Abstract: The present invention relates to a low refractive layer and an anti-reflective film comprising the same. The low refractive layer can exhibit excellent optical properties such as a low reflectance and a high light transmittance, and excellent mechanical properties such as high wear resistance and scratch resistance at the same time, without adversely affecting the color of the polymer resin forming the low refractive layer. In particular, due to the excellent alkali resistance, the low refractive layer can maintain excellent physical properties even after alkali treatment. Therefore, when introducing a low refractive layer to the display device, it is expected that the production process can be simplified and further the production rate and the productivity can significantly increase.

Abstract: Disclosed is a plastic film exhibiting excellent physical properties including a high level of hardness, high scratch resistance, and low reflection. Exhibiting a high level of hardness, scratch resistance, impact resistance, low reflectivity, and high transparency, the plastic film can be used as a substitute for a cover plate made of glass or reinforced glass.

Abstract: Disclosed is an anti-reflection film comprising a high refractive index layer comprising a first binder including a crosslinked polymer of a multifunctional (meth)acrylate compound, and nano silica particles dispersed in the first binder; and a low refractive index layer laminated on the high refractive index layer, and comprising a second binder including a crosslinked copolymer of a multifunctional (meth)acrylate compound and a fluorine-based (meth)acrylate compound, and hollow silica particles and hollow silica particles coated with a fluorine-based compound on the surface, which are dispersed in the second binder, wherein the weight ratio of the hollow silica particles to the hollow silica particles coated with a fluorine-based compound is 1:1˜10. Also disclosed is a method for manufacturing the anti-reflection film using a composition that is separated into at least two layers by phase separation after single layer coating by a more simplified process.

Abstract: An exemplary embodiment of the present invention provides an antireflective and antiglare coating composition, comprising: a low refractive substance having a refractive index of 1.2 to 1.45, a high refractive substance having a refractive index of 1.46 to 2, a fluorine-based compound and a particulates having an average particle diameter of 1 to 10 ?m, wherein a surface energy difference between the low refractive substance and the high refractive substance is 5 mN/m or more, an antireflective and antiglare film manufactured by using the same, and a method for manufacturing the same. According to the exemplary embodiment of the present invention, an antireflective and antiglare film having excellent wear resistance and antireflection function may be manufactured by a single coating process using the single composition, such that a manufacturing cost may be decreased.

Abstract: Disclosed is an anti-reflection film comprising a high refractive index layer comprising a first binder including a crosslinked polymer of a multifunctional (meth)acrylate compound, and nano silica particles dispersed in the first binder; and a low refractive index layer laminated on the high refractive index layer, and comprising a second binder including a crosslinked copolymer of a multifunctional (meth)acrylate compound and a fluorine-based (meth)acrylate compound, and hollow silica particles and hollow silica particles coated with a fluorine-based compound on the surface, which are dispersed in the second binder. Also disclosed is a method for manufacturing the anti-reflection film using a composition that is separated into at least two layers by phase separation after single layer coating by a more simplified process.

Abstract: This disclosure relates to an anti-reflective coating composition that is divided into at least two layers through phase separation after monolayer coating, more particularly an anti-reflective coating composition comprising hollow particles coated with a fluorine-based compound having refractive index of 1.3˜1.4 and surface tension of 10˜25 mN/m on the surface, an anti-reflection film manufactured therefrom, and a method of manufacturing the same. In the anti-reflective coating composition of the present invention, at least two layers may be spontaneously formed only by single coating due to smooth phase separation in the coating layer. Particularly, since an interface of each layer formed by phase separation is substantially chemically bonded or crosslinked, delamination of each layer may be minimized. And, a film with excellent scratch resistance and anti-reflection may be manufactured by a more simplified method using the anti-reflective coating composition of the present invention.

Abstract: The present invention provides a coating composition for antireflection that includes a) a low refractive material having a refractive index of 1.2 to 1.45, b) a high refractive material having a refractive index of 1.55 to 2.2 and comprising high refractive fine particles and an organic substituent, in which the difference in the surface energy between two materials is 5 mN/m or more; an antireflection film manufactured using the coating composition for antireflection; and a method of manufacturing the antireflection film. According to the present invention, the antireflection film having excellent antireflection characteristic can be manufactured by one coating process, thereby reducing manufacturing cost.

Abstract: A method for forming an electrochromic layer pattern includes forming a transparent electrode layer and a photoresist layer on a transparent substrate, forming a photoresist pattern by laser interference lithography, and depositing an electrochromic layer pattern on the transparent electrode through openings defined by the photoresist pattern by depositing an electrochromic layer on a front surface of the substrate and then lifting up the photoresist pattern. An insulation layer may be further formed between the transparent layer and the photoresist layer. Here, the electrochromic layer may be formed after an insulation layer pattern is formed using the photoresist pattern as an etching mask. In this case, the electrochromic layer pattern is formed in openings defined by the insulation layer pattern. As a result, a contact surface area between the electrochromic layer pattern and the ion conductive layer is increased to ensure a rapid response speed.