Abstract: A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.

Abstract: A wafer cleaning apparatus provides two opposed brushes for brushing a vertically disposed wafer in a tank which can contain a process liquid. A pressure controller adaptively controls the pressure exerted by the brushes on the wafer to compensate for brush wear. Rim driving wheels engage the wafer periphery with a porous jacket coupled to a fluid delivery system, thereby simultaneously rotating and cleaning the periphery of the wafer. The apparatus includes a fluid delivery system for separately and independently delivering a plurality of constituents of a cleaning solution to the brushes, thereby ensuring that a freshly mixed cleaning solution reaches the wafer. The tank can be filled with a process liquid through which megasonic waves provided by a transducer can propagate and impinge upon the wafer thereby enhancing the cleaning of the wafer or the brushes.

Abstract: A remote filtration unit for liquid distribution systems (LDS) used for delivering ultra-pure liquids for semiconductor manufacturing processes is provided. The filtration unit includes a plurality of filtration systems enclosed in separate compartments, wherein each compartment is served by an input and an output lead line. Using quick connect/disconnect fittings, the liquid distribution system (LDS) channel is tapped at desired locations and bypass loops are inserted in the channel. A bypass loop includes an input lead line, an associated filtration unit compartment including a filtration system, and an output lead line. Using bypass loops, LDS liquid is routed into the remote filtration system, cleaned, and then channeled back into the liquid distribution system or target product or process area.