Patents by Inventor Bernd Kunkel

Bernd Kunkel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050274221
    Abstract: A sputter target, where the sputter target is comprised of cobalt (Co), greater than 0 and as much as 24 atomic percent chromium (Cr), greater than 0 and as much as 20 atomic percent platinum (Pt), greater than 0 and as much as 20 atomic percent boron (B), and greater than 0 and as much as 10 atomic percent gold (Au). The sputter target is further comprised of X1, where X1 is selected from the group consisting of tungsten (W), yttrium (Y), manganese (Mn), and molybdenum (Mo). The sputter target is further comprised of 0 to 7 atomic percent X2, wherein X2 is an element selected from the group consisting of titanium (Ti), vanadium (V), zirconium (Zr), niobium (Nb), ruthenium (Ru), rhodium (Rh), palladium (Pd), hafnium (Hf), tantalum (Ta), and iridium (Ir).
    Type: Application
    Filed: July 19, 2005
    Publication date: December 15, 2005
    Applicant: Heraeus, Inc.
    Inventors: Abdelouahab Ziani, Yuanda Cheng, Bernd Kunkel, Michael Bartholomeusz
  • Publication number: 20040188249
    Abstract: A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
    Type: Application
    Filed: January 13, 2004
    Publication date: September 30, 2004
    Applicant: HERAEUS, INC.
    Inventors: Michael Sandlin, Bernd Kunkel, Willy Zhang, Phillip Corno
  • Patent number: 6797137
    Abstract: A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
    Type: Grant
    Filed: April 11, 2001
    Date of Patent: September 28, 2004
    Assignee: Heraeus, Inc.
    Inventors: Michael Sandlin, Bernd Kunkel, Willy Zhang, Phillip Corno
  • Publication number: 20040062675
    Abstract: Sputtering targets are produced which have an intermetallic stoichiometry which makes them ductile enough for maching and sputtering. The targets are produced from elemental or alloy powders or alloys, at least one of which is of very fine particle size, e.g., −400 mesh. The elemental or alloy powders are blended, canned, subjected to hot isostatic pressing at low temperatures and high pressures, formed into a billet, and machined to form the target.
    Type: Application
    Filed: June 2, 2003
    Publication date: April 1, 2004
    Inventors: Wenjun Zhang, Bernd Kunkel, Michael Sandlin
  • Publication number: 20030228238
    Abstract: A target for a deposition apparatus is formed by blending at least two different types of powders together and consolidating the powders with a powder metallurgy process to form a billet. The target is then formed from the billet. The target includes a first material phase having a first PTF and a second material phase having a second PTF higher than the first PTF. The second PTF is also higher than a PTF of a material having the same chemistry as the target.
    Type: Application
    Filed: June 7, 2002
    Publication date: December 11, 2003
    Inventors: Wenjun Zhang, Bernd Kunkel, Anand Deodutt, Michael Bartholomeusz
  • Publication number: 20030077199
    Abstract: Spent sputtering targets are refurbished by filling the depleted region of the target with new sputter material using a hot isostatic pressing or HIP'ing technique.
    Type: Application
    Filed: September 16, 2002
    Publication date: April 24, 2003
    Inventors: Michael Sandlin, Wenjun Zhang, Bernd Kunkel
  • Publication number: 20020170821
    Abstract: A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'ing to densify the powder into the alloy.
    Type: Application
    Filed: April 11, 2001
    Publication date: November 21, 2002
    Inventors: Michael Sandlin, Bernd Kunkel, Willy Zhang, Phillip Corno
  • Patent number: 4819486
    Abstract: A device for acceleration measurements and, in particular, for gravitational field measurements in, for example, earth orbits, which has a body arranged movably in a force field, the position of which can be detected by a position location device. The force acting upon the body is anisotropic and, at least in the direction of the acceleration to be determined, is not a linear function of the deflection of the body from its resting position. In a preferred further development the body is suspended by four tension springs, which in the resting position of the body are arranged in a plane perpendicular to the direction of the acceleration to be determined, and which each form right angles with the adjacent spring. With 3 separate optoelectronic position detector receivers plus corresponding illuminators which provides some measurement redundancy, all acceleration planes can be measured with a great dynamic range. In the main direction, forces as small as 10.sup.-12 g will be measurable.
    Type: Grant
    Filed: March 3, 1987
    Date of Patent: April 11, 1989
    Assignee: Messerschmitt-Bolkowe-Blohm GmbH
    Inventors: Bernd Kunkel, Karl Keller, Reinhold Lutz
  • Patent number: 4770526
    Abstract: A radar ranging system uses a laser transmitter and a single detector for producing the start and stop signals for the time interval measurement. Two reference signals are produced by passing two light portions, decoupled from the laser light to be transmitted to a target, through two different delay lines to the detector. The time difference between the first reference signal and a target signal is a measure for the range to be measured. The time difference between the two reference signals is used as a calibration measure for repeatedly calibrating the system. The true range is calculated by forming the ratio of the two time intervals.
    Type: Grant
    Filed: November 12, 1986
    Date of Patent: September 13, 1988
    Assignee: Messerschmitt-Boelkow-Blohm GmbH
    Inventors: Sigmund Manhart, Peter Dyrna, Bernd Kunkel
  • Patent number: 4710620
    Abstract: Sensing apparatus for determining the relative position between two bodies located at a distance from one another with respect to a predetermined relative position wherein one of the bodies is provided with a camera having an areal matrix of photosensitive elements arranged in the image plane of the camera and wherein the other of the bodies is provided with a shading member projecting from the surface thereof and with an optically clearly distinguishable reference pattern in the area of the base of the shading member, the reference pattern being formed by means of light sources which emit light patterns which are as punctiform as possible. The reference pattern is partially covered in an asymmetric manner by the shading member during deviation from the reference position and this deviation is sensed by the photosensitive elements in the camera.
    Type: Grant
    Filed: August 22, 1985
    Date of Patent: December 1, 1987
    Assignee: Messerschmitt-Bolkow-Blohm GmbH
    Inventor: Bernd Kunkel