Patents by Inventor Bar-Yuan Hsieh

Bar-Yuan Hsieh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10088612
    Abstract: The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.
    Type: Grant
    Filed: November 17, 2015
    Date of Patent: October 2, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Cheng-Chang Hsu, Bar-Yuan Hsieh
  • Patent number: 9897729
    Abstract: The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
    Type: Grant
    Filed: April 16, 2015
    Date of Patent: February 20, 2018
    Assignee: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9568823
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Grant
    Filed: September 9, 2015
    Date of Patent: February 14, 2017
    Assignee: CHI MEI CORPORATION
    Inventors: Yu-Ju Wu, Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9557444
    Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter, and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a specific alkali-soluble resin, a compound containing ethylenic unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition is excellent in developability and high precision pattern linearity and contour angle since the photosensitive resin composition contains a specific alkali-soluble resin.
    Type: Grant
    Filed: August 21, 2014
    Date of Patent: January 31, 2017
    Assignee: Chi Mei Corporation
    Inventor: Bar-Yuan Hsieh
  • Publication number: 20160313639
    Abstract: The invention provides a photosensitive resin composition that can be applied in a pixel layer, a protective film, a spacer, a thin-film transistor, a color filter, and a liquid crystal display apparatus and can provide good development properties and high-precision pattern linearity. The photosensitive resin composition includes: an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), an organic solvent (D), and a compound (E) represented by formula (1).
    Type: Application
    Filed: April 15, 2016
    Publication date: October 27, 2016
    Inventors: Cheng-Chang Hsu, Bar-Yuan Hsieh
  • Publication number: 20160139309
    Abstract: The present invention relates to an alkali-soluble resin (A) and a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes the alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C) and an organic solvent (D). The photosensitive resin composition according to the present invention can improve the change rate of film thickness in thermal solvent and linearity of pattern with high finesse of the color filter.
    Type: Application
    Filed: November 17, 2015
    Publication date: May 19, 2016
    Inventors: CHENG-CHANG HSU, BAR-YUAN HSIEH
  • Publication number: 20160077428
    Abstract: The present invention relates to a photosensitive resin composition for a color filter and uses thereof. The photosensitive resin composition includes an alkali-soluble resin (A), a compound (B) containing an ethylenically unsaturated group, a photoinitiator (C), a pigment (D) and an organic solvent (E). The photosensitive resin composition according to the present invention can improve linearity of pattern with high finesse and developing-resistance of the color filter.
    Type: Application
    Filed: September 9, 2015
    Publication date: March 17, 2016
    Inventors: YU-JU WU, BAR-YUAN HSIEH, JUNG-PIN HSU
  • Publication number: 20150315376
    Abstract: The present invention relates to a photosensitive resin composition for color filter and application thereof. The aforementioned photosensitive resin composition includes an alkali-soluble resin (A), a compound having a vinyl unsaturated group (B), a photo-initiator (C), an organic solvent (D), and a pigment (E). The alkali-soluble resin (A) is obtained by copolymerizing a vinyl unsaturated monomer having a carboxylic group (a1), a vinyl unsaturated monomer having a silane group (a2), a vinyl unsaturated monomer having an oxetanyl group (a3) and an other copolymerizable vinyl unsaturated monomer (a4).
    Type: Application
    Filed: April 16, 2015
    Publication date: November 5, 2015
    Inventors: Bar-Yuan HSIEH, Jung-Pin HSU
  • Patent number: 9164196
    Abstract: The invention relates to a photosensitive resin composition, and it has the advantages of a high development speed and good compatibility. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device.
    Type: Grant
    Filed: May 6, 2013
    Date of Patent: October 20, 2015
    Assignee: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu, Bo-Hsuan Lin
  • Publication number: 20150153646
    Abstract: A photosensitive resin composition is provided. The photosensitive resin composition includes an alkali-soluble resin (A), a polysiloxane polymer (B), a compound (C) containing an ethylenically unsaturated group, a photoinitiator (D), and an organic solvent (E), wherein the alkali-soluble resin (A) includes an alkali-soluble resin (A-1) represented by formula 1.
    Type: Application
    Filed: December 1, 2014
    Publication date: June 4, 2015
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Patent number: 9029052
    Abstract: A photosensitive resin composition, a color filter and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a pigment, an alkali-soluble resin, a compound containing an ethylenically unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition has the advantages of high contrast, low post-baking color difference, and good linearity of high precision pattern.
    Type: Grant
    Filed: November 26, 2014
    Date of Patent: May 12, 2015
    Assignee: Chi Mei Corporation
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu
  • Publication number: 20150060746
    Abstract: An alkali-soluble resin, a photosensitive resin composition, a color filter, and a method for manufacturing the same, and a liquid crystal display apparatus are provided. The photosensitive resin composition includes a specific alkali-soluble resin, a compound containing ethylenic unsaturated group, a photoinitiator, and an organic solvent. The photosensitive resin composition is excellent in developability and high precision pattern linearity and contour angle since the photosensitive resin composition contains a specific alkali-soluble resin.
    Type: Application
    Filed: August 21, 2014
    Publication date: March 5, 2015
    Inventor: Bar-Yuan Hsieh
  • Publication number: 20130299755
    Abstract: The invention relates to a photosensitive resin composition, and it has the advantages of a high development speed and good compatibility. The invention also provides a method for manufacturing a color filter, color filter and liquid crystal display device.
    Type: Application
    Filed: May 6, 2013
    Publication date: November 14, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: BAR-YUAN HSIEH, JUNG-PIN HSU, BO-HSUAN LIN
  • Publication number: 20130222738
    Abstract: A color liquid crystal display device having high color reproduction is provided, which includes a liquid crystal display element and a backlight unit. The liquid crystal display element includes a color filter having a blue filter segment, a green filter segment, and a red filter segment. The blue filter segment is prepared from a blue photosensitive resin composition which includes a blue pigment combination, a red dye component, an alkali-soluble resin, a compound having at least one ethylenically unsaturated group, a photoinitiator, and a solvent. The blue pigment combination includes a copper phthalocyanine-based blue pigment. The backlight unit is coupled to the liquid crystal display element and has a color temperature ranging from 8,000 K to 20,000 K.
    Type: Application
    Filed: February 8, 2013
    Publication date: August 29, 2013
    Applicant: CHI MEI CORPORATION
    Inventors: Bar-Yuan Hsieh, Jung-Pin Hsu, Bo-Hsuan Lin