Abstract: The invention comprises a device and method for surface cleaning of individual wafers or substrates arranged in a stack along a stacking direction, where a jet of fluid is sent towards the stack in a direction perpendicular to the stacking direction and it is provided a relative movement between the wafer stack and the nozzle in the stacking direction.

Abstract: The invention relates to a method for separation of a silicon wafer (12a) from a vertical stack (10) of silicon wafers (12). The method is characterised in that it comprises attaching a movable transport device (2) to a surface of the silicon wafer (12a) in the stack (10), and horizontal movement of the silicon wafer (12a) parallel (A) to the surface of the silicon wafer (12a) until the silicon wafer (12a) is separated from the stack (10). The invention also comprises a device for implementing the method.

Abstract: A method is disclosed for transport of hydrocarbons in a pipeline flow across large distances, from a first location at an offshore hydrocarbon reservoir to a second location. At said first location a liquid absorbent is provided in the form of a gas-poor hydrocarbon liquid flow. A flow of gas saturated hydrocarbon liquid and released associated hydrocarbon gas is supplied to the gas-poor liquid flow at first location, the volume of gas-poor hydrocarbon liquid being selected so as to be sufficient for all released associated hydrocarbon gas to be absorbed by the gas-poor hydrocarbon liquid. Then the hydrocarbon liquid with absorbed hydrocarbon gas is transported to said second location. A plant for transport of hydrocarbons in a pipeline flow is also disclosed. The plant comprises an absorption chamber (6) at a first location. Absorption chamber (6) is connected to a well pipe (3). At a second location a separator plant (9) is provided.