Patents by Inventor Bernhard Elsner
Bernhard Elsner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 7166536Abstract: A method of plasma etching, in particular of anisotropic plasma etching, of laterally defined structures in a silicon substrate, using a process gas, includes having at least one passivating material precipitated on the side walls of the laterally defined structures at least from time to time prior to and/or during etching. In an exemplary method, at least one of the compounds selected from the group ClF3, BrF3, or IF5 is added to the process gas as a fluorine-delivering etching gas. In another exemplary method, NF3 is added to the process gas, at least from time to time, as an additive consuming the passivating material. Finally, in another exemplary method, a light and easily ionizable gas, in particular H2, He, or Ne, is added, at least from time to time, to the process gas. The three exemplary methods may be combined.Type: GrantFiled: March 16, 2000Date of Patent: January 23, 2007Assignee: Robert Bosch GmbHInventors: Franz Laermer, Andrea Schilp, Bernhard Elsner
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Patent number: 6897775Abstract: A sensor system for remote detection of a measurable variable includes a sensor, with a first resonator (5) which has a resonant frequency that is variable under the influence of the measurable variable; an antenna (1) for sending and receiving a modulated high-frequency signal; a modem (2) for coupling the first resonator (5) to the antenna; and a second resonator (3) that can be excited by a carrier frequency of the high-frequency signal. An interrogation unit generates an inquiry radio signal for exciting the two resonators and interrupts the broadcasting of the inquiry radio signal in order to receive a response radio signal broadcast by the sensor.Type: GrantFiled: April 5, 2001Date of Patent: May 24, 2005Assignee: Robert Bosch GmbHInventors: Bernhard Elsner, Henry Heidemeyer
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Patent number: 6888471Abstract: A sensor system for detecting at least one dimensional variable of a rotating object (30) includes a plurality of sensors (33) disposed on the rotating object (30) that are sensitive to the dimensional variable and an antenna array (11) for supplying the sensors (33) with high-frequency energy and for receiving a high-frequency signal, modulated by the variable to be detected, from the sensors (33). The sensors are disposed on the object (30), distributed in the circumferential direction, and the antenna array (11) has a directional characteristic (34) for transmission and/or reception which is stationary with respect to a coordinate system not rotating with the object (30) and which includes only a subregion (32) of the object (30).Type: GrantFiled: April 5, 2001Date of Patent: May 3, 2005Assignee: Robert Bosch GmbHInventors: Bernhard Elsner, Henry Heidemeyer
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Patent number: 6724290Abstract: A coil constructed using the additive technique on the surface of a substrate is characterized in that the conductors of the coil are in contact with an insulating material made at least in part of diamond or diamond-like carbon.Type: GrantFiled: September 22, 2000Date of Patent: April 20, 2004Assignee: Robert Bosch GmbHInventors: Markus Ohnmacht, Bernhard Elsner
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Patent number: 6724023Abstract: A field effect transistor suited for use as a sensor element or in an acceleration sensor is described. For this purpose, the field effect transistor within a planar substrate has a drain area and a source area, which are separated from each other by a channel region. In addition, a gate electrode is provided which is arranged so as to be substantially self-supporting above the substrate over the channel region. The gate electrode is flexibly supported such that an external force acting upon it which has a component acting parallel to the surface of the substrate causes a deflection of the gate electrode parallel to the surface of the substrate. A method is also described in which, in a first method step, an integrated circuit having a drain area, a source area, and a channel region is manufactured or made available in a CMOS process, and thereafter, in a second method step, the substantially self-supporting gate electrode is produced on the integrated circuit using electroplating additive technology.Type: GrantFiled: April 19, 2001Date of Patent: April 20, 2004Assignee: Robert Bosch GmbHInventors: Klaus Heyers, Bernhard Elsner
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Publication number: 20040036590Abstract: A sensor system for detecting at least one dimensional variable of a rotating object (30) includes a plurality of sensors (33) disposed on the rotating object (30) that are sensitive to the dimensional variable and an antenna array (11) for supplying the sensors (33) with high-frequency energy and for receiving a high-frequency signal, modulated by the variable to be detected, from the sensors (33). The sensors are disposed on the object (30), distributed in the circumferential direction, and the antenna array (11) has a directional characteristic (34) for transmission and/or reception which is stationary with respect to a coordinate system not rotating with the object (30) and which includes only a subregion (32) of the object (30).Type: ApplicationFiled: June 16, 2003Publication date: February 26, 2004Inventors: Bernhard Elsner, Henry Heidemeyer
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Publication number: 20030102984Abstract: A sensor system for remote detection of a measurable variable includes a sensor, with a first resonator (5) which has a resonant frequency that is variable under the influence of the measurable variable; an antenna (1) for sending and receiving a modulated high-frequency signal; a modem (2) for coupling the first resonator (5) to the antenna; and a second resonator (3) that can be excited by a carrier frequency of the high-frequency signal. An interrogation unit generates an inquiry radio signal for exciting the two resonators and interrupts the broadcasting of the inquiry radio signal in order to receive a response radio signal broadcast by the sensor.Type: ApplicationFiled: November 1, 2002Publication date: June 5, 2003Inventors: Bernhard Elsner, Henry Heidemeyer
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Patent number: 6514670Abstract: A method for designing and manufacturing a micromechanical device providing a substrate having an anchoring region forming a sacrificial layer on substrate while leaving bare the anchoring region depositing an adhesion layer (30) on the sacrificial layer (25) and the anchoring region (20; 120; 220; 320, 325; 420, 425; 620; 755); forming a mask on the adhesion layer; depositing an electroplating layer on the unmasked region of the adhesion layer; and removing the mask and the sacrificial layer.Type: GrantFiled: July 12, 2000Date of Patent: February 4, 2003Assignee: Robert Bosch GmbHInventors: Josef Hirtreiter, Bernhard Elsner
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Patent number: 6360604Abstract: An acceleration sensor has an oscillating structure which is movably suspended on a substrate and can be deflected by an acting acceleration. The acceleration sensor also has an analyzing arrangement detecting a deflection of the oscillating structure due to the acceleration. The oscillating structure and/or the analyzing arrangement are connected to the substrate by mechanical decoupling devices.Type: GrantFiled: October 9, 1999Date of Patent: March 26, 2002Assignee: Robert Bosch GmbHInventors: Franz Laermer, Bernhard Elsner, Wilhelm Frey
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Publication number: 20020005530Abstract: A field effect transistor suited for use as a sensor element or in an acceleration sensor is described. For this purpose, the field effect transistor within a planar substrate has a drain area and a source area, which are separated from each other by a channel region. In addition, a gate electrode is provided which is arranged so as to be substantially self-supporting above the substrate over the channel region. The gate electrode is flexibly supported such that an external force acting upon it which has a component acting parallel to the surface of the substrate causes a deflection of the gate electrode parallel to the surface of the substrate. A method is also described in which, in a first method step, an integrated circuit having a drain area, a source area, and a channel region is manufactured or made available in a CMOS process, and thereafter, in a second method step, the substantially self-supporting gate electrode is produced on the integrated circuit using electroplating additive technology.Type: ApplicationFiled: April 19, 2001Publication date: January 17, 2002Inventors: Klaus Heyers, Bernhard Elsner
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Patent number: 6290858Abstract: A manufacturing method for a micromechanical device. In this method, a substrate is prepared with a plating base area to accommodate an anchoring region, and an adhesive layer is formed and structured on the substrate, so that the anchoring region is formed in the plating base area in the form of a quasi-insular region in a recess of the adhesive layer. The quasi-insular region is connected to the adhesive layer outside of the plated based area by at least one thin web. A mask is formed on the adhesive layer and structured so that the anchoring region and an overgrowth region adjacent to the anchoring region remain unmasked. An electroplated layer is deposited on the unmasked anchoring region so that the overgrowth region is overgrown, and the mask and the part of the adhesive layer that has not been overgrown are removed.Type: GrantFiled: October 13, 1999Date of Patent: September 18, 2001Assignee: Robert Bosch GmbHInventors: Josef Hirtreiter, Bernhard Elsner
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Patent number: 6030515Abstract: A method for fabricating metal micropatterns. Trenches are introduced into a polymer layer. These trenches are filled with the metal micropatterns using an electroplating process. Before the deposition of the metal micropatterns, the side walls of the trenches are covered with insulating layers which adhere to the metal micropatterns after the polymer layer is removed.Type: GrantFiled: July 23, 1998Date of Patent: February 29, 2000Assignee: Robert Bosch GmbHInventors: Klaus Heyers, Bernhard Elsner
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Patent number: 5996409Abstract: An acceleration sensing device includes a rotational speed sensor which is mounted on a substrate and detects rotational speed, at least one oscillating structure with a deflectable seismic mass, and an acceleration sensor that detects linear acceleration and has at least one additional seismic mass which is suspended on flexible elements so that it can be deflected. The seismic masses of the two sensors are deflected independently of one another.Type: GrantFiled: April 22, 1998Date of Patent: December 7, 1999Assignee: Robert Bosch GmbHInventors: Karsten Funk, Franz Laermer, Bernhard Elsner, Wilhelm Frey
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Patent number: 5937275Abstract: A method for producing acceleration sensors is proposed, in which a silicon layer that is deposited in an epitaxial application system is used. Above sacrificial layers (2) applied to the substrate (1), the material grows in the form of a polysilicon layer (6), which has a certain surface roughness. By application of a photoresist and by a wet etching process, this surface roughness is eliminated. Alternatively, chemical-mechanical smoothing is contemplated.Type: GrantFiled: October 27, 1997Date of Patent: August 10, 1999Assignee: Robert Bosch GmbHInventors: Horst Munzel, Michael Offenberg, Klaus Heyers, Bernhard Elsner, Markus Lutz, Helmut Skapa, Heinz-Georg Vossenberg, Nicholas Buchan, Eckhard Graf
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Patent number: 5646347Abstract: A suspension or an acceleration sensor having a suspension is proposed, by means of which a micromechanical structure or the acceleration sensor is anchored on a substrate. The suspension takes place by means of lever elements on which an equalizing beam acts. The lever elements are deformed by the stresses in the equalizing beam with respect to the substrate in such a way that the stresses in the microstructure with respect to the substrate are either compensated for or, alternatively, are converted from compressive stresses to tensile stresses or from tensile stresses to compressive stresses.Type: GrantFiled: August 31, 1995Date of Patent: July 8, 1997Assignee: Robert Bosch GmbHInventors: Kurt Weiblen, Michael Offenberg, Bernhard Elsner
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Patent number: 5631422Abstract: A sensor includes a first silicon layer, and a sensor element including at least one electrode structured from the first silicon layer. The sensor also includes at least one connecting element also structured from the first silicon layer. The connecting element has a doping less than the doping of the electrode. The sensor comprises at least one conductor track on the first silicon layer routed over the connecting element and coupled to the sensor element for supplying an external signal.Type: GrantFiled: October 30, 1995Date of Patent: May 20, 1997Assignee: Robert Bosch GmbHInventors: Peter Sulzberger, Michael Offenberg, Bernhard Elsner, Markus Lutz