Abstract: A method of coating a substrate is disclosed in which a gas is activated using an electron beam. The coated substrate is then sliced using a particle beam to reveal, in cross-section, features of the resist. Those features of the resist are measured using a scanning electron microscope and a particle beam is used to take a slice of the substrate to reveal a new cross-section. This new cross-section is then measured using the scanning electron microscope and in this way a three dimensional map of the features may be built up.

Abstract: The invention includes a lithographic system having a first source for generating radiation with a first wavelength and an alignment system with a second source for generating radiation with a second wavelength. The second wavelength is larger than the first wavelength. A marker structure is provided having a first layer and a second layer. The second layer is present either directly or indirectly on top of said first layer. The first layer has a first periodic structure and the second layer has a second periodic structure. At least one of the periodic structures has a plurality of features in at least one direction with a dimension smaller than 400 nm. Additionally, a combination of the first and second periodic structure forms a diffractive structure arranged to be illuminated by radiation with the second wavelength.