Patents by Inventor Bernard Gellrich

Bernard Gellrich has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Patent number: 8472006
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Grant
    Filed: May 8, 2009
    Date of Patent: June 25, 2013
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT GmbH
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Bernard Gellrich
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20120086926
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Application
    Filed: December 12, 2011
    Publication date: April 12, 2012
    Applicants: CARL ZEISS SMT AG, ASML NETHERLANDS B.V.
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD
    Publication number: 20090214986
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Application
    Filed: May 8, 2009
    Publication date: August 27, 2009
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob STREEFKERK, Johannes Jacobus Matheus BASELMANS, Paul GRAUPNER, Jan HAISMA, Nicodemus HATTU, Christiaan Alexander HOOGENDAM, Erik Roelof LOOPSTRA, Johannes Catharinus Hubertus MULKENS, Bernard GELLRICH
  • Lithographic apparatus and device manufacturing method
    Patent number: 7545481
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Grant
    Filed: November 24, 2003
    Date of Patent: June 9, 2009
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Bob Streefkerk, Johannes Jacobus Matheus Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Johannes Catharinus Hubertus Mulkens, Bernard Gellrich
  • Lithographic apparatus and device manufacturing method
    Patent number: 7532304
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Grant
    Filed: January 29, 2008
    Date of Patent: May 12, 2009
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • Lithographic apparatus and device manufacturing method
    Patent number: 7446849
    Abstract: A lithographic apparatus is disclosed. The apparatus includes a projection system configured to project a patterned radiation beam onto a target portion of a substrate. The projection system includes a housing and a plurality of optical elements arranged in the housing. The apparatus also includes an inlet for feeding conditioned gas to the housing and a gas exhaust for exhausting the conditioned gas from the housing for providing a gas conditioned environment in the housing. At least one gate is provided for providing communication of the gas conditioned environment with ambient atmosphere. The gate is arranged to provide a predetermined leakage of the conditioned gas to the ambient atmosphere.
    Type: Grant
    Filed: July 22, 2004
    Date of Patent: November 4, 2008
    Assignees: ASML Netherlands B.V., Carl Zeiss SMT AG
    Inventors: Tjarko Adriaan Rudolf Van Empel, Erik Roelof Loopstra, Antonius Johannes Van Der Net, Yuri Johannes Gabriel Van De Vijver, Bernard Gellrich, Bauke Jansen, Rens Sanderse
  • Lithographic apparatus and device manufacturing method
    Publication number: 20080204679
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents the humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Application
    Filed: January 29, 2008
    Publication date: August 28, 2008
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • Lithographic apparatus and device manufacturing method
    Patent number: 7352433
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Grant
    Filed: October 12, 2004
    Date of Patent: April 1, 2008
    Assignee: ASML Netherlands B.V.
    Inventors: Christiaan Alexander Hoogendam, Erik Roelof Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050128445
    Abstract: Liquid is supplied to a space between the projection system of a lithographic apparatus and a substrate. A flow of gas towards a vacuum inlet prevents humid gas from escaping to other parts of the lithographic apparatus. This may help to protect intricate parts of the lithographic apparatus from being damaged by the presence of humid gas.
    Type: Application
    Filed: October 12, 2004
    Publication date: June 16, 2005
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Christiaan Hoogendam, Erik Loopstra, Bob Streefkerk, Bernard Gellrich, Andreas Wurmbrand
  • Lithographic apparatus and device manufacturing method
    Publication number: 20050110973
    Abstract: The joint between the projection system element and its support comprises an inorganic layer or a direct bond and is thus liquid tight, which can prevent deformation by an immersion liquid. The joint can be made either warm or cold. Solders, glue, and glue protection can all be used in the formation of this joint. In an embodiment, the elements and its support are made of quartz.
    Type: Application
    Filed: November 24, 2003
    Publication date: May 26, 2005
    Applicants: ASML NETHERLANDS B.V., CARL ZEISS SMT AG
    Inventors: Bob Streefkerk, Johannes Baselmans, Paul Graupner, Jan Haisma, Nicodemus Hattu, Christiaan Hoogendam, Erik Loopstra, Johannes Hubertus Mulkens, Bernard Gellrich