Patents by Inventor Benjamin John Canavello

Benjamin John Canavello has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4086870
    Abstract: A resist spinning head for preventing photoresist, or electron and X-ray resist from flowing to the edge of the wafer when spin coating in a photoresist spinner, which includes the use of a tapered top plate having a knife-edge contact to the surface of the wafer so as to seal the top of the wafer at an outer ring and prevent resist from flowing under the top plate; whereby the resist is guided, during spinning, by the tapered top surface to the edge of the plate and off the head. The tapered top plate is pressed against the wafer and secured by a spring biasing means to a spinner motor shaft.
    Type: Grant
    Filed: June 30, 1977
    Date of Patent: May 2, 1978
    Assignee: International Business Machines Corporation
    Inventors: Benjamin John Canavello, Michael Hatzakis, Arthur Richard Siegel, Connell Watters