Patents by Inventor Bartholomeus Catharina Thomas VAN BREE

Bartholomeus Catharina Thomas VAN BREE has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8755030
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.
    Type: Grant
    Filed: March 9, 2011
    Date of Patent: June 17, 2014
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Louis Valentin, Antonius Franciscus Johannes De Groot, Robert-Han Munnig Schmidt, Johannes Petrus Martinus Bernardus Vermeulen, Bartholomeus Catharina Thomas Van Bree
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20110222039
    Abstract: A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. An optical element of the projection system is adjustable. The lithographic apparatus includes a controller to control the adjustable optical element. The controller is arranged to drive the optical element so as to at least partly compensate for a magnification resulting from a bending of the patterning device.
    Type: Application
    Filed: March 9, 2011
    Publication date: September 15, 2011
    Applicant: ASML Netherlands B.V.
    Inventors: Christiaan Louis VALENTIN, Antonius Franciscus Johannes DE GROOT, Robert-Han MUNNIG SCHMIDT, Johannes Petrus Martinus Bernardus VERMEULEN, Bartholomeus Catharina Thomas VAN BREE