Patents by Inventor Bedros Orchanian
Bedros Orchanian has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 8635888Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: October 9, 2008Date of Patent: January 28, 2014Inventors: Franklin W Dabby, Bedros Orchanian
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Publication number: 20110100064Abstract: A multi-functional method and apparatus are disclosed for producing a low hydroxyl ion-containing core rod from a tube suitable for the production of low-water optical fibers. The method and apparatus combine the use of process steps of (1) hermetically sealing a tubular quartz handle of a tubular porous core preform to a tube used to feed the porous preform into a sintering furnace, (2) dehydration and sintering, and (3) elongation of the sintered preform under vacuum, all without exposing the preform's central aperture surface to ambient atmosphere.Type: ApplicationFiled: December 22, 2005Publication date: May 5, 2011Inventors: Arnab Sarkar, Bedros Orchanian, Heikki Ihalainen
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Publication number: 20090038346Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: October 9, 2008Publication date: February 12, 2009Applicant: ASI/SILICA MACHINERY, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Publication number: 20090038543Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: October 9, 2008Publication date: February 12, 2009Applicant: ASI/SILICA MACHINERY, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 7451623Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: July 23, 2004Date of Patent: November 18, 2008Assignee: ASI/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 7451624Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: November 4, 2004Date of Patent: November 18, 2008Assignee: Asi/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian
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Patent number: 7383704Abstract: An outside chemical vapor deposition apparatus is disclosed for depositing porous glass-forming material onto a target rod to form a cylindrical body, with substantially higher efficiency than could prior apparatus. The apparatus includes two separate burner arrays, one array optimized for depositing the material during an initial stage of the process, when the cylindrical body has a relatively small diameter, and the other array optimized for depositing the material during a later stage of the process, when the cylindrical body has a relatively large diameter. In addition, each burner array can include a plurality of burners, with each burner azimuthally angled relative to the apparatus' air-flow axis, and with adjacent burners angled in opposite directions relative to that axis, to minimize the density gradient within the deposited porous material.Type: GrantFiled: February 1, 2005Date of Patent: June 10, 2008Assignee: Nextrom OyInventors: Arnab Sarkar, Bedros Orchanian
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Publication number: 20060162390Abstract: An improved method and apparatus is disclosed for sintering large, cylindrical, porous bodies used in the manufacture of high-quality optical fiber preforms. The apparatus has a compact, simplified structure, as compared to comparable apparatus of the prior art. The apparatus includes two separate support/slide assemblies that support the porous body throughout the sintering process. A first support/slide assembly engages a special handle for the porous body during a first stage of the process, in which the body is lowered into a furnace muffle. A second support/slide assembly then engages the porous body's handle during a second stage of the process, in which the body is controllably moved through a hot zone of the furnace, for dehydration and sintering of the body into a dense glass optical fiber preform.Type: ApplicationFiled: December 21, 2005Publication date: July 27, 2006Inventors: Arnab Sarkar, Bedros Orchanian
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Publication number: 20050166641Abstract: An outside chemical vapor deposition apparatus is disclosed for depositing porous glass-forming material onto a target rod to form a cylindrical body, with substantially higher efficiency than could prior apparatus. The apparatus includes two separate burner arrays, one array optimized for depositing the material during an initial stage of the process, when the cylindrical body has a relatively small diameter, and the other array optimized for depositing the material during a later stage of the process, when the cylindrical body has a relatively large diameter. In addition, each burner array can include a plurality of burners, with each burner azimuthally angled relative to the apparatus' air-flow axis, and with adjacent burners angled in opposite directions relative to that axis, to minimize the density gradient within the deposited porous material.Type: ApplicationFiled: February 1, 2005Publication date: August 4, 2005Inventors: Arnab Sarkar, Bedros Orchanian
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Publication number: 20050109066Abstract: A deposition system for depositing a chemical vapor onto a workpiece is disclosed, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: November 4, 2004Publication date: May 26, 2005Inventors: Franklin Dabby, Bedros Orchanian
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Publication number: 20050000251Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: ApplicationFiled: July 23, 2004Publication date: January 6, 2005Inventors: Franklin Dabby, Bedros Orchanian
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Patent number: 6789401Abstract: A deposition system for depositing a chemical vapor onto a workpiece, including a deposition chamber having a plurality of components for performing chemical vapor deposition on the workpiece. The deposition chamber includes an inner skin made of Hasteloy for sealing the plurality of components and the workpiece from the air surrounding the deposition system, and an outer skin that encloses the inner skin and is separated from the inner skin by an air gap. The outer skin includes vents that create a convection current in the air gap between the inner skin and outer skin of the deposition chamber. The deposition system also has a gas panel for regulating the flow of gases and vapors into the deposition chamber, and a computer for controlling operation of the gas panel and the components in the deposition chamber.Type: GrantFiled: June 28, 2001Date of Patent: September 14, 2004Assignee: ASI/Silica Machinery, LLCInventors: Franklin W. Dabby, Bedros Orchanian