Patents by Inventor Blake R. Koelmel

Blake R. Koelmel has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Apparatus and Method for Improved Control of Heating and Cooling of Substrates
    Publication number: 20100074604
    Abstract: Methods and apparatus for processing substrates and controlling the heating and cooling of substrates are described. A radiation source providing radiation in a first range of wavelengths heats the substrate within a predetermined temperature range, the substrate being absorptive of radiation in a second range of wavelengths within the first range of wavelengths and within the predetermined temperature rang. A filter prevents at least a portion of radiation within the second wavelength range from reaching the substrate.
    Type: Application
    Filed: October 9, 2009
    Publication date: March 25, 2010
    Applicant: Applied Materials, Inc.
    Inventors: Blake R. Koelmel, Norman L. Tam, Joseph M. Ranish
  • Apparatus Including Heating Source Reflective Filter for Pyrometry
    Publication number: 20090289053
    Abstract: Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
    Type: Application
    Filed: June 12, 2009
    Publication date: November 26, 2009
    Applicant: Applied Materials, Inc.
    Inventors: Joseph M. Ranish, Aaron M. Hunter, Blake R. Koelmel, Bruce E. Adams
  • Apparatus Including Heating Source Reflective Filter For Pyrometry
    Publication number: 20090255921
    Abstract: Methods and apparatus for processing substrates and measuring the temperature using radiation pyrometry are disclosed. A reflective layer is provided on a window of a processing chamber. A radiation source providing radiation in a first range of wavelengths heats the substrate, the substrate being transparent to radiation in a second range of wavelengths within the first range of wavelengths for a predetermined temperature range. Radiation within the second range of wavelength is reflected by the reflective layer.
    Type: Application
    Filed: April 9, 2008
    Publication date: October 15, 2009
    Inventors: Joseph M. Ranish, Aaron M. Hunter, Blake R. Koelmel