Patents by Inventor Atsushi Uno

Atsushi Uno has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11801480
    Abstract: A hollow-fiber membrane according to an aspect of the present disclosure contains a polytetrafluoroethylene or a modified polytetrafluoroethylene as a main component and has an average outer diameter of 1 mm or less and an average inner diameter of 0.5 mm or less. In a measurement of a heat of fusion of the polytetrafluoroethylene or the modified polytetrafluoroethylene with a differential scanning calorimeter, when the polytetrafluoroethylene or modified polytetrafluoroethylene is subjected to a first step of heating from room temperature to 365° C., a second step of cooling from 365° C. to 350° C., maintaining the temperature, subsequently cooling from 350° C. to 330° C., and further cooling from 330° C. to 305° C., and a third step of cooling from 305° C. to 245° C. at a rate of ?50° C./min and subsequently heating from 245° C. to 365° C. at a rate of 10° C./min, a heat of fusion from 296° C. to 343° C. in the third step is 30.0 J/g or more and 45.0 J/g or less.
    Type: Grant
    Filed: September 6, 2019
    Date of Patent: October 31, 2023
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro Hayashi, Yasuhiko Muroya, Takamasa Hashimoto, Atsushi Uno, Yoshimasa Suzuki
  • Publication number: 20230053708
    Abstract: The present invention provides an oligodeoxynucleotide which comprises a CpG oligodeoxynucleotide comprising a nucleotide sequence represented by formula (1): 5?X-CpG-L-CpG-TZ3???(I) wherein X is T or C, L is a nucleotide sequence consisting of 1 to 7 bases, and Z is T or C, and consisting of 8 to 16 bases, and a polydeoxyadenylic acid having a length capable of forming a complex with a ?-1,3-glucan, wherein the polydeoxyadenylic acid is linked to the 3? side of the CpG oligodeoxynucleotide. In addition, the present invention provides a complex containing said oligodeoxynucleotide and a ?-1,3-glucan.
    Type: Application
    Filed: December 24, 2020
    Publication date: February 23, 2023
    Applicant: NapaJen Pharma, Inc.
    Inventors: Kanako AMANO, Atsushi UNO
  • Patent number: 11572493
    Abstract: The present invention provides a hot-melt adhesive having a sufficiently long usable time and exhibiting good strength and good heat resistance. The present invention relates to a hot-melt adhesive composition comprising a hydrocarbon cyclic polymer (A), an ?-olefin polymer (C), and a tackifying resin (D).
    Type: Grant
    Filed: July 13, 2017
    Date of Patent: February 7, 2023
    Assignee: Sunstar Engineering Inc.
    Inventor: Atsushi Uno
  • Publication number: 20210394122
    Abstract: A hollow-fiber membrane module according to an embodiment of the present disclosure includes a rectangular tubular outer casing with at least one sidewall being open, the outer casing having a plurality of open ports, and an inner casing configured such that a plurality of hollow-fiber membranes aligned in a longitudinal direction of the outer casing are placeable in the inner casing and configured to be insertable into the one sidewall.
    Type: Application
    Filed: September 20, 2019
    Publication date: December 23, 2021
    Applicant: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro HAYASHI, Yasuhiko MUROYA, Takamasa HASHIMOTO, Atsushi UNO, Yoshimasa SUZUKI
  • Patent number: 11203755
    Abstract: An objective of the present invention is to provide a chemically-modified siRNA that has polydeoxyadenylic acid added to the 5? end of the sense strand, and, when complexed with schizophyllan, is high in resistance against RNase and moreover effectively exhibits RNAi activity. To achieve the objective, in the chemically-modified siRNA with polydeoxyadenylic acid added to the 5? end of the sense strand, specific chemical modification is performed for dinucleotide sequences of CA, UA, and UG in the base sequence of the sense strand and dinucleotide sequences of CA, UA, and UG in the base sequence at and after the eighth base from the 5? end of the antisense strand.
    Type: Grant
    Filed: November 27, 2017
    Date of Patent: December 21, 2021
    Assignee: NapaJen Pharma, Inc.
    Inventors: Sadaharu Higuchi, Atsushi Uno, Hironori Ando
  • Publication number: 20210379537
    Abstract: A hollow-fiber membrane according to an aspect of the present disclosure contains a polytetrafluoroethylene or a modified polytetrafluoroethylene as a main component and has an average outer diameter of 1 mm or less and an average inner diameter of 0.5 mm or less. In a measurement of a heat of fusion of the polytetrafluoroethylene or the modified polytetrafluoroethylene with a differential scanning calorimeter, when the polytetrafluoroethylene or modified polytetrafluoroethylene is subjected to a first step of heating from room temperature to 365° C., a second step of cooling from 365° C. to 350° C., maintaining the temperature, subsequently cooling from 350° C. to 330° C., and further cooling from 330° C. to 305° C., and a third step of cooling from 305° C. to 245° C. at a rate of ?50° C./min and subsequently heating from 245° C. to 365° C. at a rate of 10° C./min, a heat of fusion from 296° C. to 343° C. in the third step is 30.0 J/g or more and 45.0 J/g or less.
    Type: Application
    Filed: September 6, 2019
    Publication date: December 9, 2021
    Applicant: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro HAYASHI, Yasuhiko MUROYA, Takamasa HASHIMOTO, Atsushi UNO, Yoshimasa SUZUKI
  • Publication number: 20210154309
    Abstract: Chemically-modified siRNA may have polydeoxyadenylic acid added to the 5? end of the sense strand thereof, wherein when complexed with schizophyllan, the chemically-modified siRNA can be highly resistant to RNase and effectively exhibit RNAi activity. Modified siRNA may have polydeoxyadenylic acid at the 5? end of the sense strand thereof, based on a particular chemical modification is applied to CA, UA, and UG dinucleotide sequences in the base sequence of the sense strand thereof, and CA, UA, and UG dinucleotide sequences in the base sequence beyond the eighth base from the 5? end of the antisense strand thereof.
    Type: Application
    Filed: May 30, 2019
    Publication date: May 27, 2021
    Applicant: NAPAJEN PHARMA, INC.
    Inventors: Sadaharu HIGUCHI, Atsushi UNO, Hironori ANDO
  • Publication number: 20210054373
    Abstract: An object of the present invention is to provide novel double-stranded RNA having an RNA interference effect, in which the cellular uptake and the resistance to enzymatic degradation are improved, without reducing the RNA interference effect.
    Type: Application
    Filed: June 29, 2020
    Publication date: February 25, 2021
    Inventors: Takanori Kubo, Hideki Ohba, Kazuo Sakurai, Jusaku Minari, Atsushi Uno
  • Patent number: 10738304
    Abstract: An object of the present invention is to provide novel double-stranded RNA having an RNA interference effect, in which the cellular uptake and the resistance to enzymatic degradation are improved, without reducing the RNA interference effect.
    Type: Grant
    Filed: December 18, 2008
    Date of Patent: August 11, 2020
    Assignee: NAPA JENOMICS CO., LTD.
    Inventors: Takanori Kubo, Hideki Ohba, Kazuo Sakurai, Jusaku Minari, Atsushi Uno
  • Publication number: 20190382762
    Abstract: An objective of the present invention is to provide a chemically-modified siRNA that has polydeoxyadenylic acid added to the 5? end of the sense strand, and, when complexed with schizophyllan, is high in resistance against RNase and moreover effectively exhibits RNAi activity. To achieve the objective, in the chemically-modified siRNA with polydeoxyadenylic acid added to the 5? end of the sense strand, specific chemical modification is performed for dinucleotide sequences of CA, UA, and UG in the base sequence of the sense strand and dinucleotide sequences of CA, UA, and UG in the base sequence at and after the eighth base from the 5? end of the antisense strand.
    Type: Application
    Filed: November 27, 2017
    Publication date: December 19, 2019
    Applicant: NapaJen Pharma, Inc.
    Inventors: Sadaharu HIGUCHI, Atsushi UNO, Hironori ANDO
  • Publication number: 20190322830
    Abstract: A porous material according to an embodiment of the present invention is a porous material having a large number of fibrous skeletons containing polytetrafluoroethylene as a main component, in which another fluororesin is evenly present on outer peripheral surfaces of fibers of the large number of fibrous skeletons, and the other fluororesin is a tetrafluoroethylene/perfluorodioxole copolymer, a tetrafluoroethylene/perfluoromethyl vinyl ether copolymer, a tetrafluoroethylene/perfluoroethyl vinyl ether copolymer, a tetrafluoroethylene/perfluoropropyl vinyl ether copolymer, or a combination of these.
    Type: Application
    Filed: July 24, 2017
    Publication date: October 24, 2019
    Applicant: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro HAYASHI, Atsushi UNO, Yoshimasa SUZUKI, Yasuhiko MUROYA, Takayuki USUI
  • Patent number: 10391457
    Abstract: A porous filter includes a porous laminate in which a plurality of biaxially stretched porous sheets made of PTFE are stacked. The Gurley number G and the bubble point B (kPa) of the porous laminate satisfy the following expressions (1) and (2): log G>3.7×10?3×B?0.8??(1) log G<4.9×10?3×B+0.45??(2).
    Type: Grant
    Filed: May 25, 2015
    Date of Patent: August 27, 2019
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Hiroyuki Tsujiwaki, Atsushi Uno, Fumihiro Hayashi
  • Publication number: 20190249042
    Abstract: The present invention provides a hot-melt adhesive having a sufficiently long usable time and exhibiting good strength and good heat resistance. The present invention relates to a hot-melt adhesive composition comprising a hydrocarbon cyclic polymer (A), an ?-olefin polymer (C), and a tackifying resin (D).
    Type: Application
    Filed: July 13, 2017
    Publication date: August 15, 2019
    Inventor: Atsushi UNO
  • Patent number: 10150945
    Abstract: A low-cost cell culture device with low cytotoxicity and improved cell adhesion is described, manufactured by a simplified coating process. At least the portion for cell culture on the surface of the cell culture device is coated with at least one of ?-poly-L-lysine, further polymerized derivatives of ?-poly-L-lysine and their salts.
    Type: Grant
    Filed: July 21, 2005
    Date of Patent: December 11, 2018
    Assignees: JNC CORPORATION, TAKESHI NAGASAKI
    Inventors: Takeshi Nagasaki, Seiji Shinkai, Atsushi Uno
  • Patent number: 9695291
    Abstract: A porous polytetrafluoroethylene film comprising a fluororesin containing polytetrafluoroethylene as a main component, wherein an envelope surface area of resin fibers included per film having an area of 1 m2 and a thickness of 25 ?m is 4,000 m2 or more, and a melting point peak is 333° C. or lower.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: July 4, 2017
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro Hayashi, Aya Murata, Hiroyuki Tsujiwaki, Atsushi Uno
  • Publication number: 20170157568
    Abstract: A porous filter includes a porous laminate in which a plurality of biaxially stretched porous sheets made of PTFE are stacked. The Gurley number G and the bubble point B (kPa) of the porous laminate satisfy the following expressions (1) and (2): log G>3.7×10?3×B?0.8??(1) log G<4.9×10?3×B+0.45??(2).
    Type: Application
    Filed: May 25, 2015
    Publication date: June 8, 2017
    Inventors: Hiroyuki TSUJIWAKI, Atsushi UNO, Fumihiro HAYASHI
  • Patent number: 9669608
    Abstract: A porous polytetrafluoroethylene composite includes a porous polytetrafluoroethylene film, a porous support layer that supports the porous polytetrafluoroethylene film, an adhesive layer bonded to the porous polytetrafluoroethylene film, and a porous reinforcement layer bonded to the adhesive layer, in which the adhesive layer is a layer composed of a fluororesin having a melting point, or a glass transition point when a melting point is not clearly defined, of lower than 260° C.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: June 6, 2017
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro Hayashi, Aya Murata, Atsushi Uno
  • Patent number: 9493619
    Abstract: Provided is a method for producing a porous polytetrafluoroethylene film having good chemical resistance, good heat resistance, a high porosity, and good dimensional stability. The method for producing a porous polytetrafluoroethylene film includes a stretching step of stretching a sheet-like molded body composed of a fluororesin containing polytetrafluoroethylene as a main component in a longitudinal direction and/or a lateral direction at a temperature lower than a melting point of the fluororesin to make a porous fluororesin film, and, after the stretching step, an annealing step of holding the porous fluororesin film in a shape-fixed state, and maintaining the porous fluororesin film at a temperature lower than the melting point of the fluororesin but not lower than a temperature 30° C. lower than the melting point for 1 to 20 hours.
    Type: Grant
    Filed: June 23, 2014
    Date of Patent: November 15, 2016
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro Hayashi, Hiroyuki Tsujiwaki, Aya Murata, Atsushi Uno
  • Patent number: 9421499
    Abstract: The invention offers a microporous modified-polytetrafluoroethylene membrane that is a microporous membrane having a significantly small pore diameter and narrow pore-diameter distribution and that can remove microscopic foreign particles at high efficiency when used as a filtration membrane.
    Type: Grant
    Filed: January 21, 2013
    Date of Patent: August 23, 2016
    Assignee: SUMITOMO ELECTRIC FINE POLYMER, INC.
    Inventors: Fumihiro Hayashi, Aya Oya, Atsushi Uno
  • Publication number: 20150353694
    Abstract: Provided is a method for producing a porous polytetrafluoroethylene film having good chemical resistance, good heat resistance, a high porosity, and good dimensional stability. The method for producing a porous polytetrafluoroethylene film includes a stretching step of stretching a sheet-like molded body composed of a fluororesin containing polytetrafluoroethylene as a main component in a longitudinal direction and/or a lateral direction at a temperature lower than a melting point of the fluororesin to make a porous fluororesin film, and, after the stretching step, an annealing step of holding the porous fluororesin film in a shape-fixed state, and maintaining the porous fluororesin film at a temperature lower than the melting point of the fluororesin but not lower than a temperature 30° C. lower than the melting point for 1 to 20 hours.
    Type: Application
    Filed: June 23, 2014
    Publication date: December 10, 2015
    Inventors: Fumihiro HAYASHI, Hiroyuki TSUJIWAKI, Aya MURATA, Atsushi UNO