Patents by Inventor Bernhard Geuppert
Bernhard Geuppert has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 9557653Abstract: An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.Type: GrantFiled: July 7, 2015Date of Patent: January 31, 2017Assignee: Carl Zeiss SMT GmbHInventors: Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Jens Kugler, Martin Mahlmann, Bernhard Geuppert, Thomas Petasch, Gerhard Fuerter
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Patent number: 9551944Abstract: A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.Type: GrantFiled: August 25, 2014Date of Patent: January 24, 2017Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Geuppert, Guido Limbach, Harald Woelfle, Peter Deufel
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Patent number: 9436095Abstract: A microlithographic projection exposure apparatus includes a projection lens that is configured for immersion operation. For this purpose an immersion liquid is introduced into an immersion space that is located between a last lens of the projection lens on the image side and a photosensitive layer to be exposed. To reduce fluctuations of refractive index resulting from temperature gradients occurring within the immersion liquid, the projection exposure apparatus includes heat transfer elements that heat or cool partial volumes of the immersion liquid so as to achieve an at least substantially homogenous or at least substantially rotationally symmetric temperature distribution within the immersion liquid.Type: GrantFiled: November 20, 2012Date of Patent: September 6, 2016Assignee: Carl Zeiss SMT GmbHInventors: Albrecht Ehrmann, Ulrich Wegmann, Rainer Hoch, Joerg Mallmann, Karl-Heinz Schuster, Ulrich Loering, Toralf Gruner, Bernhard Kneer, Bernhard Geuppert, Franz Sorg, Jens Kugler, Norbert Wabra
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Patent number: 9410662Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising at least one actuator which exerts a controllable force on the optical element; wherein between the actuator and the optical element a mechanical coupling in the form of a pin is embodied in such a way that, relative to the drive axis of the actuator, the ratio of the stiffness of the mechanical coupling in an axial direction to the stiffness in a lateral direction is at least 100; and at least one damping element which brings about a damping of a natural vibration form of the pin in a lateral direction.Type: GrantFiled: July 12, 2013Date of Patent: August 9, 2016Assignee: Carl Zeiss SMT GmbHInventors: Bernhard Geuppert, Rodolfo Rabe, Ulrich Schoenhoff
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Patent number: 9304404Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.Type: GrantFiled: October 21, 2013Date of Patent: April 5, 2016Assignees: Carl Zeiss SMT GmbH, ASML Netherlands B.V.Inventors: Juergen Fischer, Ulrich Schoenhoff, Bernhard Geuppert, Hans Butler, Robertus Johannes Marinus De Jongh
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Publication number: 20160004170Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).Type: ApplicationFiled: September 14, 2015Publication date: January 7, 2016Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Marc Wilhelmus Maria VAN DER WIJST, Hans Butler, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Yim Bun Patrick Kwan, Dick Antonius Hendrikus Laro
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Publication number: 20150323873Abstract: An optical projection unit includes first and second optical element modules. The first optical element module includes a first housing unit and a first optical element received within the first housing unit and having an optically used first region defining a first optical axis. The second optical element module is located adjacent to the first optical element module and includes a second optical element which defines a second optical axis of the optical projection unit. The first housing unit has a central first housing axis and an outer wall extending in a circumferential direction about the first housing axis. The first optical axis is laterally offset and/or inclined with respect to the first housing axis. The first housing axis is substantially collinear with the second optical axis.Type: ApplicationFiled: July 7, 2015Publication date: November 12, 2015Inventors: Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Jens Kugler, Martin Mahlmann, Bernhard Geuppert, Thomas Petasch, Gerhard Fuerter
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Patent number: 9134632Abstract: Lithography apparatus and device manufacturing methods are disclosed in which means are provided for reducing the extent to which vibrations propagate between a first element of a projection system and a second element of a projection system. Approaches disclosed include the use of plural resilient members in series as part of a vibration isolation system, plural isolation frames for separately supporting first and second projection system frames, and modified connection positions for the interaction between the first and second projection system frames and the isolation frame(s).Type: GrantFiled: November 21, 2011Date of Patent: September 15, 2015Assignees: ASML Netherlands B.V., Carl Zeiss SMT GMBHInventors: Marc Wilhelmus Maria Van Der Wijst, Hans Butler, Yim Bun Patrick Kwan, Erik Roelof Loopstra, Bernhard Geuppert, Marco Hendrikus Hermanus Oude Nijhuis, Rodolfo Guglielmi Rabe, Dick Antonius Hendrikus Laro
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Patent number: 9110388Abstract: The disclosure relates to a projection exposure apparatus and an optical system, such as a projection objective or an illumination system in a projection exposure apparatus for microlithography, that includes at least one optical element and at least one manipulator having a drive device for the optical element. The drive device can have at least one movable partial element and at least one stationary partial element movable relative to one another in at least one direction of movement.Type: GrantFiled: August 20, 2012Date of Patent: August 18, 2015Assignee: Carl Zeiss SMT GmbHInventors: Sascha Bleidistel, Bernhard Geuppert
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Patent number: 9104016Abstract: An optical projection system for a microlithography system includes a light path, a first lens unit receiving a first part of the light path, a second lens unit receiving a second part of the light path, and a support unit supporting the first and second lens units. The first and second lens units are elongated lens units including a plurality of lenses. The support unit includes a housing receiving a third part of the light path and enclosing a reflective element. The housing includes first and second interfaces. The first interface is a first support interface supporting the first lens unit. The second interface is a second support interface supporting the second lens unit at a location substantially opposite to the first interface.Type: GrantFiled: September 25, 2012Date of Patent: August 11, 2015Assignee: Carl Zeiss SMT GmbHInventors: Johannes Rau, Armin Schoeppach, Bernhard Gellrich, Jens Kugler, Martin Mahlmann, Bernhard Geuppert, Thomas Petasch, Gerhard Fuerter
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Publication number: 20150212431Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: ApplicationFiled: April 6, 2015Publication date: July 30, 2015Inventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Publication number: 20150168853Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement of the floor in order to restrict a movement of the second component relative to the first component.Type: ApplicationFiled: December 22, 2014Publication date: June 18, 2015Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
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Patent number: 9001304Abstract: A projection exposure system (10) for microlithography which includes: a mask holding device (14) holding a mask (18) with mask structures (20) disposed on the mask, a substrate holding device (36) holding a substrate (30), projection optics (26) imaging the mask structures (20) onto the substrate (30) during an exposure process, and a measurement structure (48) disposed in a defined position with respect to a reference element (16) of the projection exposure system (10), which defined position is mechanically uncoupled from the position of the mask holding device (14). The projection exposure system (10) also includes a detector (52) arranged to record an image of the measurement structure (48) imaged by the projection optics (26). The projection exposure system (10) is configured such that during operation of the projection exposure system (10) the imaging of the mask structures (20) and the imaging of the measurement structure (48) take place at the same time by the projection optics (26.Type: GrantFiled: July 16, 2010Date of Patent: April 7, 2015Assignee: Carl Zeiss SMT GmbHInventors: Ulrich Mueller, Joachim Stuehler, Oswald Gromer, Rolf Freimann, Paul Kaufmann, Bernhard Geuppert
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Publication number: 20140359990Abstract: A method and a device for replacing objective parts, especially of a projection or illumination objective for microlithography in which an objective having an objective interior and objective parts provided therein is provided. At least one objective part is replaceably accommodated in the objective. Immediately prior to installation in the objective, the replaceable objective part is cleaned outside the objective interior in at least one cleaning room sealed off from the ambient atmosphere. Immediately after cleaning, the replaceable objective is installed in the objective without contact with the normal ambient atmosphere.Type: ApplicationFiled: August 25, 2014Publication date: December 11, 2014Inventors: Bernhard Geuppert, Guido Limbach, Harald Woelfle, Peter Deufel
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Patent number: 8705185Abstract: An optical element has at least one additional element fitted thereon which dissipates the vibrational energy of the optical element by friction.Type: GrantFiled: March 27, 2012Date of Patent: April 22, 2014Assignee: Carl Zeiss SMT GmbHInventors: Johannes Rau, Armin Schoeppach, Bernhard Geuppert
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Patent number: 8659745Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: GrantFiled: June 19, 2013Date of Patent: February 25, 2014Assignee: Carl Zeiss SMT GmbHInventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier
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Publication number: 20140043596Abstract: An arrangement actuates an element in a microlithographic projection exposure apparatus. The arrangement includes first and second actuators and first and second mechanical couplings. The first and second actuators are coupled to the element via corresponding ones of the first and second mechanical couplings for applying respective forces to the element which is regulatable in at least one degree of freedom. The first and second actuators have first and second actuator masses, respectively, and the first actuator mass and the first mechanical coupling conjointly define a first mass-spring system operating as a first low-pass filter. The second actuator mass and the second mechanical coupling conjointly define a second mass-spring system operating as a second low-pass filter. The first and second mass-spring systems have first and second natural frequencies deviating from each other by a maximum deviation equal to 10% of the largest of the first and second natural frequencies.Type: ApplicationFiled: October 21, 2013Publication date: February 13, 2014Applicants: ASML Netherlands B.V., Carl Zeiss SMT GmbHInventors: Juergen Fischer, Ulrich Schoenhoff, Bernhard Geuppert, Hans Butler, Robertus Johannes Marinus De Jongh
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Publication number: 20140021324Abstract: A lithography apparatus is disclosed, which comprises: a first component, a second component, a coupling device which is configured to couple the first and second components to one another, a capture device for capturing a movement (Z) of a floor on which the lithography apparatus stands, and a control device which is configured to actuate the coupling device depending on the captured movement (Z) of the floor in order to restrict a movement of the second component relative to the first component.Type: ApplicationFiled: July 3, 2013Publication date: January 23, 2014Inventors: Mathias Schumacher, Burkhard Corves, Jens Kugler, Markus Knuefermann, Bernhard Geuppert, Stefan Xalter, Bernhard Gellrich
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Publication number: 20130314771Abstract: The invention relates to an arrangement for mounting an optical element, in particular in an EUV projection exposure apparatus, comprising at least one actuator which exerts a controllable force on the optical element; wherein between the actuator and the optical element a mechanical coupling in the form of a pin is embodied in such a way that, relative to the drive axis of the actuator, the ratio of the stiffness of the mechanical coupling in an axial direction to the stiffness in a lateral direction is at least 100; and at least one damping element which brings about a damping of a natural vibration form of the pin in a lateral direction.Type: ApplicationFiled: July 12, 2013Publication date: November 28, 2013Inventors: Bernhard Geuppert, Rodolfo Rabe, Ulrich Schoenhoff
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Publication number: 20130278911Abstract: The disclosure relates to an optical system, such as a projection exposure apparatus for semiconductor lithography, including a manipulable correction arrangement for reducing image aberrations. In some embodiments, the system includes at least one manipulator configured to reduce image aberrations. The manipulator can include at least one optical element which can be manipulated by at least one actuator. The manipulator can be formed in changeable fashion together with an actuator.Type: ApplicationFiled: June 19, 2013Publication date: October 24, 2013Inventors: Guido Limbach, Franz Sorg, Armin Schoeppach, Ulrich Weber, Ulrich Loering, Dirk Hellweg, Peter Meyer, Stefan Xalter, Jens Kugler, Bernhard Gellrich, Stefan Hembacher, Bernhard Geuppert, Aksel Goehnermeier