Patents by Inventor Boris Povazay
Boris Povazay has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11865824Abstract: The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.Type: GrantFiled: April 20, 2020Date of Patent: January 9, 2024Assignee: EV Group E. Thallner GmbHInventors: Venkata Raghavendra Subrahmanya Sarma Mokkapati, Boris Povazay, Thomas Uhrmann
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Publication number: 20230395418Abstract: A method and a device for the separation of structures from a substrate. Furthermore, the invention relates to a method and a device for transferring structures from a first substrate to a second substrate.Type: ApplicationFiled: March 30, 2021Publication date: December 7, 2023Applicant: EV Group E. Thallner GmbHInventors: Boris Povazay, Venkata Raghavendra Subrahmanya Sarma Mokkapati
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Publication number: 20230251580Abstract: The invention relates to a method and a device for the exposure of a photosensitive coating.Type: ApplicationFiled: July 6, 2020Publication date: August 10, 2023Applicant: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay, Tobias Zenger, Thomas Uhrmann
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Publication number: 20230211592Abstract: The invention relates to a device for the transfer of a transfer layer from a substrate, in particular from a growth substrate, to a carrier substrate.Type: ApplicationFiled: April 20, 2020Publication date: July 6, 2023Applicant: EV Group E. Thallner GmbHInventors: Venkata Raghavendra Subrahmanya Sarma Mokkapati, Boris Povazay, Thomas Uhrmann
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Patent number: 11681228Abstract: A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.Type: GrantFiled: June 19, 2018Date of Patent: June 20, 2023Assignee: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay
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Patent number: 11534868Abstract: A method for separating a temporarily bonded substrate stack by bombardment of a joining layer of the substrate stack by means of laser beams emitted by a laser, characterised in that laser beams of the laser reflected and/or transmitted at the temporarily bonded substrate stack are detected during the bombardment of the joining layer with the laser beams. The invention also relates to a corresponding device.Type: GrantFiled: September 12, 2017Date of Patent: December 27, 2022Assignee: EV Group E. Thallner GmbHInventors: Elisabeth Brandl, Boris Povazay, Thomas Uhrmann
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Patent number: 11460777Abstract: A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.Type: GrantFiled: December 20, 2016Date of Patent: October 4, 2022Assignee: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay
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Publication number: 20220026196Abstract: The invention relates to a measuring device for determining a course of a bonding wave in a gap (3) between a first substrate (2) and a second substrate (4). Furthermore, the present invention relates to a corresponding method.Type: ApplicationFiled: January 18, 2019Publication date: January 27, 2022Applicant: EV Group E. Thallner GmbHInventors: Dominik ZINNER, Jürgen MALLINGER, Thomas PLACH, Boris POVAZAY, Harald ROHRINGER, Jürgen Markus SÜSS
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Patent number: 11209739Abstract: A method and a device for aligning two lenses, wherein the method is directed to aligning first and second optical partial systems of an optical system, which are arranged so as to be located opposite to one another. The method includes the steps of: projecting alignment marks into a first image plane of the first optical partial system, projecting the alignment marks from the first image plane onto a sensitive surface of the second optical partial system, and aligning the optical partial systems relative to one another, such that projections of the alignment marks in a depth of field of the sensitive surface are imaged at ideal positions.Type: GrantFiled: February 22, 2018Date of Patent: December 28, 2021Assignee: EV Group E. Thallner GmbHInventor: Boris Povazay
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Publication number: 20210247697Abstract: A method for the exposure of image points of a photosensitive layer comprising a photosensitive material on a substrate by means of an optical system. The method including continuously moving the image points with respect to the optical system; and controlling a plurality of secondary beams by means of the optical system individually for individual exposures of each image point, whereby the secondary beams are put either into an ON state or into an OFF state, wherein a) secondary beams in the ON state produce an individual exposure of the image point assigned to the respective secondary beam and b) secondary beams in the OFF state do not produce any individual exposure of the image point assigned to the respective secondary beam; wherein, for the generation of image points with grey tones n>1, individual exposures are carried out by different secondary beams with individual doses D.Type: ApplicationFiled: June 19, 2018Publication date: August 12, 2021Applicant: EV Group E. Thallner GmbHInventors: Bernhard THALLNER, Boris POVAZAY
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Patent number: 11040525Abstract: A method and apparatus for embossing micro-structures and/or nano-structures. The method includes the steps of providing a structured embossing roll having end faces; coupling a crosslinking radiation into the structured embossing roll which is transparent for the crosslinking radiation, wherein the embossing roll functions as a light guide for the coupled in crosslinking radiation; providing a carrier having an embossing compound applied thereto; contacting the embossing roll with the embossing compound; coupling the crosslinking radiation out of the embossing roll; and curing the embossing compound which has been acted upon by the coupled out crosslinking radiation via the embossing roll.Type: GrantFiled: October 23, 2017Date of Patent: June 22, 2021Assignee: EV Group E. Thallner GmbHInventors: Jozsef Krol, Boris Povazay
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Publication number: 20210060710Abstract: A method for separating a temporarily bonded substrate stack by bombardment of a joining layer of the substrate stack by means of laser beams emitted by a laser, characterised in that laser beams of the laser reflected and/or transmitted at the temporarily bonded substrate stack are detected during the bombardment of the joining layer with the laser beams. The invention also relates to a corresponding device.Type: ApplicationFiled: September 12, 2017Publication date: March 4, 2021Applicant: EV Group E. Thallner GmbHInventors: Elisabeth BRANDL, Boris POVAZAY, Thomas UHRMANN
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Patent number: 10852528Abstract: A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.Type: GrantFiled: December 20, 2016Date of Patent: December 1, 2020Assignee: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay
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Publication number: 20200174383Abstract: A method and a device for aligning two lenses, wherein the method is directed to aligning first and second optical partial systems of an optical system, which are arranged so as to be located opposite to one another. The method includes the steps of: projecting alignment marks into a first image plane of the first optical partial system, projecting the alignment marks from the first image plane onto a sensitive surface of the second optical partial system, and aligning the optical partial systems relative to one another, such that projections of the alignment marks in a depth of field of the sensitive surface are imaged at ideal positions.Type: ApplicationFiled: February 22, 2018Publication date: June 4, 2020Applicant: EV Group E. Thallner GmbHInventor: Boris Povazay
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Patent number: 10656078Abstract: A metrology device includes a sound sample holder and an optical system. The sound sample holder is provided for applying sound waves to a first substrate stack surface of the substrate stack. The optical system include a source, a lens field, a beam splitter, and a detector. The source is provided for outputting electromagnetic radiation, which is split into at least one first beam path and one second beam path. The lens field is provided for applying the first beam path to a substrate stack measuring surface of the substrate stack. The beam splitter is provided for forming an interference radiation made up of the first and second beam paths of the electromagnetic radiation. The detector is provided for detecting the interference radiation.Type: GrantFiled: February 17, 2016Date of Patent: May 19, 2020Assignee: EV Group E. Thallner GmbHInventors: Martin Eibelhuber, Markus Heilig, Boris Povazay
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Publication number: 20200089121Abstract: A method and device for exposing a light-sensitive layer, said method comprising: generating at least one light ray by use of at least one light source, illuminating pixels of an exposure pattern by use of at least one micromirror device having a plurality of micromirrors with respective mirror intensity profiles, and overlaying the mirror intensity profiles of adjacent micromirrors to provide a pattern intensity profile of the exposure pattern by summing the mirror intensity profiles of each illuminated pixel of the exposure pattern.Type: ApplicationFiled: December 20, 2016Publication date: March 19, 2020Applicant: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay
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Publication number: 20200070496Abstract: A method and apparatus for embossing micro-structures and/or nano-structures. The method includes the steps of providing a structured embossing roll having end faces; coupling a crosslinking radiation into the structured embossing roll which is transparent for the crosslinking radiation, wherein the embossing roll functions as a light guide for the coupled in crosslinking radiation; providing a carrier having an embossing compound applied thereto; contacting the embossing roll with the embossing compound; coupling the crosslinking radiation out of the embossing roll; and curing the embossing compound which has been acted upon by the coupled out crosslinking radiation via the embossing roll.Type: ApplicationFiled: October 23, 2017Publication date: March 5, 2020Applicant: EV Group E. Thallner GmbHInventors: Jozsef Krol, Boris Povazay
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Publication number: 20190293924Abstract: A method for exposing a light-sensitive layer to light using an optical system, wherein at least one light beam is generated by respectively at least one light source and pixels of an exposure pattern grid are illuminated by at least one micro-mirror device with a plurality of micro-mirrors. An affine distortion takes place, in particular a shearing, of the exposure pattern grid.Type: ApplicationFiled: December 20, 2016Publication date: September 26, 2019Applicant: EV Group E. Thallner GmbHInventors: Bernhard Thallner, Boris Povazay
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Publication number: 20190025194Abstract: A metrology device and method for inspecting a substrate stack. The device includes sound application means for applying sound waves to a first substrate stack surface of the substrate stack, an optical system having a source for outputting electromagnetic radiation, which are split into at least one first beam path and one second beam path, means for loading a substrate stack measuring surface of the substrate stack, with the first beam path, interference means for forming an interference radiation made up of the first and second beam paths, a detector for detecting the interference radiation, and analysing means for analysing the interference radiation detected at the detector.Type: ApplicationFiled: February 17, 2016Publication date: January 24, 2019Applicant: EV Group E. Thallner GmbHInventors: Martin Eibelhuber, Markus Heilig, Boris Povazay
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Patent number: 10024741Abstract: A measuring device for determining a pressure map during application of pressure to at least one measurement layer between a first pressure body and a second pressure body the measuring device comprising: (i) at least one transmitter located on one peripheral edge of the measurement layer for emission of signals in the form of electromagnetic waves along a first signal route which runs through the measurement layer and at least one other signal route which runs through the measurement layer, and (ii) at least one receiver located on the peripheral edge for reception of the signals of the first signal route and other signal route(s), which signals are sent by the transmitter through the measurement layer and can be changed when pressure is applied. Furthermore this invention relates to a corresponding method.Type: GrantFiled: June 5, 2013Date of Patent: July 17, 2018Assignee: EV GROUP E. THALLNER GMBHInventors: Boris Povazay, Antun Peic