Abstract: Mechanisms are provided to automatically identify source code relevant to a task among a set of disparate source code. The mechanisms search a plurality of working sets based on a given keyword associated with the task in order to identify a subset of working sets from a working set store that comprises the given keyword. The mechanisms identify source code files associated with the identified working sets. The mechanisms determine a score that depends on the occurrences of matched working sets for the given keyword within each identified source code file. For each directory or repository, the mechanisms determine an aggregated score for all the source code files comprised therein. The mechanisms present a listing of all identified source code files by directory and repository, where the listing illustrates a relevancy of repositories, directories, and source code files that comprise the given keyword associated with the task.

Abstract: Mechanisms are provided to automatically identify source code relevant to a task among a set of disparate source code. The mechanisms search a plurality of working sets based on a given keyword associated with the task in order to identify a subset of working sets from a working set store that comprises the given keyword. The mechanisms identify source code files associated with the identified working sets. The mechanisms determine a score that depends on the occurrences of matched working sets for the given keyword within each identified source code file. For each directory or repository, the mechanisms determine an aggregated score for all the source code files comprised therein. The mechanisms present a listing of all identified source code files by directory and repository, where the listing illustrates a relevancy of repositories, directories, and source code files that comprise the given keyword associated with the task.

Abstract: A wafer support device is provided. The wafer support device includes a susceptor having a surface configured to support a bottom surface of a wafer. The susceptor has a plurality of guiding recesses. The wafer support device also includes a pin lift that has a plurality of pins extending therefrom. The plurality of pins is configured to be passed via the plurality of guiding recesses of the susceptor to engage the bottom surface of the wafer. The susceptor is configured to be moved relative to the plurality of pins in a direction substantially orthogonal to the surface of the susceptor.

Abstract: An apparatus comprising a semiconductor processing chamber, a plasma generator, and a pipe connecting a semiconductor processing chamber and the plasma generator. The plasma generator includes a generation chamber, a radio frequency generator which generates an ion plasma within the generation chamber, and a magnetic device which confines the plasma primarily within a center region of the generation chamber.