Patents by Inventor Bradley Leonard Halleck

Bradley Leonard Halleck has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10604847
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Grant
    Filed: December 7, 2018
    Date of Patent: March 31, 2020
    Assignee: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • Publication number: 20190106788
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Application
    Filed: December 7, 2018
    Publication date: April 11, 2019
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • Patent number: 10167557
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Grant
    Filed: March 18, 2014
    Date of Patent: January 1, 2019
    Assignee: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • Publication number: 20150267299
    Abstract: A gas distribution system, a reactor system including the gas distribution system, and method of using the gas distribution system and reactor system are disclosed. The gas distribution system can be used in gas-phase reactor systems to independently fine tune gas source locations and gas flow rates of reactants to a reaction chamber of the reactor systems.
    Type: Application
    Filed: March 18, 2014
    Publication date: September 24, 2015
    Applicant: ASM IP Holding B.V.
    Inventors: Mark Hawkins, Bradley Leonard Halleck, Tom Kirschenheiter, Benjamin Hossa, Clay Pottebaum, Claudio Miskys
  • Patent number: 5854122
    Abstract: Micromachining a microelectromechanical structure requires one or more heavily doped silicon layers. Intricately patterned structures are created in a heavily doped surface layer on a relatively undoped substrate. The substrate is subsequently dissolved in a selective etch. The doping prevents the patterned structures from dissolving. In this invention, a doped layer is grown epitaxially onto the first substrate rather than by diffusing a dopant into the substrate. This produces additional planarity, thickness control, and dopant profile control. The structure may then be placed into a larger device, such as an infrared sensor, an accelerometer, or an angular rate sensor.
    Type: Grant
    Filed: March 13, 1997
    Date of Patent: December 29, 1998
    Assignee: The Boeing Company
    Inventors: Kenneth Maxwell Hays, Bradley Leonard Halleck, Eugene Coleman Whitcomb