Patents by Inventor Berend Helmerus Lich
Berend Helmerus Lich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
-
Patent number: 9711325Abstract: A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequencType: GrantFiled: April 21, 2014Date of Patent: July 18, 2017Assignee: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Pavel Potocek, Xiaodong Zhuge, Berend Helmerus Lich
-
Patent number: 9478393Abstract: A method of imaging a specimen comprises directing a beam to irradiate a specimen; detecting radiation emanating from the specimen; scanning the beam along a path; for each sample point in said path, recording a measurement set M={(Dn, Pn)}, where Dn is the detector output as a function of value Pn of measurement parameter P; deconvolving M and spatially resolving it into a set representing depth-resolved imagery of the specimen, whereby, at point pi within the specimen, in a first probing session, irradiating, in a first beam configuration, pi with Point Spread Function F1, whereby said beam configuration is different to P; in at least a second probing session, irradiating, in a second beam configuration, pi with Point Spread Function F2 which overlaps partially with F1 in a zone Oi in which pi is located; sing an Independent Component Analysis algorithm to perform spatial resolution in Oi.Type: GrantFiled: June 26, 2015Date of Patent: October 25, 2016Assignee: FEI COMPANYInventors: Pavel Potocek, Faysal Boughorbel, Berend Helmerus Lich, Matthias Langhorst
-
Publication number: 20160013015Abstract: A method of accumulating an image of a specimen using a scanning-type microscope, comprising the following steps: Directing a beam of radiation from a source through an illuminator so as to irradiate a surface S of the specimen; Using a detector to detect a flux of radiation emanating from the specimen in response to said irradiation; Causing said beam to follow a scan path relative to said surface; For each of a set of sample points in said scan path, recording an output Dn of the detector as a function of a value Pn of a selected measurement parameter P, thus compiling a measurement set M={(Dn, Pn)}, where n is a member of an integer sequence; Using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it so as to produce reconstructed imagery of the specimen, wherein, considered at a given point pi within the specimen, the method comprises the following steps: In a first probing session, employing a first beam configuration B1 to irradiate the point pi wType: ApplicationFiled: June 26, 2015Publication date: January 14, 2016Applicant: FEI CompanyInventors: Pavel Potocek, Faysal Boughorbel, Berend Helmerus Lich, Matthias Langhorst
-
Publication number: 20140312226Abstract: A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R?{(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequencType: ApplicationFiled: April 21, 2014Publication date: October 23, 2014Applicant: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Pavel Potocek, Xiaodong Zhuge, Berend Helmerus Lich
-
Patent number: 8704176Abstract: A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequencType: GrantFiled: April 4, 2013Date of Patent: April 22, 2014Assignee: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Pavel Potocek, Xiaodong Zhuge, Berend Helmerus Lich
-
Patent number: 8586921Abstract: A method of charged-particle microscopy, comprising: irradiating a sample surface S to cause radiation to emanate from the sample; detecting at least a portion of said emitted radiation recording an output On of said detector arrangement as a function of emergence angle ?n of said emitted radiation, measured relative to an axis normal to S thus compiling a measurement set M={(On, ?n)} for a plurality of values of ?n; automatically deconvolving the measurement set M and spatially resolve it into a result set R={(VK, Lk)},in which a spatial variable V demonstrates a value Vk at an associated discrete death level Lk referenced to the surface S, whereby n and K are members of an integer sequence, and spatial variable V represents a physical property of the sample as a function of position in its bulk.Type: GrantFiled: August 10, 2012Date of Patent: November 19, 2013Assignee: FEI CompanyInventors: Faysal Boughorbel, Pavel Potocek, Cornelis Sander Kooijman, Berend Helmerus Lich
-
Patent number: 8581189Abstract: A charged-particle microscopy includes irradiating a sample in measurement sessions, each having an associated beam parameter (P) value detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, wherein an integer in the range of 1?n?N, and processing the set (S) by: defining a Point Spread Function (K) having a kernel value Kn for each value n; defining a spatial variable (V); defining an imaging quantity (Q) having fore each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; for each value of n, determining a minimum divergence min D(Mn?Kn*V) between Mn and Qn, solving V while applying constraints on the values Kn.Type: GrantFiled: August 10, 2012Date of Patent: November 12, 2013Assignee: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Cornelis Sander Kooijman, Berend Helmerus Lich, Alan Frank de Jong
-
Publication number: 20130228683Abstract: A method of examining a sample using a charged-particle microscope, comprising mounting the sample on a sample holder; using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; using a detector arrangement to detect at least a portion of said emitted radiation, the method of which comprises embodying the detector arrangement to detect electrons in the emitted radiation; recording an output On of said detector arrangement as a function of kinetic energy En of said electrons, thus compiling a measurement set M={(On, En)} for a plurality of values of En; using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integer sequencType: ApplicationFiled: April 4, 2013Publication date: September 5, 2013Applicant: FEI CompanyInventors: Faysal Boughorbel, Eric Gerardus Theodoor Bosch, Pavel Potocek, Xiaodong Zhuge, Berend Helmerus Lich
-
Publication number: 20130037715Abstract: A method of examining a sample using a charged-particle microscope, comprising the following steps: Mounting the sample on a sample holder; Using a particle-optical column to direct at least one beam of particulate radiation onto a surface S of the sample, thereby producing an interaction that causes emitted radiation to emanate from the sample; Using a detector arrangement to detect at least a portion of said emitted radiation, which method comprises the following steps: Recording an output On of said detector arrangement as a function of emergence angle ?n of said emitted radiation, measured relative to an axis normal to S, thus compiling a measurement set M={(On, ?n)} for a plurality of values of ?n; Using computer processing apparatus to automatically deconvolve the measurement set M and spatially resolve it into a result set R={(Vk, Lk)}, in which a spatial variable V demonstrates a value Vk at an associated discrete depth level Lk referenced to the surface S, whereby n and k are members of an integeType: ApplicationFiled: August 10, 2012Publication date: February 14, 2013Applicant: FEI CompanyInventors: Faysal Boughorbel, Pavel Potocek, Cornelis Sander Kooijman, Berend Helmerus Lich
-
Publication number: 20130037714Abstract: Charged-particle microscopy includes irradiating a sample in N measurement sessions, each having an associated beam parameter (P) value; Detecting radiation emitted during each measurement session, associating a measurand (M) with each measurement session, thus providing a data set (S) of data pairs {Pn, Mn}, where n is an integer in the range 1?n?N, and processing the set (S) by: Defining a Point Spread Function (K) having a kernel value Kn for each value of n; Defining a spatial variable (V); Defining an imaging quantity (Q) having for each value of n a value Qn that is a three-dimensional convolution of Kn and V, such that Qn=Kn*V; For each value of n, determining a minimum divergence min D(Mn?Kn*V) between Mn and Qn, solving for V while applying constraints on the values Kn.Type: ApplicationFiled: August 10, 2012Publication date: February 14, 2013Applicant: FEI CompanyInventors: Faysal Boughorbel, Berend Helmerus Lich, Cornelis Sander Kooijman, Eric Gerardus Theodoor Bosch, Alan Frank de Jong
-
Patent number: 8232523Abstract: A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1?i?N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.Type: GrantFiled: April 29, 2011Date of Patent: July 31, 2012Assignee: FEI CompanyInventors: Faysal Boughorbel, Cornelis Sander Kooijman, Berend Helmerus Lich, Eric Gerardus Theodoor Bosch
-
Publication number: 20110266440Abstract: A method of investigating a sample using Scanning Electron Microscopy (SEM), comprising the following steps: Irradiating a surface (S) of the sample using a probing electron beam in a plurality (N) of measurement sessions, each measurement session having an associated beam parameter (P) value that is chosen from a range of such values and that differs between measurement sessions; Detecting stimulated radiation emitted by the sample during each measurement session, associating a measurand (M) therewith and noting the value of this measurand for each measurement session, thus allowing compilation of a data set (D) of data pairs (Pi, Mi), where 1?i?N, wherein: A statistical Blind Source Separation (BSS) technique is employed to automatically process the data set (D) and spatially resolve it into a result set (R) of imaging pairs (Qk, Lk), in which an imaging quantity (Q) having value Qk is associated with a discrete depth level Lk referenced to the surface S.Type: ApplicationFiled: April 29, 2011Publication date: November 3, 2011Applicant: FEI CompanyInventors: Faysal Boughorbel, Cornelis Sander Kooijman, Berend Helmerus Lich, Eric Gerardus Theodoor Bosch