Patents by Inventor Barry Loevsky
Barry Loevsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11663937Abstract: A pupil tracking system including a light source for illuminating a viewer's eye, an aperture located to pass light from the light source after retro-reflection from the viewer's pupil, the aperture sized and shaped to pass the light from the light source and block at least a portion of other light arriving at the aperture, and a light sensor for tracking a location of a spot produced by the light from the light source which passed the aperture. Related apparatus and methods are also described.Type: GrantFiled: February 19, 2018Date of Patent: May 30, 2023Assignee: Real View Imaging Ltd.Inventors: Barry Loevsky, Shlomo Alon-Braitbart, Shaul Alexander Gelman, Carmel Rotschild
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Patent number: 11060845Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.Type: GrantFiled: October 28, 2019Date of Patent: July 13, 2021Assignee: KLA CorporationInventors: Eran Amit, Barry Loevsky, Andrew Hill, Amnon Manassen, Nuriel Amir, Vladimir Levinski, Roie Volkovich
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Patent number: 10877437Abstract: A method for directing non-modulated light from a Spatial Light Modulator (SLM) and allowing through modulated light for producing an interference based holographic image, the method including illuminating the SLM with coherent light, thereby producing a mix of light modulated by the SLM and light not modulated by the SLM, and projecting the mix of the modulated light and the not modulated light along an optical axis onto a volume grating, wherein the volume grating directs the not modulated light away from the holographic image and allows through modulated light for producing the holographic image. Related apparatus and methods are also described.Type: GrantFiled: August 21, 2018Date of Patent: December 29, 2020Assignee: Real View imaging Ltd.Inventors: Shaul Alexander Gelman, Shlomo Alon-Braitbart, Barry Loevsky, Or Peleg, Carmel Rotschild
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Publication number: 20200184865Abstract: A pupil tracking system including a light source for illuminating a viewer's eye, an aperture located to pass light from the light source after retro-reflection from the viewer's pupil, the aperture sized and shaped to pass the light from the light source and block at least a portion of other light arriving at the aperture, and a light sensor for tracking a location of a spot produced by the light from the light source which passed the aperture. Related apparatus and methods are also described.Type: ApplicationFiled: February 19, 2018Publication date: June 11, 2020Applicant: Real View Imaging Ltd.Inventors: Barry LOEVSKY, Shlomo ALON-BRAITBART, Shaul Alexander GELMAN, Carmel ROTSCHILD
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Publication number: 20200158492Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.Type: ApplicationFiled: October 28, 2019Publication date: May 21, 2020Inventors: Eran Amit, Barry LOEVSKY, Andrew HILL, Amnon MANASSEN, Nuriel AMIR, Vladimir LEVINSKI, Roie VOLKOVICH
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Patent number: 10458777Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.Type: GrantFiled: November 23, 2015Date of Patent: October 29, 2019Assignee: KLA-Tencor CorporationInventors: Eran Amit, Barry Loevsky, Andrew Hill, Amnon Manassen, Nuriel Amir, Vladimir Levinski, Roie Volkovich
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Patent number: 10352766Abstract: Focusing modules and methods are provided, which use a spatial light modulator (SLM) configured to yield a circumferentially sinusoidal pattern to derive focusing signals. For example, the SLM may comprise an optical chopper wheel made of a glass disc with a circumferentially sinusoidal pattern. The circumferentially sinusoidal pattern simplifies phase derivation from the focusing signal, providing a faster and more accurate estimation of defocusing. Signal detection may be carried out by a diode array that provides a more accurate signal faster, as well as a more differentiated analysis of the focusing signal than the one available by current technology.Type: GrantFiled: December 10, 2015Date of Patent: July 16, 2019Assignee: KLA-Tencor CorporationInventors: Barry Loevsky, Ari Krauss, Avraham Bakal
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Patent number: 10209183Abstract: A scatterometry measurement system includes an objective lens with a central obscuration and an illumination source configured to illuminate a scatterometry target through the objective lens with a first illumination beam at a first illumination angle and a second illumination beam at a second illumination angle in which the scatterometry target includes periodic structures located in at least two layers. The objective lens collects at least one diffracted order from the first illumination beam and at least one diffracted order from the second illumination beam such that the at least one diffracted order from the first illumination beam and the at least one diffracted order from the second illumination beam have a non-overlapping distribution in a portion of an imaging pupil plane not blocked by the central obscuration.Type: GrantFiled: July 14, 2017Date of Patent: February 19, 2019Assignee: KLA-Tencor CorporationInventors: Tzahi Grunzweig, Andrew Hill, Barry Loevsky
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Patent number: 10190979Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.Type: GrantFiled: October 30, 2015Date of Patent: January 29, 2019Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Yuri Paskover, Barry Loevsky, Daria Negri
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Publication number: 20190004478Abstract: A method for directing non-modulated light from a Spatial Light Modulator (SLM) and allowing through modulated light for producing an interference based holographic image, the method including illuminating the SLM with coherent light, thereby producing a mix of light modulated by the SLM and light not modulated by the SLM, and projecting the mix of the modulated light and the not modulated light along an optical axis onto a volume grating, wherein the volume grating directs the not modulated light away from the holographic image and allows through modulated light for producing the holographic image. Related apparatus and methods are also described.Type: ApplicationFiled: August 21, 2018Publication date: January 3, 2019Inventors: Shaul Alexander GELMAN, Shlomo Alon-Braitbart, Barry Loevsky, Or Peleg, Carmel Rotschild
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Publication number: 20180003630Abstract: A scatterometry measurement system includes an objective lens with a central obscuration and an illumination source configured to illuminate a scatterometry target through the objective lens with a first illumination beam at a first illumination angle and a second illumination beam at a second illumination angle in which the scatterometry target includes periodic structures located in at least two layers. The objective lens collects at least one diffracted order from the first illumination beam and at least one diffracted order from the second illumination beam such that the at least one diffracted order from the first illumination beam and the at least one diffracted order from the second illumination beam have a non-overlapping distribution in a portion of an imaging pupil plane not blocked by the central obscuration.Type: ApplicationFiled: July 14, 2017Publication date: January 4, 2018Inventors: Tzahi Grunzweig, Andrew HILL, Barry LOEVSKY
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Patent number: 9719920Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.Type: GrantFiled: September 26, 2014Date of Patent: August 1, 2017Assignee: KLA-Tencor CorporationInventors: Tzahi Grunzweig, Andrew Hill, Barry Loevsky
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Patent number: 9429856Abstract: An overlay target for a semiconductor device is disclosed. The overlay measurement target includes a first ring target located on a first measured layer of the semiconductor device. The first ring target includes a plurality of detectable features arranged in a circular manner having a first circumference. The overlay measurement target also includes a second ring target located on a second measured layer of the semiconductor device. The second ring target includes a plurality of detectable features arranged in a circular manner having a second circumference different from the first circumference. The displacement between a detected center of the first ring target and a detected center of the second ring target indicates an overlay error between the first measured layer and the second measured layer.Type: GrantFiled: January 21, 2014Date of Patent: August 30, 2016Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Barry Loevsky
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Publication number: 20160178351Abstract: Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.Type: ApplicationFiled: November 23, 2015Publication date: June 23, 2016Inventors: Eran AMIT, Barry LOEVSKY, Andrew HILL, Amnon MANASSEN, Nuriel AMIR, Vladimir LEVINSKI, Roie VOLKOVICH
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Publication number: 20160084758Abstract: Metrology targets, design files, and design and production methods thereof are provided. Metrology targets comprising at least one reflection-symmetric pair of reflection-asymmetric structures are disclosed. The structures may or may not be periodic, may comprise a plurality of unevenly-spaced target elements, which may or may not be segmented. The asymmetry may be with respect to target element segmentation or structural dimensions. Also, target design files and metrology measurements of the various metrology targets are disclosed.Type: ApplicationFiled: October 30, 2015Publication date: March 24, 2016Inventors: Amnon Manassen, Yuri Paskover, Barry Loevsky, Daria Negri
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Patent number: 9255787Abstract: Metrology targets and method of using the metrology targets for measurement of critical dimension, overlay or scanner aberration are disclosed. A target may include an unresolved grid having a plurality of lines spaced equally apart from each other according to a pre-determined pitch distance and at least one resolved feature tilted at an angle with respect to the unresolved grid. The method may indentify multiple regions of interest (ROIs) and determine a series of center points between the ROIs as the ROIs are being shifted. Critical dimension, overlay or scanner aberration may be calculated by analyzing the series of center points between the ROIs.Type: GrantFiled: January 21, 2014Date of Patent: February 9, 2016Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Barry Loevsky
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Patent number: 9182219Abstract: A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.Type: GrantFiled: January 21, 2014Date of Patent: November 10, 2015Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Barry Loevsky, Zeev Bomzon
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Patent number: 9123649Abstract: Various target configurations are disclosed. A target may include multiple lines spaced equally apart according to a pitch distance. The target may also include a first mark having at least one edge parallel to the lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having an amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch. The target may further include a second mark having at least one edge parallel to the plurality of lines, wherein the edge is configured to have at least one of: a periodically repetitive edge pattern having a second amplitude that is a multiple of the pitch, a length that is a multiple of the pitch, or a thickness that is a multiple of the pitch.Type: GrantFiled: January 21, 2014Date of Patent: September 1, 2015Assignee: KLA-Tencor CorporationInventors: Amnon Manassen, Barry Loevsky
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Publication number: 20150022822Abstract: Scatterometry measurement systems, illumination configurations and respective methods are provided, which comprise illumination beams that have vertical projections on a target plane comprising both a parallel component and a perpendicular component, with respect to a target measurement direction. The illumination beams propagate at an angle to the plane defined by the measurement direction and a normal to the targets surface and generate diffraction images which are off-center at the imaging pupil plane. The eccentric diffraction images are spatially arranged to avoid overlaps and to correspond to measurement requirements such as spot sizes, number of required diffraction orders and so forth. The illumination beams may be implemented using illumination pupil masks, which provide a simple way to increase scatterometry measurements throughput.Type: ApplicationFiled: September 26, 2014Publication date: January 22, 2015Inventors: Tzahi Grunzweig, Andrew Hill, Barry Loevsky