness, and thus it is preferably used as a resin for a resist composition.

Abstract: A plasma-assisted processing apparatus has a vacuum vessel defining a processing chamber, a gas supply line for carrying gases into the processing chamber, a workpiece support disposed in the processing chamber and serving as an electrode, a disk antenna for radiating a high-frequency wave having a frequency in the VHF or the UHF band into the processing chamber, a high-frequency waveguide for guiding a high-frequency wave to the disk antenna, and a window made of a dielectric material isolating the disk antenna from the processing chamber. A conductive ring is disposed between the disk antenna and the window such that one surface thereof is in contact with a peripheral part of the disk antenna.

Abstract: The measurement throughput and the precision in sample identification are improved in a tandem type mass spectrograph. Thus, in a mass spectrum analyzing system utilizing a tandem type mass spectrograph in which the selection of an ionic species to serve as the measurement target, dissociation thereof and spectral measurement are repeated in n stages, the ionic species to be measured in MSn is selected based on the mass-to-charge ratios (m/z values) obtained as a result of the spectral analysis in MSn−1 (n≧2), and this procedure is repeated until the sequence of a required number of amino acids is determined.

Abstract: An object of the present invention is to provide a semiconductor device and a method of manufacturing the semiconductor device which can improve the flatness after the chemical mechanical polishing by inserting necessary and minimum dummy patterns and has high throughput.

Abstract: An object of the present invention is to provide a semiconductor device and a method of manufacturing the semiconductor device which can improve the flatness after the chemical mechanical polishing by inserting necessary and minimum dummy patterns and has high throughput.

Abstract: A plasma-assisted processing apparatus comprises: a vacuum vessel defining a processing chamber, a gas supply line for carrying gases into the processing chamber, a workpiece support for supporting a workpiece, disposed in the processing chamber and serving as an electrode, a disk antenna for radiating a high-frequency wave of a frequency in the VHF or the UHF band into the processing chamber, a high-frequency waveguide for guiding a high-frequency wave to the disk antenna, and a window of a dielectric material isolating the disk antenna from the processing chamber. A conductive ring is disposed between the disk antenna and the window such that its end surface is in contact with a peripheral part of the disk antenna.