Patents by Inventor Bastiaan Lambertus Wilhelmus Marinus Van De Ven
Bastiaan Lambertus Wilhelmus Marinus Van De Ven has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230384694Abstract: Systems, apparatuses, and methods are provided for manufacturing a substrate table. An example method can include forming a vacuum sheet including a plurality of vacuum connections and a plurality of recesses configured to receive a plurality of burls disposed on a core body for supporting an object such as a wafer. Optionally, at least one burl can be surrounded, partially or wholly, by a trench. The example method can further include using the vacuum sheet to mount the core body to an electrostatic sheet including a plurality of apertures configured to receive the plurality of burls. Optionally, the example method can include using the vacuum sheet to mount the core body to the electrostatic sheet such that the plurality of recesses of the vacuum sheet line up with the plurality of burls of the core body and the plurality of apertures of the electrostatic sheet.Type: ApplicationFiled: December 2, 2021Publication date: November 30, 2023Applicant: ASML Netherlands B.V.Inventors: Abdullah ALIKHAN, Tammo UITTERDIJK, Johannes Bernardus Charles ENGELEN, Daniel KAMIENIECKI, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Thomas POIESZ, Leon Martin LEVASIER, Jim Vincent OVERKAMP, Johannes Adrianus Cornelis Maria PIJNENBURG, Koos VAN BERKEL, Gregory James DIGUIDO, Anthony C. SOCCI, JR., Iliya SIGAL, Bram Antonius Gerardus LOMANS, Michel Ben Isel HABETS
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Publication number: 20230236518Abstract: An object holder configured to support an object, the object holder comprising: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers; and a circumferential barrier for reducing outflow of gas escaping from space between the object and the core body.Type: ApplicationFiled: June 9, 2021Publication date: July 27, 2023Applicant: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Koos VAN BERKEL, Marcus Adrianus VAN DE KERKHOF, Roger Franciscus Mattheus Maria HAMELINCK, Shahab SHERVIN, Marinus Augustinus Christiaan VERSCHUREN, Johannes Bernardus Charles ENGELEN, Matthias KRUIZINGA, Tammo UITTERDIJK, Oleksiy Sergiyovich GALAKTIONOV, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Peter VAN DELFT
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Publication number: 20230105002Abstract: An object holder configured to support an object, the object holder including: a core body comprising a plurality of burls having distal ends in a support plane for supporting the object; and an electrostatic sheet between the burls, the electrostatic sheet comprising an electrode sandwiched between dielectric layers, wherein the electrostatic sheet is bonded to the core body by a bonding material having a thickness of at least 100 nm.Type: ApplicationFiled: February 25, 2021Publication date: April 6, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Johannes Bernardus Charles ENGELEN, Arnoud Willem NOTENBOOM, Jim Vincent OVERKAMP, Kjeld Gertrudus Hendrikus JANSSEN, Johannes Adrianus Cornelis Maria PIJNENBURG, Jeroen VAN DUIVENBODE, Erik Johannes NIEUWENHUIS, Koos VAN BERKEL
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Publication number: 20230064193Abstract: Disclosed is a method of measuring a periodic structure on a substrate with illumination radiation having at least one wavelength, the periodic structure having at least one pitch. The method comprises configuring, based on a ratio of said pitch and said wavelength, one or more of: an illumination aperture profile comprising one or more illumination regions in Fourier space; an orientation of the periodic structure for a measurement; and a detection aperture profile comprising one or more separated detection regions in Fourier space. This configuration is such that: i) diffracted radiation of at least a pair of complementary diffraction orders is captured within the detection aperture profile, and ii) said diffracted radiation fills at least 80% of the one or more separated detection regions. The periodic structure is measured while applying the configured one or more of illumination aperture profile, detection aperture profile and orientation of the periodic structure.Type: ApplicationFiled: January 20, 2021Publication date: March 2, 2023Applicant: ASML Netherlands B.V.Inventors: Patricius Aloysius Jacobus TINNEMANS, Patrick WARNAAR, Vasco Tomas TENNER, Hugo Augustinus Joseph CRAMER, Bram Antonius Gerardus LOMANS, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Ahmet Burak CUNBUL, Alexander Prasetya KONIJNENBERG
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Patent number: 10904994Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.Type: GrantFiled: November 1, 2019Date of Patent: January 26, 2021Assignee: ASML Netherlands B.V.Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
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Patent number: 10750604Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.Type: GrantFiled: November 22, 2016Date of Patent: August 18, 2020Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Wilhelmus Henricus Theodorus Maria Aangenent, Ronald Johannes Hultermans, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Peter Wilhelm Hendrik Van Putten
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Publication number: 20200183288Abstract: A clear-out tool is described, the clear-out tool being configured to at least partially remove a masking layer from a target area of an object using a laser beam. The clear-out tool includes a barrier member configured to be arranged above a surface of the object containing the target area and configured to contain a liquid in a space next to the target area or surrounding the target area.Type: ApplicationFiled: July 19, 2018Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Yang-Shan HUANG, Andre Bernardus JEUNINK, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Victoria VORONINA
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Publication number: 20200128657Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.Type: ApplicationFiled: November 1, 2019Publication date: April 23, 2020Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
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Patent number: 10499485Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.Type: GrantFiled: April 25, 2018Date of Patent: December 3, 2019Assignee: ASML Netherlands B.V.Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
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Patent number: 10481498Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.Type: GrantFiled: December 15, 2016Date of Patent: November 19, 2019Assignee: ASML Netherlands B.V.Inventors: Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Koen Gerhardus Winkels, Theodorus Wilhelmus Driessen, Georgiy O. Vaschenko, Peter Michael Baumgart, Wilhelmus Henricus Theodorus Maria Aangenent, Jan Okke Nieuwenkamp, Wim Ronald Kampinga, Jari Ruotsalainen
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Publication number: 20180364580Abstract: Droplet generators, such as used in an EUV radiation source, and associated EUV radiation sources and lithographic apparatuses. A droplet generator can include a nozzle assembly to emit the fuel as droplets, the nozzle assembly being within a pressurized environment at substantially the same pressure as the fuel pressure within the droplet generator. A droplet generator can include an actuator in contact with and biased against a pump chamber by means of a biasing mechanism having an actuator support biased against the actuator. The actuator acts on the fuel within the pump chamber to create droplets. The actuator support has a material with a greater coefficient of thermal expansion than its surrounding structure, such that it is moveable within the surrounding structure at ambient temperature, but expands against the surrounding structure at an operating temperature, so as to clamp the actuator support against the surrounding structure at the operating temperature.Type: ApplicationFiled: December 15, 2016Publication date: December 20, 2018Inventors: Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Koen Gerhardus Winkels, Theodorus Wilhelmus Driessen, Georgiy O. Vaschenko, Peter Michael Baumgart, Wilhelmus Henricus Theodorus Maria Aangenent, Jan Okke Nieuwenkamp, Wim Ronald Kampinga, Jari Ruotsalainen
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Publication number: 20180368241Abstract: An EUV source for generating a beam of EUV radiation, has a droplet generator with a nozzle assembly to emit droplets of fuel from a nozzle towards a plasma formation location. The nozzle assembly receives the fuel from a reservoir. The nozzle assembly has a pump chamber receiving the fuel from the reservoir and an actuator to vibrate a membrane that forms a wall of the pump chamber. The wall is oriented perpendicularly to a direction wherein the nozzle emits the fuel. The nozzle assembly has first and second nozzle filters non-adjacently arranged in series in a path of the fuel from the pump chamber to the nozzle.Type: ApplicationFiled: November 22, 2016Publication date: December 20, 2018Inventors: Johan Frederik DIJKSMAN, Wilhelmus Henricus Theodorus Maria AANGENENT, Ronald Johannes HULTERMANS, Bastiaan Lambertus Wilhelmus Marinus VAN DE VEN, Peter Wilhelm Hendrik VAN PUTTEN
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Publication number: 20180368242Abstract: A supply system for an extreme ultraviolet (EUV) light source includes an apparatus configured to be fluidly coupled to a reservoir configured to contain target material that produces EUV light in a plasma state, the apparatus including two or more target formation units, each one of the target formation units including: a nozzle structure configured to receive the target material from the reservoir, the nozzle structure including an orifice configured to emit the target material to a plasma formation location. The supply system further includes a control system configured to select a particular one of the target formation units for emitting the target material to the plasma formation location. An apparatus for a supply system of an extreme ultraviolet (EUV) light source includes a MEMS system fabricated in a semiconductor device fabrication technology, and the MEMS system including a nozzle structure configured to be fluidly coupled to a reservoir.Type: ApplicationFiled: April 25, 2018Publication date: December 20, 2018Inventors: Koen Gerhardus Winkels, Georgiy O. Vaschenko, Theodorus Wilhelmus Driessen, Johan Frederik Dijksman, Bastiaan Lambertus Wilhelmus Marinus van de Ven, Wilhelmus Henricus Theodorus Maria Aangenent
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Patent number: 9921494Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.Type: GrantFiled: April 12, 2013Date of Patent: March 20, 2018Assignee: ASML NETHERLANDS B.V.Inventors: Theodorus Petrus Maria Cadee, Sander Christiaan Broers, Sven Antoin Johan Hol, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Bastiaan Lambertus Wilhelmus Marinus Van De Ven
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Patent number: 9753381Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.Type: GrantFiled: February 15, 2013Date of Patent: September 5, 2017Assignee: ASML NETHERLANDS B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Hans Butler
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Patent number: 9726985Abstract: A movable stage system is configured to support an object subjected to a lithography process. A short stroke part (SS) is configured to support the object (W) and a long stroke part (LS) is configured to support the short stroke part. The short stroke part is movable over a relative small range of movement with respect to the long stroke part. The long stroke part is movable over a relative large range of movement with respect to a base support arranged to support the long stroke part. A shielding element (SE) is arranged between the short and long stroke parts. A position control system (PCS) maintains a substantially constant distance between the shielding element and the short stroke part.Type: GrantFiled: January 25, 2013Date of Patent: August 8, 2017Assignees: ASML Netherland B.V., Koninklijke Philips Electronics N.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robertus Mathijs Gerardus Rijs, Richard Henricus Adrianus Van Lieshout
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Patent number: 9329501Abstract: A lithographic apparatus includes a projection system, a substrate table, a plurality of sensors, an actuator and a controller. The projection system is configured to project a patterned beam of radiation onto a substrate. The substrate table is configured to support the substrate and to move relative to the projection system. The plurality of sensors is configured to measure a deformation of the substrate table. The actuator is configured to deform the substrate table. The controller is configured to control the actuator to deform the substrate table based on measurements made by the sensors. The plurality of sensors is located on a first side of the substrate table opposite to a second side of the substrate table facing the projection system. The plurality of sensors is substantially stationary relative to the projection system.Type: GrantFiled: June 12, 2012Date of Patent: May 3, 2016Assignee: ASML NETHERLANDS B.V.Inventors: Yang-Shan Huang, Hans Butler, Jan Van Eijk, Sven Antoin Johan Hol, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen, Theodorus Petrus Maria Cadee, Robbert Edgar Van Leeuwen
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Patent number: 9141003Abstract: A position measurement system configured to measure a position quantity of a movable object in a measurement direction, the system including a radiation source, a beam splitter to split the radiation beam in a measurement beam and a reference beam, a first reflective surface mounted on the movable object to receive the measurement beam, a second reflective surface mounted on a reference object to receive the reference beam, and a detector arranged to receive a first and second reflected beam reflected by the first and second reflective surface, respectively, and configured to provide a signal representative of the position quantity of the movable object based on the first and the second beam, wherein the radiation source and detector are mounted on an object that is different from the movable object and the reference object.Type: GrantFiled: October 12, 2010Date of Patent: September 22, 2015Assignee: ASML NETHERLANDS B.V.Inventors: Ruud Antonius Catharina Maria Beerens, Sjoerd Nicolaas Lambertus Donders, Engelbertus Antonius Fransiscus Van Der Pasch, Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Johannes Petrus Martinus Bernardus Vermeulen
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Publication number: 20150153661Abstract: A substrate table system includes a substrate table and a dual directional motor for moving the substrate table in a plane of movement that is defined by a first direction and a second direction. The dual directional motor includes: a first pusher structure extending in the first direction, the substrate table being movable in respect of the first pusher structure, the first pusher structure and the substrate table being arranged to cooperate to form a first motor to exert a force between the first pusher structure and the substrate table in the first direction; and a second pusher structure extending in the first direction, the substrate table being movable in respect of the second pusher structure, the second pusher structure and the substrate table to cooperate to form a second motor to exert a force between the second pusher structure and the substrate table in the second direction.Type: ApplicationFiled: February 15, 2013Publication date: June 4, 2015Applicant: ASML Netherlands B.V.Inventors: Bastiaan Lambertus Wilhelmus Marinus Van De Ven, Antonius Franciscus Johannes De Groot, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Hans Butler
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Publication number: 20150070678Abstract: A lithographic apparatus comprises a system. The system comprises a first part, a second part and an energy absorbing element. The second part is configured to move relatively to the first part. The system has a gap located between the first part and the second part during an operation mode of the system. The energy absorbing element is for absorbing energy between the first part and the second part when the first part and the second part crash onto each other in a failure mode of the system. The energy absorbing element is outside the gap.Type: ApplicationFiled: April 12, 2013Publication date: March 12, 2015Applicant: ASML Netherlands B.V.Inventors: Theodorus Petrus Maria Cadee, Sander Christiaan Broers, Sven Antoin Johan Hol, Yang-Shan Huang, Antonius Franciscus Johannes De Groot, Bastiaan Lambertus Wilhelmus Marinus Van De Ven