Patents by Inventor Bopanna Ichettira VASANTHA

Bopanna Ichettira VASANTHA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • 3D printed chamber components configured for lower film stress and lower operating temperature
    Patent number: 11569069
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber includes a component part body having unitary monolithic construction. The component part body has a textured surface. The textured surface includes a plurality of independent engineered macro features integrally formed with the component part body. The engineered macro features include a macro feature body extending from the textured surface.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: January 31, 2023
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Kadthala R. Narendrnath, Govinda Raj, Goichi Yoshidome, Bopanna Ichettira Vasantha, Umesh M. Kelkar
  • Edge ring for a substrate processing chamber
    Patent number: 11417561
    Abstract: An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.
    Type: Grant
    Filed: January 24, 2020
    Date of Patent: August 16, 2022
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Govinda Raj, Kadthala Ramaya Narendrnath, Bopanna Ichettira Vasantha, Simon Yavelberg
  • Textured skin for chamber components
    Patent number: 10872749
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing environment of the processing chamber. A textured skin is conformable to the exterior surface. The textured skin has a first side configured to be disposed against the exterior surface and a second side facing away from the first side. The second side has a plurality of engineered features configured to enhance adhesion of material deposited on the textured skin during use of the processing chamber.
    Type: Grant
    Filed: July 26, 2017
    Date of Patent: December 22, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Gangadhar Sheelavant, Cariappa Achappa Baduvamanda, Kaushik Vaidya, Bopanna Ichettira Vasantha
  • 3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND LOWER OPERATING TEMPERATURE
    Publication number: 20200365374
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber includes a component part body having unitary monolithic construction. The component part body has a textured surface. The textured surface includes a plurality of independent engineered macro features integrally formed with the component part body. The engineered macro features include a macro feature body extending from the textured surface.
    Type: Application
    Filed: July 31, 2020
    Publication date: November 19, 2020
    Inventors: Kadthala R. NARENDRNATH, Govinda RAJ, Goichi YOSHIDOME, Bopanna Ichettira VASANTHA, Umesh M. KELKAR
  • 3D printed chamber components configured for lower film stress and lower operating temperature
    Patent number: 10777391
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber includes a component part body having unitary monolithic construction. The component part body has a textured surface. The textured surface includes a plurality of independent engineered macro features integrally formed with the component part body. The engineered macro features include a macro feature body extending from the textured surface.
    Type: Grant
    Filed: February 4, 2016
    Date of Patent: September 15, 2020
    Assignee: Applied Materials, Inc.
    Inventors: Kadthala R. Narendrnath, Govinda Raj, Goichi Yoshidome, Bopanna Ichettira Vasantha, Umesh M. Kelkar
  • EDGE RING FOR A SUBSTRATE PROCESSING CHAMBER
    Publication number: 20200161165
    Abstract: An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.
    Type: Application
    Filed: January 24, 2020
    Publication date: May 21, 2020
    Inventors: Govinda RAJ, Kadthala Ramaya NARENDRNATH, Bopanna Ichettira VASANTHA, Simon YAVELBERG
  • Edge ring for a substrate processing chamber
    Patent number: 10553473
    Abstract: An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.
    Type: Grant
    Filed: December 18, 2015
    Date of Patent: February 4, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Govinda Raj, Kadthala R. Narendrnath, Bopanna Ichettira Vasantha, Simon Yavelberg
  • Thermally optimized rings
    Patent number: 10435784
    Abstract: A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular body has an outer diameter greater than 200 mm. The annular body includes a top surface and a bottom surface. The top surface is configured to face a plasma processing region of a process chamber. The bottom surface is opposite the top surface. The bottom surface is substantially perpendicular to a centerline of the body. The bottom surface is supported at least partially by a pedestal assembly. The one or more hollow inner cavities are formed in the annular body about the centerline. The one or more hollow inner cavities are arranged in a circle within the annular body.
    Type: Grant
    Filed: August 10, 2016
    Date of Patent: October 8, 2019
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Gangadhar Sheelavant, Cariappa Achappa Baduvamanda, Bopanna Ichettira Vasantha
  • THERMALLY OPTIMIZED RINGS
    Publication number: 20190301007
    Abstract: A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular body has an outer diameter greater than 200 mm. The annular body includes a top surface and a bottom surface. The top surface is configured to face a plasma processing region of a process chamber. The bottom surface is opposite the top surface. The bottom surface is substantially perpendicular to a centerline of the body. The bottom surface is supported at least partially by a pedestal assembly. The one or more hollow inner cavities are formed in the annular body about the centerline. The one or more hollow inner cavities are arranged in a circle within the annular body.
    Type: Application
    Filed: June 19, 2019
    Publication date: October 3, 2019
    Inventors: Gangadhar SHEELAVANT, Cariappa Achappa BADUVAMANDA, Bopanna Ichettira VASANTHA
  • TEXTURED SKIN FOR CHAMBER COMPONENTS
    Publication number: 20180076010
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber has a base component body. The base component body has an exterior surface configured to face a processing environment of the processing chamber. A textured skin is conformable to the exterior surface. The textured skin has a first side configured to be disposed against the exterior surface and a second side facing away from the first side. The second side has a plurality of engineered features configured to enhance adhesion of material deposited on the textured skin during use of the processing chamber.
    Type: Application
    Filed: July 26, 2017
    Publication date: March 15, 2018
    Inventors: Gangadhar SHEELAVANT, Cariappa Achappa BADUVAMANDA, Kaushik VAIDYA, Bopanna Ichettira VASANTHA
  • THERMALLY OPTIMIZED RINGS
    Publication number: 20180044783
    Abstract: A process kit ring for use in a plasma processing system is disclosed herein. The process kit ring includes an annular body and one or more hollow inner cavities. The annular body is formed from a plasma resistant material. The annular body has an outer diameter greater than 200 mm. The annular body includes a top surface and a bottom surface. The top surface is configured to face a plasma processing region of a process chamber. The bottom surface is opposite the top surface. The bottom surface is substantially perpendicular to a centerline of the body. The bottom surface is supported at least partially by a pedestal assembly. The one or more hollow inner cavities are formed in the annular body about the centerline. The one or more hollow inner cavities are arranged in a circle within the annular body.
    Type: Application
    Filed: August 10, 2016
    Publication date: February 15, 2018
    Inventors: Gangadhar SHEELAVANT, Cariappa Achappa BADUVAMANDA, Bopanna Ichettira VASANTHA
  • 3D PRINTED CHAMBER COMPONENTS CONFIGURED FOR LOWER FILM STRESS AND LOWER OPERATING TEMPERATURE
    Publication number: 20160233060
    Abstract: A chamber component for a processing chamber is disclosed herein. In one embodiment, a chamber component for a processing chamber includes a component part body having unitary monolithic construction. The component part body has a textured surface. The textured surface includes a plurality of independent engineered macro features integrally formed with the component part body. The engineered macro features include a macro feature body extending from the textured surface.
    Type: Application
    Filed: February 4, 2016
    Publication date: August 11, 2016
    Inventors: Kadthala R. NARENDRNATH, Govinda RAJ, Goichi YOSHIDOME, Bopanna Ichettira VASANTHA, Umesh M. KELKAR
  • EDGE RING FOR A SUBSTRATE PROCESSING CHAMBER
    Publication number: 20160181142
    Abstract: An edge ring and process for fabricating an edge ring are disclosed herein. In one embodiment, an edge ring includes an annular body and a plurality of thermal breaks disposed within the annular body. The thermal breaks are disposed perpendicular to a center line of the annular body of the edge ring.
    Type: Application
    Filed: December 18, 2015
    Publication date: June 23, 2016
    Inventors: Govinda RAJ, Kadthala R. NARENDRNATH, Bopanna Ichettira VASANTHA, Simon YAVELBERG