Abstract: A method for adjusting a measuring device having an interferometer unit with an optical axis, an optical distance measuring device with a measuring axis and a support slide that is moveable along a slide axis. The measuring axis is first aligned parallel to the slide axis. An adjustment body with a first spherical reflection and/or diffraction surface and a retro reflector at the back side is arranged at the support slide. It is brought into a first confocal position, in which a first center point of the first spherical reflection/diffraction surface coincides with the focus of the spherical wavefront that is emitted from the interferometer unit. The retro reflector defines a vertex that is located close to the first center point, such that the measuring axis of the distance measuring device extends close to the focus of the emitted spherical wavefront. In doing so, Abbe-faults can be reduced or eliminated.

Abstract: A method for adjusting a measuring device having an interferometer unit with an optical axis, an optical distance measuring device with a measuring axis and a support slide that is moveable along a slide axis. The measuring axis is first aligned parallel to the slide axis. An adjustment body with a first spherical reflection and/or diffraction surface and a retro reflector at the back side is arranged at the support slide. It is brought into a first confocal position, in which a first center point of the first spherical reflection/diffraction surface coincides with the focus of the spherical wavefront that is emitted from the interferometer unit. The retro reflector defines a vertex that is located close to the first center point, such that the measuring axis of the distance measuring device extends close to the focus of the emitted spherical wavefront. In doing so, Abbe-faults can be reduced or eliminated.

Abstract: A metrological apparatus (15) is disposed for adjustment of an attitude of a workpiece (16) having an arcuate upper surface (17) relative to a rotary axis (C) of the metrological apparatus (15). The workpiece (16) is brought into a first rotary position (c1). A plurality of measured points within a measuring plane on the upper surface (17) is recorded. The workpiece (16) is moved into a further rotary position (c2) about the rotary axis (C), and again measured points in the measuring plane (E) on the upper surface (17) of the workpiece (16) are recorded. Based on these recorded measured points, the actual attitude (Li) of the workpiece (16) deviation from a specified target attitude (Ls) are determined. Adjustment parameters are determined, and an adjustment assembly (24) of the metrological apparatus (15) is activated as a function of the calculated adjustment parameters to adjust the workpiece (16).

Abstract: A metrological apparatus (15) is disposed for adjustment of an attitude of a workpiece (16) having an arcuate upper surface (17) relative to a rotary axis (C) of the metrological apparatus (15). The workpiece (16) is brought into a first rotary position (c1). A plurality of measured points within a measuring plane on the upper surface (17) is recorded. The workpiece (16) is moved into a further rotary position (c2) about the rotary axis (C), and again measured points in the measuring plane (E) on the upper surface (17) of the workpiece (16) are recorded. Based on these recorded measured points, the actual attitude (Li) of the workpiece (16) deviation from a specified target attitude (Ls) are determined. Adjustment parameters are determined, and an adjustment assembly (24) of the metrological apparatus (15) is activated as a function of the calculated adjustment parameters to adjust the workpiece (16).