Abstract: Target assembly for an isotope production system. The target assembly includes a target body having a production chamber and a beam cavity that is adjacent to the production chamber. The production chamber is configured to hold a target liquid. The beam cavity opens to an exterior of the target body and is configured to receive a particle beam that is incident on the production chamber. The target assembly also includes a vibrating device that is secured to the target body. The vibrating device is configured to cause vibrations that are experienced within the production chamber.

Abstract: Target assembly for an isotope production system. The target assembly includes a target body having a production chamber and a beam cavity that is adjacent to the production chamber. The production chamber is configured to hold a target liquid. The beam cavity opens to an exterior of the target body and is configured to receive a particle beam that is incident on the production chamber. The target assembly also includes a vibrating device that is secured to the target body. The vibrating device is configured to cause vibrations that are experienced within the production chamber.

Abstract: Tube amplifier assembly including a tube assembly having a support frame and a vacuum tube secured to the support frame. The support frame includes a ground wall that is electrically conductive and configured to be coupled to ground. The tube amplifier assembly also includes a supply cable electrically coupled to the vacuum tube. The tube amplifier assembly also includes a multi-layer decoupling capacitor having a first insulation layer, a power electrode, a second insulation layer, and a ground plate. The first insulation layer is interleaved between the ground wall and the power electrode, and the second insulation layer is interleaved between the power electrode and the ground plate. The supply cable is electrically coupled to the power electrode, and the ground plate is mounted to and electrically coupled to the ground wall of the support frame.

Abstract: A particle accelerator including an electrical field system and a magnetic field system that are configured to direct charged particles along a desired path within an acceleration chamber. The particle accelerator also includes a mechanical device that is located within the acceleration chamber. The mechanical device is configured to be selectively moved to different positions within the acceleration chamber. The particle accelerator also includes an electromechanical (EM) motor having a connector component and piezoelectric elements that are operatively coupled to the connector component. The connector component is operatively attached to the mechanical device. The EM motor drives the connector component when the piezoelectric elements are activated thereby moving the mechanical device.

Abstract: A particle accelerator including an electrical field system and a magnetic field system that are configured to direct charged particles along a desired path within an acceleration chamber. The particle accelerator also includes a mechanical device that is located within the acceleration chamber. The mechanical device is configured to be selectively moved to different positions within the acceleration chamber. The particle accelerator also includes an electromechanical (EM) motor having a connector component and piezoelectric elements that are operatively coupled to the connector component. The connector component is operatively attached to the mechanical device. The EM motor drives the connector component when the piezoelectric elements are activated thereby moving the mechanical device.