Patents by Inventor Bauke Jansen
Bauke Jansen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7900641Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: GrantFiled: June 29, 2007Date of Patent: March 8, 2011Assignee: ASML Netherlands B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 7866330Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: GrantFiled: April 11, 2008Date of Patent: January 11, 2011Assignee: ASML Netherlands B.V.Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Publication number: 20100328634Abstract: A method of cleaning an immersion lithographic apparatus is disclosed in which a cleaner is added to immersion liquid for use during exposure of a substrate. The cleaner may be a combination of a soap and a solvent. The cleaner maybe present at a concentration of less than 300 ppb.Type: ApplicationFiled: May 12, 2010Publication date: December 30, 2010Applicant: ASML Netherlands B.V.Inventors: Bauke Jansen, Richard Joseph Bruls, Hans Jansen, Antonius Johannus Van der Net, Pieter Jacob Kramer, Anthonie Kuijper, Arjan Hubrecht Josef Anna Martens, Eric Willem Felix Casimiri
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Patent number: 7841352Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: GrantFiled: June 29, 2007Date of Patent: November 30, 2010Assignee: ASML Netherlands B.V.Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Publication number: 20100066988Abstract: A lithographic apparatus comprising a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table is disclosed wherein a humid gas space is defined between the projection system, the liquid confinement structure and immersion liquid in the immersion space, the humid gas space being configured to contain humid gas.Type: ApplicationFiled: September 15, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes Bruijstens, Richard Joseph Bruls, Hans Jansen, Siebe Landheer, Arnout Johannes Meester, Bauke Jansen, Ivo Adam Johannes Thomas, Marcio Alexandre Cano Miranda, Gheorghe Tanasa
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Publication number: 20100066987Abstract: A lithographic apparatus is disclosed that includes a projection system, and a liquid confinement structure configured to at least partly confine immersion liquid to an immersion space defined by the projection system, the liquid confinement structure and a substrate and/or substrate table. Measures are taken in the lithographic apparatus, for example, to reduce the effect of droplets on the final element of the projection system or to substantially avoid such droplet formation.Type: ApplicationFiled: September 15, 2009Publication date: March 18, 2010Applicant: ASML NETHERLANDS B.V.Inventors: Jeroen Peter Johannes BRUIJSTENS, Richard Joseph BRULS, Hans JANSEN, Siebe LANDHEER, Laurentius Catrinus JORRITSMA, Arnout Johannes MEESTER, Bauke JANSEN, Ivo Adam Johannes Thomas, Marcio Alexandre Cano MIRANDA, Maurice Martinus Johannes VAN DER LEE, Gheorghe TANASA, Lambertus Dominicus NOORDAM
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Patent number: 7649702Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: GrantFiled: January 25, 2008Date of Patent: January 19, 2010Assignees: Carl Zeiss SMT AG, ASML Netherlands B.V.Inventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20090195761Abstract: An immersion type lithographic apparatus includes an immersion system configured to at least partially fill an immersion space with an immersion liquid. The apparatus also includes an indicator configured to indicate whether a part of the immersion system should be cleaned and a cleaning liquid supply system configured to supply a cleaner to the part of the lithographic apparatus. The cleaner is at least one of a plurality of different cleaners. Each cleaner or combination of cleaners is configured to clean a different type and/or level of contamination in the part of the lithographic apparatus. The apparatus also includes a controller configured to control which of the plurality of cleaners is provided to the part of the lithographic apparatus, based on an indication received from the indicator.Type: ApplicationFiled: December 19, 2008Publication date: August 6, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Roelof Frederik De Graaf, Hans Jansen, Bauke Jansen, Hubertus Leonardus Franciscus Heusschen
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Publication number: 20090027638Abstract: A lithographic apparatus includes a projection system configured to project a patterned beam of radiation onto a target portion of a substrate. The projection system includes a first gas-conditioned sub-environment and a second gas-conditioned sub-environment. The apparatus includes a gas control unit configured to control the feeding of conditioned gas into the first sub-environment and into the second sub-environment via the first sub-environment so as to prevent contamination from the second sub-environment to the first sub-environment. The apparatus includes a gate configured to leak the conditioned gas at a rate from the second sub-environment to ambient atmosphere, and a detector configured to detect at least one property of the second gas-conditioned environment.Type: ApplicationFiled: September 25, 2008Publication date: January 29, 2009Applicants: ASML NETHERLANDS B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20090015804Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: April 11, 2008Publication date: January 15, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Cuijpers, Raymond Gerardus Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20090015805Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: ApplicationFiled: April 11, 2008Publication date: January 15, 2009Applicant: ASML NETHERLANDS B.V.Inventors: Bauke Jansen, Raymond Gerardus Beeren, Anthonius Martinus De Jong, Kornelis Tijmen Hoekerd
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Publication number: 20080284990Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: ApplicationFiled: April 11, 2008Publication date: November 20, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20080271750Abstract: A cleaning tool to clean a surface of a liquid confinement system of an immersion lithographic apparatus is disclosed, the liquid confinement system having an aperture to allow passage of a beam of radiation therethrough of an immersion lithographic apparatus. The cleaning tool includes a sonic transducer, a reservoir configured to hold liquid between the sonic transducer and the surface to be cleaned, and a barrier positioned in the reservoir under the aperture to form, in use, a shield to sonic waves.Type: ApplicationFiled: June 29, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Bauke Jansen, Raymond Gerardus Marius Beeren, Anthonius Martinus Cornelis Petrus De Jong, Kornelis Tijmen Hoekerd
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Publication number: 20080271747Abstract: A cleaning tool to clean a surface of a component of a lithographic apparatus is disclosed. The cleaning tool includes a sonic transducer, a liquid supply device configured to provide liquid to a reservoir between the surface to be cleaned and the sonic transducer, and a liquid outlet configured to remove liquid provided by the liquid supply device, the cleaning tool constructed and arranged such that, in use, liquid flows into the outlet under the influence of gravity.Type: ApplicationFiled: June 29, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Publication number: 20080273181Abstract: An immersion lithographic projection apparatus having a megasonic transducer configured to clean a surface and a method of using megasonic waves through a liquid to clean a surface of an immersion lithographic projection apparatus are disclosed. A flow, desirably a radial flow, is induced in the liquid.Type: ApplicationFiled: June 29, 2007Publication date: November 6, 2008Applicant: ASML NETHERLANDS B.V.Inventors: Anthonius Martinus Cornelis Petrus De Jong, Hans Jansen, Marco Koert Stavenga, Peter Franciscus Wanten, Bauke Jansen, Johannes Wilhelmus Jacobus Leonardus Cuijpers, Raymond Gerardus Marius Beeren, Kornelis Tijmen Hoekerd
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Patent number: 7446849Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.Type: GrantFiled: July 22, 2004Date of Patent: November 4, 2008Assignees: ASML Netherlands B.V., Carl Zeiss SMT AGInventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernard Gellrich, Bauke Jansen, Rens Sanderse
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Publication number: 20080212211Abstract: An immersion lithography objective has a housing in which at least one first optical element is arranged, a second optical element, which follows the first optical element in the direction of the optical axis of the objective, an immersion medium that adjoins the second optical element being located downstream of the latter in the direction of the optical axis, and a retaining structure for the second optical element. The retaining structure has a greater stiffness in the direction of the optical axis than in a direction perpendicular to the optical axis.Type: ApplicationFiled: January 25, 2008Publication date: September 4, 2008Applicant: CARL ZEISS SMT AGInventors: Bernhard Gellrich, Paul Graeupner, Juergen Fischer, Andreas Wurmbrand, Bauke Jansen, Bob Streefkerk, Christiaan Alexander Hoogendam, Johannes Jacobus Matheus Baselmans
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Publication number: 20060017894Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.Type: ApplicationFiled: July 22, 2004Publication date: January 26, 2006Applicant: ASML NETHERLAND B.V.Inventors: Tjarko Adriaan Van Empel, Erik Loopstra, Antonius Van Der Net, Yuri Johannes Van De Vijver, Bernhard Gellrich, Bauke Jansen, Rens Sanderse