Abstract: A computing device retrieves a stabilized weight and a weight-based item count for one or more items to be purchased. Responsive to retrieving the stabilized weight, the computing device retrieves an image-based item count and an expected weight based on the image-based item count for the one or more items to be purchased. The computing device selects between authorizing and blocking checkout of the one or more items based on the weight-based item count, the image-based item count, the stabilized weight, and the expected weight.

Abstract: A composite stack-up for an antenna is described. In one embodiment, the antenna is a flat panel metamaterial antenna. In one embodiment, an antenna assembly comprises an antenna element layer having an upper side and a lower side; a first set of one or more layers forming an upper stack bonded to the upper side of the antenna element layer and being are at least partially transparent to radio frequency (RF) radiation; and a second set of one or more layers forming a lower stack bonded to the lower side of the antenna element layer, where the antenna element layer, upper stack and lower stack are bonded together to form a composite stack.

Abstract: An antenna with a clamping mechanism and a method for using the same are disclosed. In one embodiment, an antenna comprises a radial waveguide, an aperture operable to radiate radio frequency (RF) signals in response to an RF feed wave fed by the radial waveguide, and one or more clamping devices to apply a compressive force between the waveguide and the aperture.

Abstract: An antenna with a clamping mechanism and a method for using the same are disclosed. In one embodiment, an antenna comprises a radial waveguide, an aperture operable to radiate radio frequency (RF) signals in response to an RF feed wave fed by the radial waveguide, and one or more clamping devices to apply a compressive force between the waveguide and the aperture.

Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.

Abstract: A method for supplying vapor to a chamber includes providing a first diverter valve that, when open, diverts vapor away from the chamber, and a second diverter valve that, when open, supplies the vapor to the chamber; supplying a carrier gas to the chamber; after supplying the carrier gas, creating plasma in the chamber while a substrate is in the chamber; opening the first diverter valve and closing the second diverter valve; supplying the vapor by vaporizing at least one liquid precursor in a carrier gas; after a first predetermined period sufficient for the vapor to reach steady-state flow, closing the first diverter valve and opening the second diverter valve to supply the vapor to the chamber; and after a second predetermined period following the first predetermined period, opening the first diverter valve and closing the second diverter valve to stop supplying the vapor to the chamber.

Abstract: A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.

Abstract: A vapor delivery system for supplying vapor to a chamber in a plasma-enhanced chemical vapor deposition (PECVD) system includes a vapor supply that supplies vapor by vaporizing at least one liquid precursor in a carrier gas. A first path includes a first filter that filters the vapor flowing from the vapor supply to the chamber. At least one second path is parallel to the first path and includes a second filter that filters vapor flowing from the vapor supply to the chamber. A plurality of valves are configured to switch delivery of the vapor to the chamber between the first path and the second path.