Patents by Inventor Barry Lewis
Barry Lewis has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20160013018Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: ApplicationFiled: September 22, 2015Publication date: January 14, 2016Applicant: Entegris, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Publication number: 20150357152Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, equilibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.Type: ApplicationFiled: August 17, 2015Publication date: December 10, 2015Applicant: Entegris, Inc.Inventors: Edward E. Jones, Sharad N. Yedave, Ying Tang, Barry Lewis Chambers, Robert Kaim, Joseph D. Sweeney, Oleg Byl, Peng Zou
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Patent number: 9142387Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: December 3, 2013Date of Patent: September 22, 2015Assignee: ENTEGRIS, INC.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Publication number: 20150247605Abstract: A fluid supply package comprising a pressure-regulated fluid storage and dispensing vessel, a valve head adapted for dispensing of fluid from the vessel, and an anti-pressure spike assembly adapted to combat pressure spiking in flow of fluid at inception of fluid dispensing.Type: ApplicationFiled: September 20, 2013Publication date: September 3, 2015Inventors: Joseph R. Despres, Joseph D. Sweeney, Edward E. Jones, Matthew B. Donatucci, Chiranjeevi Pydi, Edward A. Sturm, Barry Lewis Chambers, Gregory Scott Baumgart
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Patent number: 9111860Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.Type: GrantFiled: August 5, 2014Date of Patent: August 18, 2015Assignee: ENTEGRIS, INC.Inventors: Edward E. Jones, Sharad N. Yedave, Ying Tang, Barry Lewis Chambers, Robert Kaim, Joseph D. Sweeney, Oleg Byl, Peng Zou
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Publication number: 20150003051Abstract: A tray assembly is disclosed. The tray assembly includes a generally planar substrate having a top surface and a bottom surface, a sleeve extending downwardly from the bottom surface of the substrate, and a solar cell integrated into the top surface. A light source is electrically coupled to the solar cell.Type: ApplicationFiled: July 1, 2014Publication date: January 1, 2015Inventor: Barry Lewis
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Publication number: 20140342538Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.Type: ApplicationFiled: August 5, 2014Publication date: November 20, 2014Applicant: Advanced Technology Materials, Inc.Inventors: Edward E. Jones, Sharad N. Yedave, Ying Tang, Barry Lewis Chambers, Robert Kaim, Joseph D. Sweeney, Oleg Byl, Peng Zou
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Patent number: 8796131Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.Type: GrantFiled: October 25, 2010Date of Patent: August 5, 2014Assignee: Advanced Technology Materials, Inc.Inventors: Edward E. Jones, Sharad N. Yedave, Ying Tang, Barry Lewis Chambers, Robert Kaim, Joseph D. Sweeney, Oleg Byl, Peng Zou
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Publication number: 20140157588Abstract: A single piece pulsed flow wing assembly method providing for horizontal wing manufacture is accomplished using synchronized automated vehicles guided in a predetermined manner to move and, locate wing structure in a plurality of assembly positions. Multi-axis assembly positioning systems (MAPS) are used at each assembly position to support and index components in the wing structure and determinant assembly techniques are used for indexing of the components. Modular automated manufacturing processes employing magnetic assembly clamping, drilling, fastener insertion, and sealant application are employed.Type: ApplicationFiled: February 18, 2014Publication date: June 12, 2014Applicant: THE BOEING COMPANYInventors: Philip W. Boyd, John W. Hall, Clayton L. Munk, James C. Roberts, Michael J. Fant, Richard D. Fiedler, Barry A. Lewis, Samuel R. Dobbs, Gary E. Mansell
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Publication number: 20140090598Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: ApplicationFiled: December 3, 2013Publication date: April 3, 2014Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Patent number: 8661684Abstract: A single piece pulsed flow wing assembly method providing for horizontal wing manufacture is accomplished using synchronized automated vehicles guided in a predetermined manner to move and, locate wing structure in a plurality of assembly positions. Multi-axis assembly positioning systems (MAPS) are used at each assembly position to support and index components in the wing structure and determinant assembly techniques are used for indexing of the components. Modular automated manufacturing processes employing magnetic assembly clamping, drilling, fastener insertion, and sealant application are employed.Type: GrantFiled: January 21, 2010Date of Patent: March 4, 2014Assignee: The Boeing CompanyInventors: Philip W. Boyd, John W Hall, Clayton L. Munk, James C. Roberts, Michael J. Fant, Richard D. Fiedler, Barry A. Lewis, Samuel R. Dobbs, Gary E. Mansell
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Patent number: 8655960Abstract: A method includes receiving, at a carrier network provider, a request from a requestor's mobile device to locate an instant messaging (IM) friend from the requestor's IM friends list; authenticating the request for use of location-based services on the carrier network; receiving geographic location coordinates from the requestor's mobile device; adding random error to the geographic location coordinates; sending the request to locate an IM friend and the geographic location coordinates with random error to an IM portal; receiving a list of the requestor's IM friends within a particular region near the geographic location coordinates with random error; and sending to the requestor's mobile device the list of IM friends within the particular region near the geographic location coordinates with random error.Type: GrantFiled: June 19, 2008Date of Patent: February 18, 2014Assignee: Verizon Patent and Licensing Inc.Inventors: Joseph Barry Lewis, II, Biren Patel, Sanjeevan Sivalingham
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Patent number: 8598022Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: November 19, 2011Date of Patent: December 3, 2013Assignee: Advanced Technology Materials, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Patent number: 8554583Abstract: In one aspect, the invention comprises a computer implemented method comprising: (a) determining an average monthly cost of long term care for a consumer; (b) determining an estimated total cost of long term care for the consumer; (c) receiving and storing in a computer readable medium data describing the consumer's preferences regarding long term care resources; (d) calculating with a processor an initial benefit amount for the consumer; (e) adjusting with a processor the initial benefit amount based on the data describing the consumer's preferences to determine a total benefit amount; and (f) recommending a long term care policy providing the total benefit amount to the consumer, wherein the processors may the same processor or different processors. Other aspects of the invention comprise related method, computer system, and software embodiments.Type: GrantFiled: April 13, 2009Date of Patent: October 8, 2013Assignee: Metropolitan Life Insurance Co.Inventors: Daniel Mule, Barry Lewis Higgins, David Dutille, Terri Hoffman
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Publication number: 20120252195Abstract: An ion implantation system and method, providing cooling of dopant gas in the dopant gas feed line, to combat heating and decomposition of the dopant gas by arc chamber heat generation, e.g., using boron source materials such as B2F4 or other alternatives to BF3. Various arc chamber thermal management arrangements are described, as well as modification of plasma properties, specific flow arrangements, cleaning processes, power management, eqillibrium shifting, optimization of extraction optics, detection of deposits in flow passages, and source life optimization, to achieve efficient operation of the ion implantation system.Type: ApplicationFiled: October 25, 2010Publication date: October 4, 2012Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Edward E. Jones, Sharad N. Yedave, Ying Tang, Barry Lewis Chambers, Robert Kaim, Joseph D. Sweeney, Oleg Byl, Peng Zou
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Publication number: 20120111374Abstract: Apparatus and methods for cleaning ion implanters and/or components thereof are described, utilizing cleaning agents reacted with residue deposits to effect removal thereof. An endpoint detection apparatus and method are also disclosed, which may be integrated in the cleaning apparatus and methods to provide highly efficient utilization of the cleaning agent and avoidance of deleterious effects that otherwise can occur when cleaning agents are continued to be exposed to an implanter or components thereof after cleaning has been completed.Type: ApplicationFiled: November 8, 2011Publication date: May 10, 2012Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Joseph R. Despres, James V. McManus, Richard D. Chism, Edward E. Jones, Joseph D. Sweeney, Steven G. Sergi, Ying Tang, Michael J. Wodjenski, Richard S. Ray, Barry Lewis Chambers
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Publication number: 20120108044Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: ApplicationFiled: November 19, 2011Publication date: May 3, 2012Applicant: ADVANCED TECHNOLOGY MATERIALS, INC.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Patent number: 8138071Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: October 27, 2010Date of Patent: March 20, 2012Assignee: Advanced Technology Materials, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Patent number: 8062965Abstract: An isotopically-enriched, boron-containing compound comprising two or more boron atoms and at least one fluorine atom, wherein at least one of the boron atoms contains a desired isotope of boron in a concentration or ratio greater than a natural abundance concentration or ratio thereof. The compound may have a chemical formula of B2F4. Synthesis methods for such compounds, and ion implantation methods using such compounds, are described, as well as storage and dispensing vessels in which the isotopically-enriched, boron-containing compound is advantageously contained for subsequent dispensing use.Type: GrantFiled: March 15, 2011Date of Patent: November 22, 2011Assignee: Advanced Technology Materials, Inc.Inventors: Robert Kaim, Joseph D. Sweeney, Oleg Byl, Sharad N. Yedave, Edward E. Jones, Peng Zou, Ying Tang, Barry Lewis Chambers, Richard S. Ray
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Patent number: 8041489Abstract: A method for controlling a transmission in a motor vehicle during acceleration from an idle condition begins when the vehicle is stationary, the engine is at idle, and the transmission is in the first gear range or ratio. When the vehicle begins to accelerate, the method includes the steps of monitoring the rate of vehicle acceleration and comparing the rate of vehicle acceleration to a rate of vehicle acceleration threshold. If the rate of vehicle acceleration is less than the acceleration threshold, then the transmission allows one of the currently engaged clutches to slip. This clutch slip reduces the torque load on the engine. The method then monitors the engine output speed. If the engine output speed exceeds an engine output speed threshold, then the clutch is fully applied.Type: GrantFiled: October 23, 2008Date of Patent: October 18, 2011Assignee: GM Global Technology Operations LLCInventors: William J. Wegeng, Peter Edwin Swingler, Edmond M. Etchason, Barry Lewis Ladd