Abstract: A method and device for measuring the profile of the surface of a flat object of unknown materials, including an interferometry measuring system, ellipsometry measuring system, beam splitter for splitting a light beam of a light source into an interferometry light beam and an ellipsometry light beam, and an analysis unit designed to ascertain the profile height in the measured region on the object surface from an analysis beam analyzed in a detector unit of the interferometry measuring system and a sensor beam received in an ellipsometry sensor. The interferometry measuring system includes a beam divider, reference mirror, and the detector unit, and the ellipsometry measuring system includes a polarizer for polarizing an ellipsometry light beam and transmitting same onto the measuring region on the object surface as well as the ellipsometry sensor, which includes a polarization filter in order to determine the polarization state of a received sensor beam.

Abstract: An optical device for sensing a surface profile of an object surface of an object by means of interferometric distance measurement, including a beam splitter for splitting a light beam of a light source into first and second sub-beams, a beam divider for dividing each sub-beam into a reference and a measuring beam, a mirror for reflecting the two reference beams, wherein each measuring beam is directed onto a measuring area on the object surface for reflection and after reflection is directed as object beam to the beam divider, each reference beam reflected by the mirror and directed as mirror beam to the beam divider, the object and mirror beams each interfere and are each fed as an evaluation beam to a detector unit for evaluation. Further include a light source for generating a monochromatic light beam, a detector unit, a signal evaluation unit and for determining the surface profile.

Abstract: A method and assembly for determining the thickness of layers of a sample stack influencing the intensity of reflected light from a light source. The thickness is determined from the intensity detected by an array detector with a plurality of detector elements in lines and columns. The detector comprises a plurality of sections in the form of parallel stripes, the stripes detecting the light reflected by the sample stack of layers simultaneously. Light of one selected wavelength range only is detected by each of the plurality of sections of the detector. The image of the sample stack on the detector or of the parallel stripes is moved in a direction perpendicular to the longitudinal direction of the parallel stripes such that each point of the sample stack is detected at least once in each of the different wavelength ranges.

Abstract: A method for optically measuring height profiles of surfaces, in which an image of the height profile is recorded using an optical recording system, is characterized in that the image is a differential interference contrast image and height gradients within the height profile are represented by intensity gradients, which are quantitatively or qualitatively evaluatable. The surfaces can have structures having a defined profile, in which intensity gradients in the differential interference contrast image, which assume, within a specified tolerance and within a specified range, a value which deviates from a predetermined value or assume a selected value from within a specified tolerance and within a specified range, indicate a defect.

Abstract: An apparatus for inspecting flat objects, in particular wafers, containing an object holder; a camera arrangement having a camera for recording an image of at least one part of the object; and a drive arrangement for producing a relative movement between the camera arrangement and the object from a first recording position to at least one further recording position; is characterized in that the camera arrangement has at least one further camera; the object areas imaged in different cameras are at least partially different, wherein all cameras together simultaneously record only part of the total inspection area of the object; and each object point of the entire inspection area can be imaged at least once in one of the cameras as a result of the relative movement between the camera arrangement and the object, as produced with the drive arrangement.

Abstract: A method and an inspection assembly for determining the thickness of one or more layers of a sample stack of layers or other properties influencing the intensity of light reflected by the sample stack with an assembly comprising a light source for illuminating the sample stack of layers and a camera with a detector for detecting the intensity of light reflected by the sample stack of layers in defined wavelength ranges, the method comprising the steps of illuminating the sample stack of layers with light from the light source; detecting the intensity of light reflected by the sample stack of layers with the detector in different wavelength ranges; and determining the thickness or other property from the intensity detected by the detector; are characterized in that the detector is an array detector with a plurality of detector elements in lines and columns; an image of the sample stack of layers is generated on the detector; the detector comprises a plurality of sections in the form of parallel stripes, the st

Abstract: A method for determining the thickness of a layer in a sample stack of at least two layers with an assembly comprising a light source for illuminating a stack of layers and a detector for detecting light reflected by the stack of layers in a defined first wavelength range, the method comprises a first step of obtaining a calibration curve by the calibrating steps of providing two or more reference stacks of layers, where each layer of the reference stacks has a known thickness, the same material as the sample stack and the layers occur in the same order as in the sample stack; illuminating the reference stacks with light from the light source; and detecting the intensity of light reflected by the reference stacks with the detector in the first wavelength range.

Abstract: A method for determining the thickness of a layer in a sample stack of at least two layers with an assembly comprising a light source for illuminating a stack of layers and a detector for detecting light reflected by the stack of layers in a defined first wavelength range, the method comprises a first step of obtaining a calibration curve by the calibrating steps of providing two or more reference stacks of layers, where each layer of the reference stacks has a known thickness, the same material as the sample stack and the layers occur in the same order as in the sample stack; illuminating the reference stacks with light from the light source; and detecting the intensity of light reflected by the reference stacks with the detector in the first wavelength range.

Abstract: An arrangement for optically detecting buried layers of flat objects having a plurality of layers, in particular wafers, containing a radiation source for illuminating the surface of the object at an angle; a polarization filter arranged in the beam path; and a detector for detecting radiation reflected by the surface of the object or transmitted by the object; is characterized in that that layer of the object which is closest to the radiation source at least partially transmits the radiation from the radiation source; the polarization filter transmits only radiation which is polarized parallel to the plane of incidence; and the surface of the object is illuminated at the Brewster angle. The surface of the object is preferably illuminated with unpolarized radiation and the polarization filter is arranged in the beam path between the surface of the object and the detector.

Abstract: The invention relates to an arrangement for analyzing an at least partially reflective surface of a wafer or other objects, containing a holder for holding the object; an inspection arrangement arranged at a distance in the region in front of the surface to be analyzed; and a measurement arrangement for determining the distance and/or inclination of the surface for the inspection arrangement; characterized be a radiation source, the radiation of which is directed towards the surface to be analyzed at an angle; and a spatially resolving detector for receiving the radiation from the radiation source that is reflected from the surface to be analyzed, wherein the radiation source and the detector are arranged outside the region necessary for the inspection between the inspection arrangement and the surface to be analyzed.

Abstract: An apparatus for inspecting flat objects, in particular wafers, containing an object holder, a camera arrangement having a camera for recording an image of at least one part of the object; and a drive arrangement for producing a relative movement between the camera arrangement and the object from a first recording position to at least one further recording position; is characterized in that the camera arrangement has at least one further camera; the object areas imaged in different cameras are at least partially different, wherein all cameras together simultaneously record only part of the total inspection area of the object; and each object point of the entire inspection area can be imaged at least once in one of the cameras as a result of the relative movement between the camera arrangement and the object, as produced with the drive arrangement.

Abstract: A method for inspecting wafers or other flat objects having an object surface, comprises the steps of: providing a camera assembly with a camera for recording images of said object surface or portions of said object surface during an exposure time which is limited by a shutter; generating a continuous relative movement of said camera assembly and said object without interruption, whereby a movement blur of said image during said exposure time is caused; continuously illuminating said object with an illuminance which is controlled to remain at the same value; and recording one or more images of at least one of said portions of said object surface with said camera; defining a movement blur which is acceptable for an analysis of said image wherein said exposure time is smaller than a time causing said acceptable movement blur; and performing said analysis of said image.

Abstract: A method for inspecting wafers or other flat objects having an object surface, comprises the steps of providing a camera assembly with a camera for recording images of said object surface or portions of said object surface during an exposure time which is limited by a shutter; generating a continuous relative movement of said camera assembly and said object without interruption, whereby a movement blur of said image during said exposure time is caused; continuously illuminating said object with an illuminance which is controlled to remain at the same value; and recording one or more images of at least one of said portions of said object surface with said camera; defining a movement blur which is acceptable for an analysis of said image wherein said exposure time is smaller than a time causing said acceptable movement blur; and performing said analysis of said image.

Abstract: The invention relates to an arrangement for analyzing an at least partially reflective surface of a wafer or other objects, containing a holder for holding the object; an inspection arrangement arranged at a distance in the region in front of the surface to be analyzed; and a measurement arrangement for determining the distance and/or inclination of the surface for the inspection arrangement; characterized be a radiation source, the radiation of which is directed towards the surface to be analyzed at an angle; and a spatially resolving detector for receiving the radiation from the radiation source that is reflected from the surface to be analyzed, wherein the radiation source and the detector are arranged outside the region necessary for the inspection between the inspection arrangement and the surface to be analyzed.

Abstract: A method for optically measuring height profiles of surfaces, in which an image of the height profile is recorded using an optical recording system, is characterized in that the image is a differential interference contrast image and height gradients within the height profile are represented by intensity gradients, which are quantitatively or qualitatively evaluatable. The surfaces can have structures having a defined profile, in which intensity gradients in the differential interference contrast image, which assume, within a specified tolerance and within a specified range, a value which deviates from a predetermined value or assume a selected value from within a specified tolerance and within a specified range, indicate a defect.

Abstract: The invention relates to a method for the inspection of flat objects, in particular wafers (10, 12, 14, 16, 18, 20, 24, 26, 28, 30), comprising the following steps: recording one digital image of the object surface of several homogeneous objects of a series in each case, wherein each digital image consists of a multiplicity of pixels having an intensity value assigned to the said pixel; and detecting defects on the respective object surface by comparing the recorded image with a reference image; wherein the images of the objects of the whole series are recorded before the comparison with the reference image, and the reference image is generated from several or all images of the series, e.g. by averaging (median) the images of the series.

Abstract: An arrangement for optically detecting buried layers of flat objects having a plurality of layers, in particular wafers, containing a radiation source for illuminating the surface of the object at an angle; a polarization filter arranged in the beam path; and a detector for detecting radiation reflected by the surface of the object or transmitted by the object; is characterized in that that layer of the object which is closest to the radiation source at least partially transmits the radiation from the radiation source; the polarization filter transmits only radiation which is polarized parallel to the plane of incidence; and the surface of the object is illuminated at the Brewster angle. The surface of the object is preferably illuminated with unpolarized radiation and the polarization filter is arranged in the beam path between the surface of the object and the detector.

Abstract: A Method for inspecting flat objects, especially wafers, with an object surface, comprises the steps of: scanning a digital image with a plurality of image points of said object surface with color- or grey values for each of said image points; detecting defects on said object surface by comparing said scanned digital image to a digital reference image; defining and selecting corresponding portions in said scanned digital image and in the digital reference image; determining a representative color- or grey value for each of said selected portions; calculating a compare value from said representative color- or grey value of said scanned digital image of a portion and a representative color- or grey value of said digital reference image of the same portion; and correcting each image point of said scanned digital image with a correction value determined from said compare value of step (e).

Abstract: An inspection system for flat objects, especially wafers and dies, including: a handling system for loading objects into the inspection system; a sensor assembly for receiving images or measuring values of the object surface or parts of the object surface; a driving assembly for generating a relative movement between the objects and the sensor assembly, where a movement is effected between objects relative to the sensor assembly along a first trajectory; wherein at least one further sensor assembly is provided, and the driving assembly is adapted to generate a further relative movement, where a movement of different objects relative to the sensor assembly can be generated on at least a second trajectory in order to allow at least two objects to be treated simultaneously.

Abstract: An inspection system for flat objects, especially wafers and dies, comprising: a handling system for loading objects into the inspection system; a sensor assembly for receiving images or measuring values of the object surface or parts of the object surface; a driving assembly for generating a relative movement between the objects and the sensor assembly, where a movement is effected between objects relative to the sensor assembly along a first trajectory; wherein at least one further sensor assembly is provided, and the driving assembly is adapted to generate a further relative movement, where a movement of different objects relative to the sensor assembly can be generated on at least a second trajectory in order to allow at least two objects to be treated simultaneously.