Abstract: In the calculation or simulation of technical components for use in a technical system wherein calculation programs are provided for various physical variables which are taken into account on a case-to-case basis, a preprocessing method is provided in order to couple programs for physically and geometrically calculating such a component without the need for the creation of a tailor-made calculation program for a specific component. The procedural setup of the processing steps permits a modular composition of the calculation process for the simulation of any type of component subjected to physical influences.

Abstract: In the calculation or simulation of technical components for use in a technical system wherein calculation programs are provided for various physical variables which are taken into account on a case-to-case basis, a preprocessing method is provided in order to couple programs for physically and geometrically calculating such a component without the need for the creation of a tailor-made calculation program for a specific component. The procedural setup of the processing steps permits a modular composition of the calculation process for the simulation of any type of component subjected to physical influences.

Abstract: A magnetic deflection system for charged particles, the which includes a coil arrangement for generating a magnetic guide field perpendicular to the plane of the desired orbit so as to guide the particles in the plane S.sub.E of the desired orbit on a deflection path on a deflection radius r.sub.0. The system has two coils which are arranged on top of one another on either side of an area A.sub.0 defined by the direction of the magnetic guide field and the deflection radius r.sub.0 so that the winding faces of the coils extend parallel to area A.sub.0, with two of the coils being disposed above the plane S.sub.E of the desired orbit and two below the plane S.sub.E of the desired orbit.In a preferred embodiment, the coils are composed of at least one double pancake.

Abstract: A superconducting magnet system for particle acceleration of a synchrotron radiaton source having a particle orbit in a given plane includes a superconducting winding surrounding the particle orbit and having a slot formed therein in the given plane of the particle orbit for egress of synchrotron radiation, the superconducting winding having a cos .theta. shaped current distribution, where .theta. is the azimuth angle, and a mechanical support for the superconducting winding including at least one clamping element pre-tensioning the superconducting winding, and tightening elements in the vicinity of the slot pre-tensioning the superconducting winding in cooperation with the at least one clamping element.

Abstract: A process for the preparation of a compound material composed of a substrate and a metallic layer of a metastable or unstable phase strongly adhering to the substrate surface. This phase contains more than one elemental component, and is deposited onto the substrate from the gas or vapor phase. In this process:(a) the components used for formation of the metastable or unstable phase are very pure, having an impurity concentration of less than 100 ppm by weight;(b) during initial deposition of the layer, up to a thickness of about 5 to 20 nm, the mobility of the components on the substrate is reduced to promote germination; and(c) the components are subsequently deposited for the remainder of the layer up to the desired thickness, onto the substrate which is heated.

Abstract: A process for the preparation of a compound material composed of a substrate and a metallic layer of a metastable or unstable phase strongly adhering to the substrate surface. This phase contains more than one elemental component, and is deposited onto the substrate from the gas or vapor phase. In this process:(a) the components used for formation of the metastable or unstable phase are very pure, having an impurity concentration of less than 100 ppm by weight;(b) during initial deposition of the layer, up to a thickness of about 5 to 20 nm, the mobility of the components on the substrate is reduced to promote germination; and(c) the components are subsequently deposited for the remainder of the layer up to the desired thickness, onto the substrate which is heated.

Abstract: A process for the preparation of a compound material composed of a substrate and a metallic layer of a metastable or unstable phase strongly adhering to the substrate surface. This phase contains more than one elemental component, and is deposited onto the substrate from the gas or vapor phase. In this process:(a) the components used for formation of the metastable or unstable phase are very pure, having an impurity concentration of less than 100 ppm by weight;(b) during initial deposition of the layer, up to a thickness of about 5 to 20 nm, the mobility of the components on the substrate is reduced to promote germination; and(c) the components are subsequently deposited for the remainder of the layer up to the desired thickness, onto the substrate which is heated.