Patents by Inventor Atsushi Ueno

Atsushi Ueno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20110263338
    Abstract: To provide a game device that can reduce the size of the device and can execute the simulation of a match game scene based on an operation input by a game player. A field panel 9 imitating a field of a sporting event, card holding stages 10 that are arranged in the locations indicating the positions of players in the sporting event on the field panel 9, and holding card 11 in a raised state, a card information reading means for reading card information recorded on the cards 11 held by the card holding stages 10, and a game execution control means for controlling the execution of a game are provided. Further, the game execution control means includes a means for controlling, based on the card information read by the card information reading means, the execution of the simulation of the match game scene, which is displayed on the touch panel 6 based on the operation by the game player, to be a predetermined number of times that is set in advance.
    Type: Application
    Filed: November 9, 2009
    Publication date: October 27, 2011
    Applicant: SEGA CORPORATION
    Inventors: Satoshi Horie, Atsushi Ueno, Toru Mori, Yuichiro Murotsuka, Masahiro Mihara
  • Publication number: 20100028562
    Abstract: A deposition apparatus includes a plasma gun including a hollow cathode which generates a plasma beam into a vacuum chamber including an exhaust system and one or more intermediate electrodes to provide a potential gradient for the plasma beam, a focusing coil which is provided to surround the outer surface of a tube portion of the vacuum chamber located coaxially with the exit portion for outputting a plasma beam from the plasma gun and draws the plasma beam into the vacuum chamber through the tube portion, and a reflected electron feedback electrode which is placed inside the tube portion coaxially with the exit portion of the plasma gun and has a positive polarity.
    Type: Application
    Filed: July 31, 2009
    Publication date: February 4, 2010
    Applicant: CANON ANELVA CORPORATION
    Inventors: Hitoshi NAKAGAWARA, Takayuki Moriwaki, Reiji Sakamoto, Atsushi Ueno
  • Publication number: 20090135481
    Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.
    Type: Application
    Filed: January 26, 2009
    Publication date: May 28, 2009
    Applicant: RENESAS TECHNOLOGY CORP.
    Inventors: Tetsuya Yamada, Atsushi Ueno, Takashi Okagawa
  • Patent number: 7499148
    Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.
    Type: Grant
    Filed: July 2, 2004
    Date of Patent: March 3, 2009
    Assignee: Renesas Technology Corp.
    Inventors: Tetsuya Yamada, Ritsuko Ueno, legal representative, Takashi Okagawa, Atsushi Ueno
  • Patent number: 7357578
    Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.
    Type: Grant
    Filed: January 12, 2007
    Date of Patent: April 15, 2008
    Assignee: Oiles Corporation
    Inventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
  • Publication number: 20070116391
    Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.
    Type: Application
    Filed: January 12, 2007
    Publication date: May 24, 2007
    Applicant: OILES CORPORATION
    Inventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
  • Patent number: 7198406
    Abstract: A thrust sliding bearing includes an upper casing having a polyacetal resin-made flat annular surface and a lower casing superposed on the upper casing so as to be rotatable about an axis of the upper casing and having a polyacetal resin-made annular surface opposing the annular surface of the upper casing.
    Type: Grant
    Filed: January 20, 2003
    Date of Patent: April 3, 2007
    Assignee: Oiles Corporation
    Inventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
  • Patent number: 7200515
    Abstract: A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.
    Type: Grant
    Filed: February 3, 2005
    Date of Patent: April 3, 2007
    Assignee: Yazaki Corporation
    Inventors: Takashi Sakabe, Emi Takuma, Atsushi Ueno
  • Patent number: 7004838
    Abstract: A game device, which monitors with a virtual camera a picture of a game being proceeded in a virtual space by a first object controlled by a player and a second object controlled by a computer or an opponent and displays a picture on the screen of a monitor, includes a camera position switch ordering unit for issuing switching orders to switch the position of the virtual camera to a first position which shows the front of the first object and to a second position which shows the front of the first object from the rear of the first object, and a symbol displaying unit for displaying a symbol representing the second object on the monitor screen in correspondence with the switching order to switch the position of the virtual camera to the first position upon the second object existing behind the first object.
    Type: Grant
    Filed: March 28, 2002
    Date of Patent: February 28, 2006
    Assignee: Kabushiki Kaisha Sega Enterprises, Ltd.
    Inventors: Yasuhiro Hayashida, Atsushi Ueno, Taishi Yasuda
  • Patent number: 6938238
    Abstract: In a method of forming a circuit pattern including fine pattern features and fine space, a hard mask layer is patterned with a first pattern defined by eliminating the fine space for merging the pattern features. Thereafter the hard mask layer is shrank. Next, the hard mask layer is patterned with a second pattern that is defined on the basis of the fine space. Finally, the circuit pattern is formed in an underlying layer using the hard mask layer as a mask.
    Type: Grant
    Filed: February 10, 2003
    Date of Patent: August 30, 2005
    Assignee: Renesas Technology Corp.
    Inventors: Takashi Okagawa, Tetsuya Yamada, Atsushi Ueno, Atsumi Yamaguchi, Kouichirou Tsujita
  • Publication number: 20050171727
    Abstract: A rotation angle sensor includes a first and a second detection gears rotatable with a steering shaft, a first detector configured to detect a rotation angle of the first detection gear, a second detector configured to detect a rotation angle of the second detection gear, a processor configured to calculate a rotation angle of the steering shaft based on the rotation angles detected by the first and second detectors and a discriminator configured to discriminate whether the rotational angle of the steering shaft, calculated by the processor, falls in an abnormal value, wherein a least common multiple between a cycle of the first detector and a cycle of the second detector is greater than a steering angle measurement range.
    Type: Application
    Filed: February 3, 2005
    Publication date: August 4, 2005
    Inventors: Takashi Sakabe, Emi Takuma, Atsushi Ueno
  • Patent number: 6918701
    Abstract: A synthetic resin-made sliding bearing (1) includes a synthetic resin-made lower casing (2), a synthetic resin-made upper casing (3) superposed on the lower casing (2), a synthetic resin-made disk-shaped thrust sliding bearing piece (4) disposed between the upper and the lower casings (3) and (2), and a synthetic resin-made cylindrical radial sliding bearing piece (5) disposed between the upper and the lower casings (3) and (2).
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: July 19, 2005
    Assignee: Oiles Corporation
    Inventors: Atsushi Ueno, Kazuyuki Miyata
  • Publication number: 20050041232
    Abstract: The directions of amplitude of polarized light passing through a polarizer are concentric around a position. The polarizer is disposed on the surface of a pupil such that the position lies exactly on the center of the surface of the pupil. Rays of luminous flux of illumination light converted into polarized light by the polarizer are converged onto a wafer with concentric planes of polarization with respect to an optical axis. The illumination light is therefore incident on a photoresist as s-polarized light. Thus, the amount of light entering the photoresist is less likely to depend upon the angle of incidence. Consequently, the contrast of an optical image formed in the photoresist is improved, and hence, resolution characteristics are improved.
    Type: Application
    Filed: July 2, 2004
    Publication date: February 24, 2005
    Inventors: Tetsuya Yamada, Atsushi Ueno, Takashi Okagawa, Ritsuko Ueno
  • Patent number: 6849957
    Abstract: A semiconductor device enabling precise and accurate measurement of an inspection mark in a simple manner is obtained. The semiconductor device includes a device forming area and a dicing line area arranged to surround the device forming area on a semiconductor substrate. In the dicing line area, first and second registration marks formed in different shots are provided, and the first and second registration marks include auxiliary marks for identifying the first and second registration marks.
    Type: Grant
    Filed: November 30, 2000
    Date of Patent: February 1, 2005
    Assignee: Renesas Technology Corp.
    Inventors: Masahiko Takeuchi, Koichiro Narimatsu, Atsushi Ueno
  • Patent number: 6849486
    Abstract: The reduction of length of a gate electrode is suppressed in the process of thinning it. A hard mask (5a) is thinned and used to etch a gate electrode material film (4) to form a gate electrode. At this time, a resist mask (10) having an opening (11) over an active region (1) is formed; the resist mask (10) covers at least both ends in the length direction of the hard mask (5a) and exposes in the opening (11) at least the entirety of the part of the hard mask (5a) which lies right above the active region (1). The hard mask (5a) is thinned by etching using the resist mask (10) as a mask and therefore the hard mask (5a) is thinned in the part over the active region (1) without being shortened in the length direction. As a result, the gate electrode formed by using the thinned hard mask (5a) is not shortened in length.
    Type: Grant
    Filed: November 21, 2002
    Date of Patent: February 1, 2005
    Assignee: Renesas Technology Corp.
    Inventors: Tetsuya Yamada, Atsushi Ueno, Kouichirou Tsujita, Atsumi Yamaguchi, Takashi Okagawa
  • Publication number: 20040240761
    Abstract: A thrust sliding bearing (1) includes an upper casing (10) having a polyacetal resin-made flat annular surface (2) and a lower casing (20) superposed on the upper casing (10) so as to be rotatable about an axis (O) of the upper casing (10) and having a polyacetal resin-made annular surface (3) opposing the annular surface (2) of the upper casing (10).
    Type: Application
    Filed: June 25, 2004
    Publication date: December 2, 2004
    Inventors: Tadashi Watai, Kazuyuki Miyata, Atsushi Ueno, Ryohei Kaneko
  • Patent number: 6756691
    Abstract: A mark structure (100) consists of a gate oxide film (102) formed on a semiconductor substrate (101), a gate wiring layer (103) formed on the gate oxide film (102), an insulating film (104) formed on the gate wiring layer (103) and a sidewall (105) formed in contact with side surfaces of the insulating film (104), the gate wiring layer (103) and the gate oxide film (102). An opaque bit line layer (113) is formed of a polycide consisting of a doped polysilicon layer (1131) and a tungsten silicide layer (1132), extending from on the interlayer insulating film (107) to on the mark structure (100). With this structure, a semiconductor device which allows measurement of alignment mark and overlay check mark with high precision in a lithography process, has no structure unnecessary for a mark and suppresses creation of extraneous matter in a process of manufacturing a semiconductor device to prevent deterioration in manufacturing process yield and a method of manufacturing the semiconductor device can be provided.
    Type: Grant
    Filed: February 25, 2002
    Date of Patent: June 29, 2004
    Assignee: Renesas Technology Corp.
    Inventors: Kazuo Tomita, Atsushi Ueno
  • Publication number: 20040054981
    Abstract: In a method of forming a circuit pattern including fine pattern features and fine space, a hard mask layer is patterned with a first pattern defined by eliminating the fine space for merging the pattern features. Thereafter the hard mask layer is shrank. Next, the hard mask layer is patterned with a second pattern that is defined on the basis of the fine space. Finally, the circuit pattern is formed in an underlying layer using the hard mask layer as a mask.
    Type: Application
    Filed: February 10, 2003
    Publication date: March 18, 2004
    Applicant: MITSUBISHI DENKI KABUSHIKI KAISHA
    Inventors: Takashi Okagawa, Tetsuya Yamada, Atsushi Ueno, Atsumi Yamaguchi, Kouichirou Tsujita
  • Patent number: 6703287
    Abstract: An improved method for producing a semiconductor device in which overpolishing is prevented at a chemical mechanical polishing time to eliminate the influence of peripheries on the object part. A plasma oxide film is formed on a semiconductor substrate so as to fill a recess and a trench. With the use of a resist film as a mask, the plasma oxide film is selectively etched to leave an overpolish-preventing support member in a neighborhood of the recess, which is a photo-related mark, for providing a support against overpolishing at a chemical mechanical polishing time. The surface of the semiconductor substrate is polished by chemical mechanical polishing. Thereafter, a nitride film and an oxide film are removed.
    Type: Grant
    Filed: February 26, 2001
    Date of Patent: March 9, 2004
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoshitaka Fujiishi, Atsushi Ueno
  • Publication number: 20040028303
    Abstract: A synthetic resin-made sliding bearing (1) includes a synthetic resin-made lower casing (2), a synthetic resin-made upper casing (3) superposed on the lower casing (2), a synthetic resin-made disk-shaped thrust sliding bearing piece (4) disposed between the upper and the lower casings (3) and (2), and a synthetic resin-made cylindrical radial sliding bearing piece (5) disposed between the upper and the lower casings (3) and (2).
    Type: Application
    Filed: June 24, 2003
    Publication date: February 12, 2004
    Inventors: Atsushi Ueno, Kazuyuki Miyata