Patents by Inventor Atsushi Tohara

Atsushi Tohara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of forming oxynitride film or the like and system for carrying out the same
    Publication number: 20010046792
    Abstract: This invention is an oxynitride film forming method including: a reaction chamber heating step of heating a reaction chamber to a predetermined temperature, the reaction chamber containing an object to be processed; a gas heating step of heating a process gas to a temperature not lower than a reaction temperature at which an oxynitride film can be formed, the process gas consisting of dinitrogen oxide gas; and a film forming step of forming an oxynitride film on the object to be processed by supplying the heated process gas into the heated processing chamber. The temperature to which the reaction chamber is heated in the reaction chamber heating step is set at a temperature below a temperature at which the process gas undergoes a reaction.
    Type: Application
    Filed: May 25, 2001
    Publication date: November 29, 2001
    Inventors: Yutaka Takahashi, Hitoshi Kato, Takeshi Kumagai, Katsutoshi Ishii, Kazutoshi Miura, Atsushi Tohara, Yoshiyuki Fujita