Patents by Inventor Bastiann Onne FAGGINGER AUER

Bastiann Onne FAGGINGER AUER has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • METROLOGY METHOD AND APPARATUS, SUBSTRATE, LITHOGRAPHIC SYSTEM AND DEVICE MANUFACTURING METHOD
    Publication number: 20160334715
    Abstract: In a dark-field metrology method using a small target, a characteristic of an image of the target, obtained using a single diffraction order, is determined by fitting a combination fit function to the measured image. The combination fit function includes terms selected to represent aspects of the physical sensor and the target. Some coefficients of the combination fit function are determined based on parameters of the measurement process and/or target. In an embodiment the combination fit function includes jinc functions representing the point spread function of a pupil stop in the imaging system.
    Type: Application
    Filed: December 30, 2014
    Publication date: November 17, 2016
    Applicant: ASML Netherlands B.V
    Inventors: Hendrik Jan Hidde SMILDE, Bastiann Onne FAGGINGER AUER, Davit HARUTYUNYAN