Patents by Inventor Bernhard Heinemann

Bernhard Heinemann has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6709475
    Abstract: An installation for processing wafers that includes fabrication units, which are located in a clean room, and includes a supply system for supplying and discharging operating substances for the fabrication units. The supply system has first supply lines and first discharge lines, in which operating substances that are heavier than the surrounding atmosphere are downwardly guided. The supply system has second supply lines and second discharge lines, in which the lighter operating substances are upwardly guided.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: March 23, 2004
    Assignee: Infineon Technologies AG
    Inventor: Bernhard Heinemann
  • Patent number: 6602127
    Abstract: A plant for producing semiconductor products that includes at least one clean room having a floor and a plurality of production units that are configured in the clean room. The plurality of the production units define processing locations for processing semiconductor products. The processing locations are located near the floor of the clean room. The plant also includes an air supply system for directly feeding in feed air at the processing locations. The circulation of feed air and waste air caused by the force of gravity is utilized so that feed air is made available with little energy expenditure.
    Type: Grant
    Filed: September 26, 2001
    Date of Patent: August 5, 2003
    Assignee: Infineon Technologies AG
    Inventor: Bernhard Heinemann
  • Publication number: 20020074025
    Abstract: An installation for processing wafers that includes fabrication units, which are located in a clean room, and includes a supply system for supplying and discharging operating substances for the fabrication units. The supply system has first supply lines and first discharge lines, in which operating substances that are heavier than the surrounding atmosphere are downwardly guided. The supply system has second supply lines and second discharge lines, in which the lighter operating substances are upwardly guided.
    Type: Application
    Filed: September 26, 2001
    Publication date: June 20, 2002
    Inventor: Bernhard Heinemann
  • Publication number: 20020040568
    Abstract: A plant for producing semiconductor products that includes at least one clean room having a floor and a plurality of production units that are configured in the clean room. The plurality of the production units define processing locations for processing semiconductor products. The processing locations are located near the floor of the clean room. The plant also includes an air supply system for directly feeding in feed air at the processing locations. The circulation of feed air and waste air caused by the force of gravity is utilized so that feed air is made available with little energy expenditure.
    Type: Application
    Filed: September 26, 2001
    Publication date: April 11, 2002
    Inventor: Bernhard Heinemann