Patents by Inventor Atsushi Ueno
Atsushi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Publication number: 20110263338Abstract: To provide a game device that can reduce the size of the device and can execute the simulation of a match game scene based on an operation input by a game player. A field panel 9 imitating a field of a sporting event, card holding stages 10 that are arranged in the locations indicating the positions of players in the sporting event on the field panel 9, and holding card 11 in a raised state, a card information reading means for reading card information recorded on the cards 11 held by the card holding stages 10, and a game execution control means for controlling the execution of a game are provided. Further, the game execution control means includes a means for controlling, based on the card information read by the card information reading means, the execution of the simulation of the match game scene, which is displayed on the touch panel 6 based on the operation by the game player, to be a predetermined number of times that is set in advance.Type: ApplicationFiled: November 9, 2009Publication date: October 27, 2011Applicant: SEGA CORPORATIONInventors: Satoshi Horie, Atsushi Ueno, Toru Mori, Yuichiro Murotsuka, Masahiro Mihara
-
Publication number: 20100028562Abstract: A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to provide a potential gradient for the plasma beam, a focusing coil which is provided to surround the outer surface of a tube portion of the vacuum chamber located coaxially with the exit portion for outputting a plasma beam from the plasma gun and draws the plasma beam into the vacuum chamber through the tube portion, and a reflected electron feedback electrode which is placed inside the tube portion coaxially with the exit portion of the plasma gun and has a positive polarity.Type: ApplicationFiled: July 31, 2009Publication date: February 4, 2010Applicant: CANON ANELVA CORPORATIONInventors: Hitoshi NAKAGAWARA, Takayuki Moriwaki, Reiji Sakamoto, Atsushi Ueno
-
Publication number: 20090135481Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.Type: ApplicationFiled: January 26, 2009Publication date: May 28, 2009Applicant: RENESAS TECHNOLOGY CORP.Inventors: Tetsuya Yamada, Atsushi Ueno, Takashi Okagawa
-
Patent number: 7499148Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.Type: GrantFiled: July 2, 2004Date of Patent: March 3, 2009Assignee: Renesas Technology Corp.Inventors: Tetsuya Yamada, Ritsuko Ueno, legal representative, Takashi Okagawa, Atsushi Ueno
-
Patent number: 7357578Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.Type: GrantFiled: January 12, 2007Date of Patent: April 15, 2008Assignee: Oiles CorporationInventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
-
Publication number: 20070116391Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.Type: ApplicationFiled: January 12, 2007Publication date: May 24, 2007Applicant: OILES CORPORATIONInventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
-
Patent number: 7198406Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.Type: GrantFiled: January 20, 2003Date of Patent: April 3, 2007Assignee: Oiles CorporationInventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
-
Patent number: 7200515Abstract: A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.Type: GrantFiled: February 3, 2005Date of Patent: April 3, 2007Assignee: Yazaki CorporationInventors: Takashi Sakabe, Emi Takuma, Atsushi Ueno
-
Patent number: 7004838Abstract: A game device, which monitors with a virtual camera a picture of a game being proceeded in a virtual space by a first object controlled by a player and a second object controlled by a computer or an opponent and displays a picture on the screen of a monitor, includes a camera position switch ordering unit for issuing switching orders to switch the position of the virtual camera to a first position which shows the front of the first object and to a second position which shows the front of the first object from the rear of the first object, and a symbol displaying unit for displaying a symbol representing the second object on the monitor screen in correspondence with the switching order to switch the position of the virtual camera to the first position upon the second object existing behind the first object.Type: GrantFiled: March 28, 2002Date of Patent: February 28, 2006Assignee: Kabushiki Kaisha Sega Enterprises, Ltd.Inventors: Yasuhiro Hayashida, Atsushi Ueno, Taishi Yasuda
-
Patent number: 6938238Abstract: In a method of forming a circuit pattern including fine pattern features and fine space, a hard mask layer is patterned with a first pattern defined by eliminating the fine space for merging the pattern features. Thereafter the hard mask layer is shrank. Next, the hard mask layer is patterned with a second pattern that is defined on the basis of the fine space. Finally, the circuit pattern is formed in an underlying layer using the hard mask layer as a mask.Type: GrantFiled: February 10, 2003Date of Patent: August 30, 2005Assignee: Renesas Technology Corp.Inventors: Takashi Okagawa, Tetsuya Yamada, Atsushi Ueno, Atsumi Yamaguchi, Kouichirou Tsujita
-
Publication number: 20050171727Abstract: A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.Type: ApplicationFiled: February 3, 2005Publication date: August 4, 2005Inventors: Takashi Sakabe, Emi Takuma, Atsushi Ueno
-
Patent number: 6918701Abstract: A synthetic resin-made sliding bearing (1) includes a synthetic resin-made lower casing (2), a synthetic resin-made upper casing (3) superposed on the lower casing (2), a synthetic resin-made disk-shaped thrust sliding bearing piece (4) disposed between the upper and the lower casings (3) and (2), and a synthetic resin-made cylindrical radial sliding bearing piece (5) disposed between the upper and the lower casings (3) and (2).Type: GrantFiled: February 25, 2002Date of Patent: July 19, 2005Assignee: Oiles CorporationInventors: Atsushi Ueno, Kazuyuki Miyata
-
Publication number: 20050041232Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.Type: ApplicationFiled: July 2, 2004Publication date: February 24, 2005Inventors: Tetsuya Yamada, Atsushi Ueno, Takashi Okagawa, Ritsuko Ueno
-
Patent number: 6849957Abstract: A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.Type: GrantFiled: November 30, 2000Date of Patent: February 1, 2005Assignee: Renesas Technology Corp.Inventors: Masahiko Takeuchi, Koichiro Narimatsu, Atsushi Ueno
-
Patent number: 6849486Abstract: The reduction of length of a gate electrode is suppressed in the process of thinning it. A hard mask (5a) is thinned and used to etch a gate electrode material film (4) to form a gate electrode. At this time, a resist mask (10) having an opening (11) over an active region (1) is formed; the resist mask (10) covers at least both ends in the length direction of the hard mask (5a) and exposes in the opening (11) at least the entirety of the part of the hard mask (5a) which lies right above the active region (1). The hard mask (5a) is thinned by etching using the resist mask (10) as a mask and therefore the hard mask (5a) is thinned in the part over the active region (1) without being shortened in the length direction. As a result, the gate electrode formed by using the thinned hard mask (5a) is not shortened in length.Type: GrantFiled: November 21, 2002Date of Patent: February 1, 2005Assignee: Renesas Technology Corp.Inventors: Tetsuya Yamada, Atsushi Ueno, Kouichirou Tsujita, Atsumi Yamaguchi, Takashi Okagawa
-
Publication number: 20040240761Abstract: A thrust sliding bearing (1) includes an upper casing (10) having a polyacetal resin-made flat annular surface (2) and a lower casing (20) superposed on the upper casing (10) so as to be rotatable about an axis (O) of the upper casing (10) and having a polyacetal resin-made annular surface (3) opposing the annular surface (2) of the upper casing (10).Type: ApplicationFiled: June 25, 2004Publication date: December 2, 2004Inventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
-
Patent number: 6756691Abstract: A mark structure (100) consists of a gate oxide film (102) formed on a semiconductor substrate (101), a gate wiring layer (103) formed on the gate oxide film (102), an insulating film (104) formed on the gate wiring layer (103) and a sidewall (105) formed in contact with side surfaces of the insulating film (104), the gate wiring layer (103) and the gate oxide film (102). An opaque bit line layer (113) is formed of a polycide consisting of a doped polysilicon layer (1131) and a tungsten silicide layer (1132), extending from on the interlayer insulating film (107) to on the mark structure (100). With this structure, a semiconductor device which allows measurement of alignment mark and overlay check mark with high precision in a lithography process, has no structure unnecessary for a mark and suppresses creation of extraneous matter in a process of manufacturing a semiconductor device to prevent deterioration in manufacturing process yield and a method of manufacturing the semiconductor device can be provided.Type: GrantFiled: February 25, 2002Date of Patent: June 29, 2004Assignee: Renesas Technology Corp.Inventors: Kazuo Tomita, Atsushi Ueno
-
Publication number: 20040054981Abstract: In a method of forming a circuit pattern including fine pattern features and fine space, a hard mask layer is patterned with a first pattern defined by eliminating the fine space for merging the pattern features. Thereafter the hard mask layer is shrank. Next, the hard mask layer is patterned with a second pattern that is defined on the basis of the fine space. Finally, the circuit pattern is formed in an underlying layer using the hard mask layer as a mask.Type: ApplicationFiled: February 10, 2003Publication date: March 18, 2004Applicant: MITSUBISHI DENKI KABUSHIKI KAISHAInventors: Takashi Okagawa, Tetsuya Yamada, Atsushi Ueno, Atsumi Yamaguchi, Kouichirou Tsujita
-
Patent number: 6703287Abstract: An improved method for producing a semiconductor device in which overpolishing is prevented at a chemical mechanical polishing time to eliminate the influence of peripheries on the object part. A plasma oxide film is formed on a semiconductor substrate so as to fill a recess and a trench. With the use of a resist film as a mask, the plasma oxide film is selectively etched to leave an overpolish-preventing support member in a neighborhood of the recess, which is a photo-related mark, for providing a support against overpolishing at a chemical mechanical polishing time. The surface of the semiconductor substrate is polished by chemical mechanical polishing. Thereafter, a nitride film and an oxide film are removed.Type: GrantFiled: February 26, 2001Date of Patent: March 9, 2004Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yoshitaka Fujiishi, Atsushi Ueno
-
Publication number: 20040028303Abstract: A synthetic resin-made sliding bearing (1) includes a synthetic resin-made lower casing (2), a synthetic resin-made upper casing (3) superposed on the lower casing (2), a synthetic resin-made disk-shaped thrust sliding bearing piece (4) disposed between the upper and the lower casings (3) and (2), and a synthetic resin-made cylindrical radial sliding bearing piece (5) disposed between the upper and the lower casings (3) and (2).Type: ApplicationFiled: June 24, 2003Publication date: February 12, 2004Inventors: Atsushi Ueno, Kazuyuki Miyata