Patents by Inventor Bert Dirk SCHOLTEN
Bert Dirk SCHOLTEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240168394Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system that includes a plurality of gas bearing devices. Each gas bearing device includes: a gas bearing body, which has a free surface, a primary channel which extends through the gas bearing body and has an inlet opening in the free surface, a secondary channel system which extends through the gas bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system is higher than the flow resistance in the primary channel.Type: ApplicationFiled: December 28, 2023Publication date: May 23, 2024Applicant: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan JANSSENS, Bert Dirk SCHOLTEN, Sjoerd Nicolaas Lambertus DONDERS, Teunis VAN DAM, Peter Mark OVERSCHIE, Theresa Mary SPAAN-BURKE, Siegfried Alexander TROMP
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Patent number: 11860552Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.Type: GrantFiled: June 12, 2017Date of Patent: January 2, 2024Assignee: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan Janssens, Bert Dirk Scholten, Sjoerd Nicolaas Lambertus Donders, Teunis Van Dam, Peter Mark Overschie, Theresa Mary Spaan-Burke, Siegfried Alexander Tromp
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Publication number: 20230260820Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: ApplicationFiled: April 24, 2023Publication date: August 17, 2023Applicant: ASML NETHERLANDS B.V.Inventors: Andre Bernardus JEUNINK, Robby Franciscus Josephus MARTENS, Youssef Karel Maria DE VOS, Ringo Petrus Cornelis VAN DORST, Gerhard Albert TEN BRINKE, Dirk Jerome Andre SENDEN, Coen Hubertus Matheus BALTIS, Justin Johannes Hermanus GERRITZEN, Jelmer Mattheüs KAMMINGA, Evelyn Wallis PACITTI, Thomas POIESZ, Arie Cornelis SCHEIBERLICH, Bert Dirk SCHOLTEN, André SCHREUDER, Abraham Alexander SOETHOUDT, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER
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Patent number: 11664264Abstract: A method for unloading a substrate from a support table configured to support the substrate, the method including: supplying gas to a gap between a base surface of the support table and the substrate via a plurality of gas flow openings in the support table, wherein during an initial phase of unloading the gas is supplied through at least one gas flow opening in an outer region of the support table and not through any gas flow opening in a central region of the support table radially inward of the outer region, and during a subsequent phase of unloading the gas is supplied through at least one gas flow opening in the outer region and at least one gas flow opening in the central region.Type: GrantFiled: December 22, 2016Date of Patent: May 30, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Andre Bernardus Jeunink, Robby Franciscus Josephus Martens, Youssef Karel Maria De Vos, Ringo Petrus Cornelis Van Dorst, Gerhard Albert Ten Brinke, Dirk Jerome Andre Senden, Coen Hubertus Matheus Baltis, Justin Johannes Hermanus Gerritzen, Jelmer Mattheüs Kamminga, Evelyn Wallis Pacitti, Thomas Poiesz, Arie Cornelis Scheiberlich, Bert Dirk Scholten, André Schreuder, Abraham Alexander Soethoudt, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver
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Patent number: 11579533Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: GrantFiled: January 18, 2021Date of Patent: February 14, 2023Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Coen Hubertus Matheus Baltis, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Daan Daniel Johannes Antonius Van Sommeren, Mark Johannes Hermanus Frencken
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Patent number: 11269259Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: GrantFiled: November 19, 2020Date of Patent: March 8, 2022Assignee: ASML NETHERLANDS B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Publication number: 20210263418Abstract: A tool for modifying substrate support elements of a substrate holder, the substrate support elements having support surfaces for supporting a substrate, the tool includes a main body having a main body surface, and multiple protrusions from the main body surface, the multiple protrusions having distal ends configured to contact the support surfaces to modify the substrate support elements. Furthermore, a lithographic apparatus and a method comprising such a tool are provided.Type: ApplicationFiled: June 27, 2019Publication date: August 26, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Bert Dirk SCHOLTEN, Peter Andreas Maria BILLEKENS, Tiannan GUAN, Tjarco LINDEIJER, Harold Anton MEHAGNOUL, Jimmy Matheus Wilhelmus VAN DE WINKEL, Cas Johannes Petrus Maria VAN NUENEN, Hendrikus Theodorus Jacobus Franciscus VAN VERSEVELD, Marcus Martinus Petrus Adrianus VERMEULEN
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Patent number: 11016401Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: GrantFiled: May 1, 2018Date of Patent: May 25, 2021Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Matthew Lipson, Christopher John Mason, Damoon Sohrabibabaheidary, Jimmy Matheus Wilhelmus Van De Winkel, Bert Dirk Scholten
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Publication number: 20210141312Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: ApplicationFiled: January 18, 2021Publication date: May 13, 2021Applicant: ASML NETHERLANDS B.V.Inventors: Günes NAKIBOGLU, Coen Hubertus Matheus BALTIS, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Daan Daniel Johannes Antonius VAN SOMMERE, Mark Johannes Hermanus FRENCKEN
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Publication number: 20210072649Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: ApplicationFiled: November 19, 2020Publication date: March 11, 2021Applicant: ASML Netherlands B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis M Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Publication number: 20210053177Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.Type: ApplicationFiled: January 24, 2019Publication date: February 25, 2021Applicants: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Bert Dirk SCHOLTEN, Satish ACHANTA, Aydar AKCHURIN, Pavlo ANTONOV, Coen Hubertus Matheus BALTIS, Jeroen BOUWKNEGT, Ann-Sophie m. FARLE, Christopher John MASON, Ralph Nicholas PALERMO, Thomas POIESZ, Yuri Johannes Gabriel VAN DE VIJVER, Jimmy Matheus Wilhelmus VAN DE WINKEL
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Patent number: 10895808Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: GrantFiled: November 2, 2016Date of Patent: January 19, 2021Assignee: ASML NETHERLANDS B.V.Inventors: Günes Nakiboglu, Coen Hubertus Matheus Baltis, Siegfried Alexander Tromp, Yuri Johannes Gabriël Van De Vijver, Bert Dirk Scholten, Daan Daniel Johannes Antonius Van Sommeren, Mark Johannes Hermanus Frencken
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Patent number: 10871715Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: GrantFiled: November 21, 2019Date of Patent: December 22, 2020Assignee: ASML Netherlands B.V.Inventors: Thomas Poiesz, Bert Dirk Scholten, Dirk Willem Harberts, Lucas Henricus Johannes Stevens, Laura Maria Fernandez Diaz, Johannes Adrianus Cornelis Maria Pijnenburg, Abraham Alexander Soethoudt, Wilhelmus Jacobus Johannes Welters, Jimmy Matheus Wilhelmus Van De Winkel
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Publication number: 20200183287Abstract: A substrate holder for use in a lithographic apparatus and configured to support a substrate, the substrate holder including a main body having a main body surface; a plurality of burls projecting from the main body surface to support the substrate spaced apart from the main body surface; and a liquid control structure provided in a peripheral region of the main body surface and configured to cause liquid to preferentially flow toward the periphery of the main body surface.Type: ApplicationFiled: November 2, 2016Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Günes NAKIBOGLU, Coen Hubertus Matheus BALTIS, Siegfried Alexander TROMP, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Daan Daniel Johannes Antonius VAN SOMMEREN, Mark Johannes Hermanus FRENCKEN
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Publication number: 20200183289Abstract: A substrate table for an immersion system having a projection system arranged to project an image onto a substrate and a liquid confinement system configured to confine an immersion liquid to a space between the projection system and the substrate, the substrate table including: a substrate holder configured to hold a substrate; and a current control device arranged to reduce an electric current flowing between the substrate and the substrate holder while the immersion liquid is confined to the space.Type: ApplicationFiled: November 21, 2019Publication date: June 11, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Thomas POIESZ, Bert Dirk SCHOLTEN, Dirk Willem HARBERTS, Lucas Henricus Johannes STEVENS, Laura Maria FERNANDEZ DIAZ, Johannes Adrianus Cornelis Maria PIJNENBURG, Abraham Alexander SOETHOUDT, Wilhelmus Jacobus Johannes WELTERS, Jimmy Matheus Wilhelmus VAN DE WINKEL
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Publication number: 20200103770Abstract: A system for cleaning a substrate support having a plurality of projections extending in a first direction each with a terminal surface arranged to be in contact with the substrate, the system including: a treatment tool arranged for relative movement in a second direction orthogonal to the first direction and a third direction orthogonal to the first and second directions over the terminal surfaces of the projections to remove matter from the substrate support; and a controller to control the treatment tool dependent upon a position in the second and third directions of the treatment tool relative to the substrate support such that the removal amount from each of the plurality of projections is maintained substantially constant from one projection to another.Type: ApplicationFiled: May 23, 2018Publication date: April 2, 2020Applicant: ASML NETHERLANDS B.V.Inventors: Tiannan GUAN, Tjarco LINDEIJER, Bert Dirk SCHOLTEN, André SCHREUDER
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Publication number: 20200073262Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.Type: ApplicationFiled: May 1, 2018Publication date: March 5, 2020Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Matthew LIPSON, Christopher John MASON, Damoon SOHRABIBABAHEIDARY, Jimmy Matheus Wilhelmus VAN DE WINKEL, Bert Dirk SCHOLTEN
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Patent number: 10534270Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: GrantFiled: February 7, 2019Date of Patent: January 14, 2020Assignee: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus Van den Nieuwelaar, Victor Manuel Blanco Carballo, Casper Roderik De Groot, Rolf Hendrikus Jacobus Custers, David Merritt Phillips, Frederik Antonius Van der Zanden, Pieter Lein Joseph Gunter, Erik Henricus Egidius Catharina Eummelen, Yuri Johannes Gabriël Van de Vijver, Bert Dirk Scholten, Marijn Wouters, Ronald Frank Kox, Jorge Alberto Vieyra Salas
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Publication number: 20190187568Abstract: An immersion lithography apparatus has a controller configured to control a substrate table to move along an exposure route including in order: an entry motion in which the substrate moves from an off-substrate position at which the immersion space does not overlap the substrate to an on-substrate position at which the immersion space at least partially overlaps the substrate, a transfer motion in which the substrate table changes speed and/or direction and moves for at least a transfer time after the substrate moves to the on-substrate position, and an expose motion in which the substrate is scanned and the patterned beam is projected onto the substrate, wherein throughout the transfer motion at least a part of the immersion space overlaps the substrate and wherein the patterned beam is not projected onto the substrate during the entry motion and the transfer motion.Type: ApplicationFiled: February 7, 2019Publication date: June 20, 2019Applicant: ASML Netherlands B.V.Inventors: Norbertus Josephus Martinus VAN DEN NIEUWELAAR, Victor Manuel BLANCO CARBALLO, Casper Roderik DE GROOT, Rolf Hendrikus Jacobus CUSTERS, David Merritt PHILLIPS, Frederik Antonius VAN DER ZANDEN, Pieter Lein Joseph GUNTER, Erik Henricus Egidius Catharina EUMMELEN, Yuri Johannes Gabriël VAN DE VIJVER, Bert Dirk SCHOLTEN, Marijn WOUTERS, Ronald Frank KOX, Jorge Alberto VIEYRA SALAS
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Publication number: 20190187571Abstract: A system for positioning, a stage system, a lithographic apparatus, a method for positioning and a method for manufacturing a device in which use is made of a stage system. The stage system has a plurality of air bearing devices. Each air bearing device has: a gas bearing body which has a free surface, a primary channel which extends through the bearing body and has an inlet opening in the free surface, and a secondary channel system which extends through the bearing body and which has a plurality of discharge openings in the free surface. The flow resistance in the secondary channel system can be higher than the flow resistance in the primary channel.Type: ApplicationFiled: June 12, 2017Publication date: June 20, 2019Applicant: ASML NETHERLANDS B.V.Inventors: Stef Marten Johan JANSSENS, Bert Dirk SCHOLTEN, Sjoerd Nicolaas Lambertus DONDERS, Teunis VAN DAM, Peter Mark OVERSCHIE, Theresa Mary SPAAN-BURKE, Siegfried Alexander TROMP