Abstract: An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.

Abstract: An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.

Abstract: An exposure method includes the steps of exposing a pattern of a reticle onto a substrate by scanning the reticle and the substrate, and by illuminating an illumination area having a slit shape on the reticle using a light from a light source, the slit shape having a longitudinal direction corresponding to a direction orthogonal to a scanning direction, and correcting an accumulated illuminance in the scanning direction at each position of the illumination area in the longitudinal direction, wherein the correcting step includes the steps of calculating a first illuminance correction amount common to plural areas on the substrate, the pattern being to be transferred to each area, and calculating a second illuminance correction amount intrinsic to each area, the correcting step correcting the accumulated illuminance based on the first and second illuminance correction amounts.

Abstract: An exposure apparatus includes a reticle stage for supporting a reticle, an illumination optical system for illuminating the reticle, a projection optical system for projecting an image of a pattern of the reticle onto a substrate, a polarization state measuring part for measuring a polarization state, and an optical unit, supported by the reticle stage exchangeable for the reticle, for introducing a light from the illumination optical system to the polarization state measuring part, wherein said polarization state measuring part includes a phase shifter, a polarization element, and a light detector for detecting the light from the illumination optical system via the phase shifter and the polarization element.