Patents by Inventor Bart van Knippenberg

Bart van Knippenberg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240128050
    Abstract: A method of automated data acquisition for a transmission electron microscope, the method comprising: obtaining a reference image of a sample at a first magnification; for each of a first plurality of target locations identified in the reference image: steering an electron beam of the transmission electron microscope to the target location, obtaining a calibration image of the sample at a second magnification greater than the first magnification, and using image processing techniques to identify an apparent shift between an expected position of the target location in the calibration image and an observed position of the target location in the calibration image, training a non-linear model using the first plurality of target locations and the corresponding apparent shifts; based on the non-linear model, calculating a calibrated target location for a next target location; steering the electron beam to the calibrated target location and obtaining an image at a third magnification greater than the first magnifica
    Type: Application
    Filed: September 28, 2023
    Publication date: April 18, 2024
    Applicant: FEI Company
    Inventors: Yuchen DENG, Holger KOHR, Bart VAN KNIPPENBERG, Peter TIEMEIJER, Lingbo YU
  • Patent number: 11887809
    Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.
    Type: Grant
    Filed: January 24, 2022
    Date of Patent: January 30, 2024
    Assignee: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
  • Publication number: 20230245291
    Abstract: Various approaches are provided for automatically focusing particle beams for SPA. In one example, a method includes determining a focus adjustment for a region of a sample to achieve a targeted defocus based on at least one defocus measurement from at least one neighboring region of the sample, and causing an acquisition of an image of the sample at the region with the focus adjustment. In this way, a targeted defocus may be achieved across regions of a sample with reduced auxiliary imaging, thereby providing increased and uniform image quality while reducing the time and thus increasing the throughput of processing.
    Type: Application
    Filed: January 28, 2022
    Publication date: August 3, 2023
    Applicant: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr
  • Publication number: 20230238207
    Abstract: Computer-implemented methods for controlling a charged particle microscopy system include estimating a drift of a stage of the charged particle microscopy system based on an image sequence, and automatically adjusting a stage settling wait duration based on the drift estimate. Charged particle microscopy systems include an imaging system, a movement stage, and a processor and memory configured with computer-executable instructions that, when executed, cause the processor to estimate a stage settling duration of the movement stage based on an image sequence obtained with the imaging system, and automatically adjust a stage settling wait duration for the movement stage based on the stage settling duration.
    Type: Application
    Filed: January 24, 2022
    Publication date: July 27, 2023
    Applicant: FEI Company
    Inventors: Yuchen Deng, Erik Franken, Bart van Knippenberg, Holger Kohr