Patents by Inventor Axel Scholz
Axel Scholz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10088754Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.Type: GrantFiled: March 21, 2017Date of Patent: October 2, 2018Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 9753375Abstract: An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light.Type: GrantFiled: July 10, 2014Date of Patent: September 5, 2017Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Michael Patra, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt
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Publication number: 20170192361Abstract: A raster arrangement includes at least one raster element of a first type and at least one raster element of a second type. Each raster element of the first type has a first bundle-influencing effect. Each raster element of the second type has a second bundle-influencing effect which is different from the first bundle-influencing effect. Each raster element of the first type is located in a first area of the raster arrangement. Each raster element of the second type is located in a second area of the raster arrangement which is different from the first area of the raster arrangement.Type: ApplicationFiled: March 21, 2017Publication date: July 6, 2017Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 9606441Abstract: A microlithography illumination system includes a first raster arrangement including a first plurality of bundle-forming raster elements arranged in or adjacent a first plane of the illumination system. The first plurality of bundle-forming raster elements is configured to generate a raster arrangement of secondary light sources. The illumination system also includes a transmission optics configured to superimpose transmission of the illumination light of the secondary light sources into the object field. The transmission optics includes a second raster arrangement comprising a second plurality of bundle-forming raster elements. The illumination system further includes a displacement device configured to displace a displaceable segment of the first raster arrangement relative to the second raster arrangement. The displaceable segment includes exactly one of the raster elements, a group of several raster elements, a raster column, a raster area, or several groups of raster elements.Type: GrantFiled: February 1, 2016Date of Patent: March 28, 2017Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 9575414Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: GrantFiled: November 19, 2015Date of Patent: February 21, 2017Assignee: Carl Zeiss SMT GmbHInventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
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Publication number: 20160161858Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: ApplicationFiled: February 1, 2016Publication date: June 9, 2016Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20160077446Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: ApplicationFiled: November 19, 2015Publication date: March 17, 2016Inventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
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Patent number: 9280060Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: GrantFiled: September 25, 2014Date of Patent: March 8, 2016Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 9217930Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: GrantFiled: February 6, 2013Date of Patent: December 22, 2015Assignee: Carl Zeiss SMT GmbHInventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
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Publication number: 20150022798Abstract: A raster arrangement includes first and second types of raster elements which have different bundle-influencing effects. There is a distance step between a first raster area and a second raster area. The first raster area comprises a raster element of the first raster element type. The second raster area includes a raster element of the second raster element type. The raster arrangement is configured to be used in a microlithography illumination system.Type: ApplicationFiled: September 25, 2014Publication date: January 22, 2015Inventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Publication number: 20150015862Abstract: An illumination optical unit for projection lithography illuminates an illumination field with illumination light of a primary light source. The illumination optical unit has a raster arrangement to predefine a shape of the illumination field, a transfer optical unit for the superimposing transfer of the illumination light toward the illumination field, and an illumination angle variation device which deflects the illumination light with different deflection angles. The illumination angle variation device has at least one displaceable illumination angle variation unit to generate a deflection angle for the illumination light.Type: ApplicationFiled: July 10, 2014Publication date: January 15, 2015Inventors: Axel Scholz, Michael Patra, Frank Schlesener, Manfred Maul, Wolfgang Emer, Stefanie Hilt
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Patent number: 8873023Abstract: An illumination system for microlithography serves to illuminate an illumination field with illumination light of a primary light source. A first raster arrangement has bundle-forming first raster elements which are arranged in a first plane of the illumination system or adjacent to the plane. The first raster arrangement serves to generate a raster arrangement of secondary light sources. A transmission optics serves for superimposed transmission of the illumination light of the secondary light sources into the illumination field. The transmission optics has a second raster arrangement with bundle-forming second raster elements. In each case one of the raster elements of the first raster arrangement is allocated to one of the raster elements of the second raster arrangement for guiding a partial bundle of an entire bundle of illumination light. The first raster arrangement for example has at least two types (I, II, III) of the first raster elements which have different bundle-influencing effects.Type: GrantFiled: July 19, 2011Date of Patent: October 28, 2014Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Frank Schlesener, Nils Haverkamp, Vladimir Davydenko, Michael Gerhard, Gerhard-Wilhelm Ziegler, Mirco Kern, Thomas Bischoff, Thomas Stammler, Stephan Kellner, Manfred Maul, Daniel Walldorf, Igor Hurevich, Markus Deguenther
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Patent number: 8730455Abstract: An illumination system for a microlithographic projection exposure step-and-scan apparatus has a light source, a first optical raster element and a second optical raster element. The first optical raster element extends in a first pupil plane of the illumination system and is designed such that the geometrical optical flux of the system is increased perpendicular to a scan direction of the projection exposure apparatus. The second optical raster element extends in a second pupil plane of the illumination system, which is not necessarily different from the first pupil plane, and is designed such that the geometrical optical flux of the system is increased in the scan direction and perpendicular thereto. This makes it possible to improve the irradiance uniformity in a reticle plane.Type: GrantFiled: July 12, 2011Date of Patent: May 20, 2014Assignee: Carl Zeiss SMT GmbHInventors: Damian Fiolka, Manfred Maul, Axel Scholz, Markus Deguenther, Johannes Wangler, Vladimir Davydenko
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Patent number: 8520307Abstract: The disclosure relates to an optical integrator configured to produce a plurality of secondary light sources in an illumination system of a microlithographic projection exposure apparatus. The disclosure also relates to a method of manufacturing an array of elongated microlenses for use in such an illumination system. Arrays of elongated microlenses are often contained in optical integrators or scattering plates of such illumination systems.Type: GrantFiled: December 20, 2010Date of Patent: August 27, 2013Assignee: Carl Zeiss SMT GmbHInventors: Oliver Wolf, Heiko Siekmann, Eva Kalchbrenner, Siegfried Rennon, Johannes Wangler, Andre Bresan, Michael Gerhard, Nils Haverkamp, Axel Scholz, Ralf Scharnweber, Michael Layh, Stefan Burkart
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Patent number: 8513628Abstract: The disclosure relates to an EUV (extreme ultraviolet) illumination system. The system can include at least one EUV light source, and an aperture stop and sensor arrangement for the measurement of intensity fluctuations and/or position changes of the EUV light source, in particular in the range of the effectively utilized wavelengths, or of one of the intermediate images of the EUV light source. The aperture stop and sensor arrangement can include an aperture stop and an EUV position sensor. The aperture stop and sensor arrangement can be arranged in such a way that the aperture stop allows a certain solid angle range of the radiation originating from the EUV light source or from one of its intermediate images to fall on the EUV position sensor.Type: GrantFiled: December 15, 2010Date of Patent: August 20, 2013Assignee: Carl Zeiss SMT GmbHInventors: Axel Scholz, Markus Weiss, Manfred Maul, Philipp Bosselmann
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Patent number: 8469436Abstract: A clamping device for sliding roofs is provided in the region of the guidance and runner rail. An actuation lever is pivotable between locking and release positions. A clamping element is modifiable in its position by means of the actuation lever, which coacts with a countermember of the end carriage and moves the end carriage to the end of the guidance and runner rail. The clamping element is aligned with the guidance and runner rail, and is shiftable in a longitudinal direction, between a locking position retaining the end carriage, and a release position. The guide comprises in a subregion on the underside an open space such that upon shifting of the actuation lever into the release position, the clamping element is at least partly lowerable sufficiently that the end carriage can be displaced away from the end of the guidance and runner rail.Type: GrantFiled: August 31, 2010Date of Patent: June 25, 2013Assignee: VBG Group Truck Equipment GmbHInventors: Udo Wensing, Hans Boris Hahnen, Frank Neumeyer, Frank Frentzen, Rolf Birkenbach, Joachim Rossbach, Karl Kemmerling, Axel Scholz, Tim Lauterbach, Rolf Weigelt, Ragnvald Andersson
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Publication number: 20130148092Abstract: Illumination systems for microlithographic projection exposure apparatus, as well as related systems, components and methods are disclosed. In some embodiments, an illumination system includes one or more scattering structures and an optical integrator that produces a plurality of secondary light sources.Type: ApplicationFiled: February 6, 2013Publication date: June 13, 2013Applicant: Carl Zeiss SMT GmbHInventors: Johannes Wangler, Heiko Siekmann, Kenneth Weible, Ralf Scharnweber, Manfred Maul, Markus Deguenther, Michael Layh, Axel Scholz, Uwe Spengler, Reinhard Voelkel
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Patent number: D750544Type: GrantFiled: May 15, 2014Date of Patent: March 1, 2016Assignee: Edscha Trailer Systems GmbHInventors: Ali Akbar Burhanidust, Frank Frentzen, Jorg Grunwald, Karl Kemmerling, Axel Scholz, Rolf Weigelt
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Patent number: D751024Type: GrantFiled: May 15, 2014Date of Patent: March 8, 2016Assignee: Edscha Trailer Systems GmbHInventors: Ali Akbar Burhanidust, Frank Frentzen, Jorg Grunwald, Karl Kemmerling, Axel Scholz, Rolf Weigelt
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Patent number: D753576Type: GrantFiled: May 15, 2014Date of Patent: April 12, 2016Assignee: Edscha Trailer Systems GmbHInventors: Ali Akbar Burhanidust, Frank Frentzen, Jorg Grunwald, Karl Kemmerling, Axel Scholz, Rolf Weigelt