Patents by Inventor B. Michael Jacobsson

B. Michael Jacobsson has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Branched siloxanes and methods for synthesis
    Patent number: 9156863
    Abstract: The present invention describes branched and functionalized siloxanes and methods for making such compounds. The compounds have a variety of uses. One preferred application is as novel planarizing material for lithography, in which case functionalized branched siloxane, such as an epoxy-modified branched siloxane is particularly useful.
    Type: Grant
    Filed: February 16, 2011
    Date of Patent: October 13, 2015
    Assignee: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: C. Grant Willson, Tsuyoshi Ogawa, B. Michael Jacobsson
  • Fluorinated silazane release agents in nanoimprint lithography
    Patent number: 8926888
    Abstract: An imprint lithography release agent having general formula (1): where R1 represents H or CH3, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.
    Type: Grant
    Filed: February 24, 2012
    Date of Patent: January 6, 2015
    Assignee: Board of Regents, The University of Texas System
    Inventors: Carlton Grant Willson, Tsuyoshi Ogawa, Michael W. Lin, Daniel J. Hellebusch, B. Michael Jacobsson, William K. Bell
  • FLUORINATED SILAZANE RELEASE AGENTS IN NANOIMPRINT LITHOGRAPHY
    Publication number: 20120217676
    Abstract: An imprint lithography release agent having general formula (1): where R1 represents H or CH3, n is an integer from 1 to 5, and m is an integer from 1 to 40. Fluorinated silazanes of general formula (1) can be used to form a release layer on an imprint lithography template, added to an imprint lithography resist, or both.
    Type: Application
    Filed: February 24, 2012
    Publication date: August 30, 2012
    Applicant: BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM
    Inventors: Carlton Grant Willson, Tsuyoshi Ogawa, Michael W. Lin, Daniel J. Hellebusch, B. Michael Jacobsson, William K. Bell