Patents by Inventor Bappaditya Samanta

Bappaditya Samanta has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Direct incident beam lithography for patterning nanoparticles, and the articles formed thereby
    Patent number: 7846642
    Abstract: Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
    Type: Grant
    Filed: August 18, 2008
    Date of Patent: December 7, 2010
    Assignee: The University of Massachusetts
    Inventors: Yuval Ofir, Vincent Martin Rotello, Mark Thomas Tuominen, Qijun Xiao, Bappaditya Samanta
  • DIRECT INCIDENT BEAM LITHOGRAPHY FOR PATTERNING NANOPARTICLES, AND THE ARTICLES FORMED THEREBY
    Publication number: 20090047485
    Abstract: Disclosed herein is a method for generating a three-dimensional structure on a surface. The method comprises forming a layer comprising a plurality of nanoparticles on a surface; and exposing a portion of the layer to incident radiation having a defined pattern at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure, wherein the three-dimensional structure has a shape defined by the pattern of the radiation and a height defined by the dosage of the incident radiation and a thickness of the nanoparticle layer. Alternatively, the method comprises forming a layer comprising a plurality of nanoparticles on a surface of a three-dimensional template; and exposing at least a portion of the layer to incident radiation at a dosage effective to aggregate the nanoparticles in the exposed portion of the layer into a three-dimensional structure that corresponds to the three-dimensional template.
    Type: Application
    Filed: August 18, 2008
    Publication date: February 19, 2009
    Inventors: Yuval Ofir, Vincent Martin Rotello, Mark Thomas Tuominen, Qijun Xiao, Bappaditya Samanta