Abstract: The instant invention provides cross-linkable coating compositions, process for producing the same, and substrates coated therewith. The cross-linkable coating composition comprises: (a) polyaldehyde, or acetal or hemiacetal thereof; (b) an acid catalyst having pKa of less than 6; (c) a liquid media; (d) an acrylic polycarbamate comprising at least an average of 2.0 carbamate functional groups, wherein said polycarbamate has a glass transition (Tg) of less than 25° C.; and (e) one or more fillers having a pH in the range of equal to or less than 9 and/or one or more pigments having a pH in the range of equal to or less than 9, and/or one or more additives having a pH in the range of equal to or less than 9, wherein said composition has a curing temperature in the range of less than 70° C.

Abstract: The instant invention provides cross-linkable coating compositions, process for producing the same, and substrates coated therewith. The cross-linkable coating composition comprises: (a) polyaldehyde, or acetal or hemiacetal thereof; (b) an acid catalyst having pKa of less than 6; (c) a liquid media; (d) an acrylic polycarbamate comprising at least an average of 2.0 carbamate functional groups, wherein said polycarbamate has a glass transition (Tg) of less than 25° C.; and (e) one or more fillers having a pH in the range of equal to or less than 9 and/or one or more pigments having a pH in the range of equal to or less than 9, and/or one or more additives having a pH in the range of equal to or less than 9, wherein said composition has a curing temperature in the range of less than 70° C.

Abstract: The instant invention provides cross-linkable coating compositions, process for producing the same, and substrates coated therewith. The cross-linkable coating composition comprises: (a) polyaldehyde, or acetal or hemiacetal thereof; (b) an acid catalyst having pKa of less than 6; (c) a liquid media; (d) an acrylic polycarbamate comprising at least an average of 2.0 carbamate functional groups, wherein said polycarbamate has a glass transition (Tg) of less than 25° C.; and (e) one or more fillers having a pH in the range of equal to or less than 9 and/or one or more pigments having a pH in the range of equal to or less than 9, and/or one or more additives having a pH in the range of equal to or less than 9, wherein said composition has a curing temperature in the range of less than 70° C.

Abstract: The instant invention provides cross-linkable coating compositions, process for producing the same, and substrates coated therewith. The cross-linkable coating composition comprises: (a) polyaldehyde, or acetal or hemiacetal thereof; (b) an acid catalyst having pKa of less than 6; (c) a liquid media; (d) an acrylic polycarbamate comprising at least an average of 2.0 carbamate functional groups, wherein said polycarbamate has a glass transition (Tg) of less than 25° C.; and (e) one or more fillers having a pH in the range of equal to or less than 9 and/or one or more pigments having a pH in the range of equal to or less than 9, and/or one or more additives having a pH in the range of equal to or less than 9, wherein said composition has a curing temperature in the range of less than 70° C.

Abstract: The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

Abstract: The method forms forming an open-network polishing pad useful for polishing magnetic, semiconductor and optical substrates. The method provides a polymer sheet or film of a curable polymer and exposes the polymer sheet or film to an energy source to create an exposure pattern in the polymer sheet or film. The exposure pattern having elongated sections exposed to the energy source. After attaching the polymer sheet or film to an open-network substrate, the method removes polymer adjacent from the exposed polymer sheet or film of the intermediate structure with a solvent. This forms elongated channels through the polymer sheet or film in a texture pattern that corresponds to the exposure pattern with the open-network supporting the polymer. The elongated channels extending through the thickness of the polymer sheet or film to form the open-network polishing pad.

Abstract: A composition comprising: a)one or more film forming resins having at least one functional group capable of polymerization; b) one or more adhesion promoters comprising compounds containing one or more unsaturated groups capable of free radical polymerization and one or more trialkoxy silane groups; c) one or more fillers capable of imparting abrasion resistance to the composition; d) one or more compounds which is reactive with the film forming resin which also contains an acidic moiety; and e) one or more compounds comprising a siloxane backbone and one or more active hydrogen groups capable of reacting with the functional groups on a glass bonding adhesive: one or more second adhesion promoters comprising one or more silicon, titanium, zirconium, aluminum, or metal containing compounds; organic materials having reactive groups reactive with reactive groups on the surface of substrates or adhesives; or mixtures thereof.

Abstract: In one embodiment, the invention is a composition comprising: a) one or more film forming resins having at least one functional group capable of polymerization; b) one or more adhesion promoters comprising compounds containing one or more unsaturated groups capable of free radical polymerization and one or more trialkoxy silane groups; c) one or more fillers capable of imparting abrasion resistance to the composition when cured; d) one or more compounds which is reactive with the film forming resin which also contains an acidic moiety; and e) one or more compounds comprising a siloxane backbone and one or more active hydrogen groups capable of reacting with the functional groups on a glass bonding adhesive, one or more second adhesion promoters comprising one or more silicon, titanium, zirconium, aluminum, or metal containing compounds, organic materials having reactive groups which are reactive with reactive groups on the surface of substrates or adhesives to which the composition of the invention will be