Patents by Inventor Benjamin Schwarz

Benjamin Schwarz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200208989
    Abstract: A method for assigning a processing plan to a mobile unit data set of a mobile unit of an indoor location system of a manufacturing hall is provided. The method includes: providing a manufacturing control system for industrial processing of workpieces with a machine tool in accordance with workpiece-specific processing plans, each processing plan storing order information for a workpiece to be processed, providing a mobile unit with an image acquisition unit for acquiring image data, mobile unit data set belonging to the mobile unit and position data of the mobile unit acquired with the indoor location system being stored in the manufacturing control system, acquiring image data of a processing plan-specific object for identifying the processing plan to be assigned with the manufacturing control system, and assigning the identified processing plan to the mobile unit data set of the mobile unit in the manufacturing control system.
    Type: Application
    Filed: March 5, 2020
    Publication date: July 2, 2020
    Inventors: Jens Ottnad, Ulrich Schneider, Benjamin Schwarz, Korbinian Weiss
  • Publication number: 20200201295
    Abstract: A method for identifying workpieces that are distributed in a sorted manner to multiple workpiece collection units and brought to the workpiece collection units using an automation device. Included is identifying elements for emitting and receiving electromagnetic signals to and from transceiver units situated on the workpiece collection units to determine the position of the identifying elements from transit times of the electromagnetic signals between the transceiver units and the identifying elements. The identifying elements each bear information regarding the workpieces on the workpiece collection units. The identifying elements, which are provided by a delivery device and each bear information regarding the workpieces on the workpiece collection units, are brought from the location of a delivery device to a transfer zone in the working area of the automation device. The automation device brings each provided identifying element from the transfer zone to the associated workpiece collection unit.
    Type: Application
    Filed: March 3, 2020
    Publication date: June 25, 2020
    Inventors: Jens Ottnad, Ulrich Schneider, Benjamin Schwarz, Korbinian Weiss
  • Publication number: 20200201303
    Abstract: A production system, the production system comprising the following: a loading zone for loading and/or unloading at least one collection carrier, a locating system for locating a collection carrier in the loading zone, the locating system being designed to determine the location of a mobile unit arranged on the collection carrier and/or to capture identification information stored on the mobile unit, an image-capturing unit, which is designed to capture image information of the loading zone, an image evaluation unit, which is designed to determine the position of the collection carrier and/or a state of the collection carrier by the image information. A production control method for controlling a production system. The production system and the production control method enable improved order processing. Preparatory and/or follow-up tasks can be automated in a simpler and easier manner.
    Type: Application
    Filed: March 3, 2020
    Publication date: June 25, 2020
    Inventors: Manuel Kiefer, Benjamin Schwarz, Dennis Specht, Eberhard Wahl
  • Patent number: 10646377
    Abstract: An eyeshade (10) includes a head band (12) and two eye covers (20). The head band (12) includes a middle section (14), an end section (15) horizontally extending from the middle section (14), and at least three first hook-and-loop straps (142). Two of the three first hook-and-loop straps (142) are arranged on an inner surface (141) of the middle section (14). Each eye cover (20) includes an inner pad (22) and a covering portion (24). Each inner pad (22) includes an inner pad outer surface (221) and a depression (222). The covering portion (24) includes a cavity (241) corresponding to the depression (222) and includes a second hook-and-loop strap (242). Each of the second hook-and-loop straps (242) is removably attached to the corresponding first hook-and-loop strap (142). The eyeshade (10) has modular replaceable eye covers (20) which can be quickly attached to head band (12) to provide various functions as required.
    Type: Grant
    Filed: October 17, 2017
    Date of Patent: May 12, 2020
    Assignee: MANTA SLEEP LLC
    Inventors: Benjamin Schwarz, Mark Zhang
  • Publication number: 20200118844
    Abstract: Implementations described herein provide a chamber lid assembly. In one embodiment, a chamber lid assembly includes a heater embedded in a dielectric body forming a boundary of a processing chamber, wherein the heater has one or more heating zones that are independently controlled.
    Type: Application
    Filed: September 5, 2019
    Publication date: April 16, 2020
    Inventors: Michael D. WILLWERTH, Jeffrey LUDWIG, Benjamin SCHWARZ, Roberto Cesar COTLEAR
  • Publication number: 20200118896
    Abstract: Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.
    Type: Application
    Filed: December 10, 2019
    Publication date: April 16, 2020
    Inventors: Leonard Tedeschi, Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, JR., Daniel T. McCormick
  • Publication number: 20200013661
    Abstract: Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.
    Type: Application
    Filed: September 19, 2019
    Publication date: January 9, 2020
    Inventors: Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal, Vijay D. Parkhe, Michael D. Willwerth, Zhiqiang Guo
  • Patent number: 10515862
    Abstract: Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.
    Type: Grant
    Filed: April 5, 2017
    Date of Patent: December 24, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Leonard Tedeschi, Benjamin Schwarz, Changhun Lee, Ping Han Hsieh, Adauto Diaz, Daniel T. McCormick
  • Patent number: 10460968
    Abstract: Electrostatic chucks with variable pixelated magnetic field are described. For example, an electrostatic chuck (ESC) includes a ceramic plate having a front surface and a back surface, the front surface for supporting a wafer or substrate. A base is coupled to the back surface of the ceramic plate. A plurality of electromagnets is disposed in the base, the plurality of electromagnets configured to provide pixelated magnetic field tuning capability for the ESC.
    Type: Grant
    Filed: December 2, 2013
    Date of Patent: October 29, 2019
    Assignee: Applied Materials, Inc.
    Inventors: Chih-Hsun Hsu, Tza-Jing Gung, Benjamin Schwarz, Shahid Rauf, Ankur Agarwal, Vijay D. Parkhe, Michael D. Willwerth, Zhiqiang Guo
  • Publication number: 20190243345
    Abstract: Disclosed is an interior tracking system for manufacturing control. The interior tracking system has multiple, fixedly installed transceivers for determining the position of multiple mobile units, the position being determined in particular by evaluating the propagation time of electromagnetic (radio) signals. The interior tracking system is used to assign one of the mobile units to one or more workpieces in an industrial manufacturing plant that processes steel and/or sheet metal, to determine the position of the assigned workpieces by localizing the assigned mobile unit using the interior tracking system and to integrate the interior tracking system into a manufacturing control system of the industrial manufacturing plant.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Inventors: Benjamin Schwarz, Jens Ottnad, Manuel Kiefer, Korbinian Weiss, Ulrich Schneider
  • Publication number: 20190243343
    Abstract: A method for supporting a sorting process of workpieces arranged on a sorting table that have been produced on a machine tool by a processing plan, comprising providing of a processing image data set of the processing plan based on the arrangement of at least one workpiece. The method further relates to an imaging-based capturing of the sorting table having a plurality of adjacent workpieces to each other and generating a first sorting image data set, and repeated image-based capturing of the sorting table and generating of a second sorting image data set once at least one workpiece has been removed from the sorting table. The method comprises comparing of the sorting image data sets, incorporating the processing image data set, wherein a sorting signal is generated which contains information that comprises the type, the position and/or the shape of the at least one removed workpiece.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Inventors: Manuel Kiefer, Jens Ottnad, Eberhard Wahl, Korbinian Weiss, Benjamin Schwarz, Philipp Springer, Matthias Denecke, David Schoene, Stefan Krause, Falko Keimel
  • Publication number: 20190244309
    Abstract: An interior localization system for manufacturing control, with multiple, fixedly installed transceivers for determining the position of multiple mobile units, the position being determined in particular by evaluating the runtime of electromagnetic (radio) signals. The interior localization system is used to associate one of the mobile units to a person in an industrial manufacturing plant that processes steel and/or sheet metal, to determine the position of the associated person by localizing the associated mobile unit using the interior localization system and to integrate the interior localization system into a manufacturing control system of the industrial manufacturing plant.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Inventors: Jens Ottnad, Korbinian Weiss, Benjamin Schwarz, Ulrich Schneider
  • Publication number: 20190240703
    Abstract: A workpiece collecting point unit for a machine tool, in particular for a flatbed machine tool, such as a laser cutting or punching flatbed machine tool, has a placing area for workpieces produced by the machine tool within the framework of a processing plan, a display unit adapted to display information about the workpieces, which are to be further processed and were placed on the placing area, to an operator, and a signal device adapted to output an identification signal indicating to an operator the location of the selected workpiece collecting point unit for placing the workpiece, which is to be further processed, on the placing area. The workpiece collecting point unit can be used inter alia in a process to support a sequence of processing steps for processing workpieces.
    Type: Application
    Filed: April 18, 2019
    Publication date: August 8, 2019
    Inventors: Manuel Kiefer, Jens Ottnad, Eberhard Wahl, Korbinian Weiss, Benjamin Schwarz, Philipp Springer
  • Patent number: 10336656
    Abstract: A machined ceramic article having an initial surface defect density and an initial surface roughness is provided. The machined ceramic article is heated to a temperature range between about 1000° C. and about 1800° C. at a ramping rate of about 0.1° C. per minute to about 20° C. per minute. The machined ceramic article is heat-treated in air atmosphere. The machined ceramic article is heat treated at one or more temperatures within the temperature range for a duration of up to about 24 hours. The machined ceramic article is then cooled at the ramping rate, wherein after the heat treatment the machined ceramic article has a reduced surface defect density and a reduced surface roughness.
    Type: Grant
    Filed: April 15, 2015
    Date of Patent: July 2, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Ren-Guan Duan, Thorsten Lill, Jennifer Y. Sun, Benjamin Schwarz
  • Publication number: 20190110927
    Abstract: An eyeshade (10) includes a head band (12) and two eye covers (20). The head band (12) includes a middle section (14), an end section (15) horizontally extending from the middle section (14), and at least one first hook-and-loop strap (142). The first hook-and-loop strap (142) is arranged on an inner surface (141) of the middle section (14). Each eye cover (20) includes an inner pad (22) and a covering portion (24). Each inner pad (22) includes an inner pad outer surface (221) and a depression (222). The covering portion (24) includes a cavity (241) corresponding to the depression (222) and includes a second hook-and-loop strap (242). The second hook-and-loop strap (242) is removably attached to the first hook-and-loop strap (142). The eyeshade (10) has modular replaceable eye covers (20) which can be quickly attached to head band (12) to provide various functions as required.
    Type: Application
    Filed: October 17, 2017
    Publication date: April 18, 2019
    Inventors: Benjamin Schwarz, Mark Zhang
  • Publication number: 20180294200
    Abstract: Embodiments may also include a residual chemical reaction diagnostic device. The residual chemical reaction diagnostic device may include a substrate and a residual chemical reaction sensor formed on the substrate. In an embodiment, the residual chemical reaction sensor provides electrical outputs in response to the presence of residual chemical reactions. In an embodiment, the substrate is a device substrate, and the sensor is formed in a scribe line of the device substrate. In an alternative embodiment, the substrate is a process development substrate. In some embodiments, the residual chemical reaction sensor includes, a first probe pad, wherein a plurality of first arms extend out from the first probe pad, and a second probe pad, wherein a plurality of second arms extend out from the second probe pad and are interdigitated with the first arms.
    Type: Application
    Filed: April 5, 2017
    Publication date: October 11, 2018
    Inventors: Leonard TEDESCHI, Benjamin SCHWARZ, Changhun LEE, Ping Han Hsieh, Adauto DIAZ, Daniel T. McCormick
  • Patent number: 9741566
    Abstract: Embodiments herein provide apparatus and methods for performing an etching process on a spacer layer with good profile control in multiple patterning processes. In one embodiment, a method for patterning a spacer layer during a multiple patterning process includes conformally forming a spacer layer on an outer surface of a patterned structure disposed on a substrate, wherein the patterned structure has having a first group of openings defined therebetween and etching the spacer layer disposed on the substrate while forming an oxidation layer on the spacer layer.
    Type: Grant
    Filed: February 12, 2016
    Date of Patent: August 22, 2017
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Dai-Wen Tang, Hui Sun, Chung Liu, Benjamin Schwarz
  • Publication number: 20160293420
    Abstract: Embodiments herein provide apparatus and methods for performing an etching process on a spacer layer with good profile control in multiple patterning processes. In one embodiment, a method for patterning a spacer layer during a multiple patterning process includes conformally forming a spacer layer on an outer surface of a patterned structure disposed on a substrate, wherein the patterned structure has having a first group of openings defined therebetween and etching the spacer layer disposed on the substrate while forming an oxidation layer on the spacer layer.
    Type: Application
    Filed: February 12, 2016
    Publication date: October 6, 2016
    Inventors: Dai-Wen TANG, Hui SUN, Chung LIU, Benjamin SCHWARZ
  • Publication number: 20150294843
    Abstract: Embodiments of the present invention generally provide chamber cleaning methods for cleaning a plasma processing chamber with minimum likelihood of erosion occurred on the chamber components so as to extend service life of chamber components for semiconductor plasma applications. In one embodiment, a method of extending chamber component life in a processing chamber includes supplying a cleaning gas mixture into a plasma processing chamber, applying a RF source power to the plasma processing chamber, and applying a voltage to a substrate support assembly disposed in the processing chamber during cleaning.
    Type: Application
    Filed: April 9, 2014
    Publication date: October 15, 2015
    Applicant: APPLIED MATERIALS, INC.
    Inventors: Feng CHEN, Benjamin SCHWARZ, Valentin N. TODOROW, Li ZHANG, Tza-Jing GUNG, Lu LIU
  • Patent number: D861771
    Type: Grant
    Filed: April 11, 2017
    Date of Patent: October 1, 2019
    Assignee: Manta Sleep, LLC
    Inventors: Benjamin Schwarz, Mark Zhang