Patents by Inventor Atsushi Takane
Atsushi Takane has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8558999Abstract: To provide a defect inspection apparatus and method adapted to easily assign threshold levels to scattered-light detectors and to appropriately acquire data detected by each scattered-light detector. The apparatus includes a stage device on which to rest a sample; a laser light irradiation device that irradiates the sample on the stage device with inspection light; scattered-light detectors, each of which detects a beam of light, scattered from the sample, and outputs an image signal; a threshold level setter formed so that an associated threshold level for judging whether defects are present is set only for an image signal selected from individual image signals of the scattered-light detectors or from image signals obtained by arithmetic processing based on the image signals, and a threshold level setting circuit that acquires the individual image signals, only if the image signal exceeds the threshold level set in the threshold level setter.Type: GrantFiled: March 27, 2008Date of Patent: October 15, 2013Assignee: Hitachi High-Technologies CorporationInventors: Koji Kawaki, Atsushi Takane, Hiroshi Kikuchi, Nobuhiro Obara, Yuji Inoue
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Patent number: 8335397Abstract: In a method and apparatus for removing artifacts from an image generated a charged partial beam scanning device, a scanning method is determined, and the frequency of an artifact appearing on an image can then be determined, based on scanning method. A step 703, a frequency domain for removing an artifact can be determined from the vertical and horizontal widths determined by experimentation in advance with respect to the frequency position Photography is performed to obtain an image, which is Fourier transformed and the determined frequency domain is replaced, for example, by “0.” The resulting image is subjected to inverse Fourier transformation, and displayed and stored. The flow of such processing enables decreasing an artifact appearing on an image, depending on a scanning method.Type: GrantFiled: May 21, 2008Date of Patent: December 18, 2012Assignee: Hitachi High-Technologies CorporationInventors: Atsushi Takane, Mitsuji Ikeda, Atsushi Kobaru
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Patent number: 8304722Abstract: On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.Type: GrantFiled: September 19, 2008Date of Patent: November 6, 2012Assignee: Hitachi High-Technologies CorporationInventors: Hiromi Inada, Mitsugu Sato, Atsushi Takane
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Patent number: 8263935Abstract: A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.Type: GrantFiled: December 31, 2009Date of Patent: September 11, 2012Assignee: Hitachi High-Technologies CorporationInventors: Atsushi Takane, Mitsuji Ikeda, Satoru Yamaguchi, Yasuhiko Ozawa
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Patent number: 8041104Abstract: A pattern matching apparatus comprising: means for storing photographed image data of a semiconductor device; means for storing CAD data of said semiconductor device; an information input means for inputting information on the white band width contained in said image data; a pattern extracting means for extracting a pattern on the semiconductor device from said image data by using the white band width information; and a matching means for matching said pattern with the CAD data.Type: GrantFiled: August 22, 2005Date of Patent: October 18, 2011Assignee: Hitachi High-Technologies CorporationInventors: Yasutaka Toyoda, Mitsuji Ikeda, Atsushi Takane
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Patent number: 8030614Abstract: There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.Type: GrantFiled: August 28, 2009Date of Patent: October 4, 2011Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Katsuhiko Sakai, Atsushi Takane, Yoshihiko Nakayama
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Patent number: 8026491Abstract: A charged particle beam apparatus facilitating adjusting a beam center axis of a charged particle beam in a case where optical conditions are modified or in a case where the beam center axis of the charged particle beam is moved due to state variation of the apparatus. When the beam center axis of a primary charged particle beam is adjusted with a deflector (aligner), a first processing step for measuring the sensitivity of the aligner and a second processing step for detecting the deviation between the center of the primary charged particle beam and the center of the objective aperture are provided. The charged particle beam apparatus determines the aligner set values, using the aligner sensitivity measured in the first processing step and the amount of deviation detected in the second processing step, such that the primary charged particle beam passes through the center of the objective aperture and controls the aligner using the aligner set values.Type: GrantFiled: March 8, 2007Date of Patent: September 27, 2011Assignee: Hitachi High-Technologies CorporationInventors: Takeshi Ogashiwa, Mitsugu Sato, Atsushi Takane, Toshihide Agemura, Yuusuke Narita, Takeharu Shichiji, Shinichi Tomita, Sukehiro Ito, Junichi Katane
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Patent number: 7973282Abstract: There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.Type: GrantFiled: March 20, 2007Date of Patent: July 5, 2011Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Katsuhiko Sakai, Atsushi Takane, Yoshihiko Nakayama
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Patent number: 7923701Abstract: Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodical structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.Type: GrantFiled: April 24, 2008Date of Patent: April 12, 2011Assignee: Hitachi High-Technologies CorporationInventors: Hiromi Inada, Hiroyuki Tanaka, Shun-ichi Watanabe, Shigeto Isakozawa, Mitsugu Sato, Atsushi Takane, Satoshi Yamaguchi
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Patent number: 7805023Abstract: Image evaluation method capable of objectively evaluating the image resolution of a microscope image. An image resolution method is characterized in that resolution in partial regions of an image is obtained over an entire area of the image or a portion of the image, averaging is performed over the entire area of the image or the portion of the image, and the averaged value is established as the resolution evaluation value of the entire area of the image or the portion of the image. This method eliminates the subjective impressions of the evaluator from evaluation of microscope image resolution, so image resolution evaluation values of high accuracy and good repeatability can be obtained.Type: GrantFiled: May 21, 2007Date of Patent: September 28, 2010Assignee: Hitachi, Ltd.Inventors: Tohru Ishitani, Mitsugu Sato, Hideo Todokoro, Tadashi Otaka, Takashi Iizumi, Atsushi Takane
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Patent number: 7800059Abstract: An object of the present invention is to provide a sample image forming method and a charged particle beam apparatus which are suitable for realizing suppressing of the view area displacement with high accuracy while the influence of charging due to irradiation of the charged particle beam is being suppressed. In order to attain the above object, the present invention provide a method of forming a sample image by scanning a charged particle beam on a sample and forming an image based on secondary signals emitted from the sample, the method comprising the steps of forming a plurality of composite images by superposing a plurality of images obtained by a plurality of scanning times; and forming a further composite image by correcting positional displacements among the plurality of composite images and superposing the plurality of composite images, and a charged particle beam apparatus for realizing the above method.Type: GrantFiled: March 4, 2008Date of Patent: September 21, 2010Assignee: Hitachi High-Technologies CorporationInventors: Mitsugu Sato, Atsushi Takane, Takashi Iizumi, Tadashi Otaka, Hideo Todokoro, Satoru Yamaguchi, Kazutaka Nimura
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Publication number: 20100102224Abstract: A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.Type: ApplicationFiled: December 31, 2009Publication date: April 29, 2010Applicant: Hitachi High-Technologies CorporationInventors: Atsushi TAKANE, Mitsuji Ikeda, Satoru Yamaguchi, Yasuhiko Ozawa
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Patent number: 7652249Abstract: A charged particle beam apparatus for obtaining information of an uneven surface or a depression/protrusion of a sample by irradiating a charged particle beam to a sample having an uneven surface or a depression/protrusion at a plurality of focal positions, measuring signal emitted from the sample, and comparing profile waveforms corresponding to edge portions of the uneven surface.Type: GrantFiled: January 29, 2007Date of Patent: January 26, 2010Assignee: Hitachi High-Technologies CorporationInventors: Atsushi Takane, Mitsuji Ikeda, Satoru Yamaguchi, Yasuhiko Ozawa
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Publication number: 20100006755Abstract: An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.Type: ApplicationFiled: September 22, 2009Publication date: January 14, 2010Inventors: Mitsugo Sato, Tadashi Otaka, Makoto Ezumi, Atsushi Takane, Shoji Yoshida, Satoru Yamaguchi, Yasuhiko Ozawa
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Patent number: 7642514Abstract: It is an object of the present invention to obtain an image which is focused on all portions of a sample and to provide a charged particle beam apparatus capable of obtaining a two-dimensional image which has no blurred part over an entire sample. In order to achieve the above object, the present invention comprises means for changing a focus condition of a charged particle beam emitted from a charged particle source, a charged particle detector for detecting charged particles irradiated from a surface portion of said sample in response to the emitted charged particle beam, and means for composing a two-dimensional image of the surface portion of the sample based on signals on which said charged particle beam is focused, said signals being among signals output from the charged particle detector.Type: GrantFiled: December 27, 2007Date of Patent: January 5, 2010Assignee: Hitachi, Ltd.Inventors: Atsushi Takane, Haruo Yoda, Hideo Todokoro, Fumio Mizuno, Shoji Yoshida, Mitsuji Ikeda, Mitsugu Sato, Makoto Ezumi
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Publication number: 20090314938Abstract: There is provided a charged particle beam apparatus which allows implementation of a high-reliability and high-accuracy dimension measurement even if height differences exist on the surface of a sample. The charged particle beam apparatus includes the following configuration components: An acquisition unit for acquiring a plurality of SEM images whose focus widths are varied in correspondence with the focal depths, a determination unit for determining, from the plurality of SEM images acquired, a SEM image for which the image sharpness degree of the partial domain including a dimension-measuring domain becomes the maximum value, and a measurement unit for measuring the dimension of the predetermined domain from the SEM image whose image sharpness degree is the maximum value.Type: ApplicationFiled: August 28, 2009Publication date: December 24, 2009Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Mitsugu Sato, Katsuhiko Sakai, Atsushi Takane, Yoshihiko Nakayama
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Patent number: 7633063Abstract: A charged particle beam apparatus is provided which can prevent the accuracy of positional shift detection from being degraded owing to differences in picture quality, so that even when the state of a charged particle beam is changed at the time that optical conditions are changed or the optical axis changes with time, an auto adjustment of the optical axis can be realized easily and highly accurately. In the charged particle beam apparatus, evaluation or adjustment of focusing is conducted before the deflection condition of an alignment deflector for optical axis adjustment is changed or a table of focus adjustment amounts in correspondence with deflection conditions of the alignment deflector is provided, whereby when the deflection condition of the alignment deflector is changed, a focus adjustment is carried out in accordance with the table.Type: GrantFiled: November 15, 2006Date of Patent: December 15, 2009Assignee: Hitachi High-Technologies CorporationInventors: Atsushi Takane, Satoru Yamaguchi, Mitsugu Sato
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Patent number: 7605381Abstract: An object of the present invention is to provide a charged particle beam apparatus and an alignment method of the charged particle beam apparatus, which make it possible to align an optical axis of a charged particle beam easily even when a state of the charged particle beam changes. The present invention comprises calculation means for calculating a deflection amount of an alignment deflector which performs an axis alignment for an objective lens, a plurality of calculation methods for calculating the deflection amount is memorized in the calculation means, and a selection means for selecting at least one of the calculation methods is provided.Type: GrantFiled: December 15, 2003Date of Patent: October 20, 2009Assignee: Hitachi, Ltd.Inventors: Mitsugu Sato, Tadashi Otaka, Makoto Ezumi, Atsushi Takane, Shoji Yoshida, Satoru Yamaguchi, Yasuhiko Ozawa
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Publication number: 20090242794Abstract: Charged particle beam equipment has a processing unit for calibrating dimension values of an enlarged specimen image, and means for changing the amount by which a charged particle beam is scanned. Also, a specimen stand has a mechanism for holding a specimen having a periodical structure or a specimen simultaneously having a periodical structure and a non-periodical structure, and a storage device for automatically changing a magnification for an enlarged specimen image, and storing measured values at all magnifications.Type: ApplicationFiled: April 24, 2008Publication date: October 1, 2009Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiromi Inada, Hiroyuki Tanaka, Shun-ichi Watanabe, Shigeto Isakozawa, Mitsugu Sato, Atsushi Takane, Satoshi Yamaguchi
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Publication number: 20090084955Abstract: On the basis of a displacement of the field of view before and after a deflection of a charged particle beam, extracted from a first specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by a predetermined amount by a beam deflector in an image in which a specimen image is captured at a first magnification calibrated by using a specimen enlarged image of a specimen as a magnification standard, and also a displacement of the field of view before and after a deflection of the charged particle beam, extracted from a second specimen image, including a displacement of the field of view recorded by causing a charged particle beam to deflect by the predetermined amount by the beam deflector in an image in which a specimen image is captured at a second magnification, the second magnification is calibrated.Type: ApplicationFiled: September 19, 2008Publication date: April 2, 2009Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATIONInventors: Hiromi Inada, Mitsugu Sato, Atsushi Takane