Abstract: A Conduit Descaling System (CDS) is provided and includes an anchor structure, wherein the anchor structure includes a first anchor end, a second anchor end and a structure center portion and wherein the structure center portion connects the first anchor end with the second anchor end; a descaling chain ring, wherein the descaling chain ring defines a chain ring center cavity and is connected to the structure center portion; and a Forward Descaling Article (FDA), wherein the FDA includes an FDA structure having an FDA structure first end, an FDA structure second end and an FDA structure center portion, wherein the FDA structure center portion includes a plurality of FDA anchor structures distributed along the circumference of the FDA structure center portion, and wherein FDA further includes a plurality of FDA descaling links having a plurality of FDA descaling link cutting teeth.

Abstract: A Conduit Descaling System (CDS) is provided and includes an anchor structure, wherein the anchor structure includes a first anchor end, a second anchor end and a structure center portion and wherein the structure center portion connects the first anchor end with the second anchor end; a descaling chain ring, wherein the descaling chain ring defines a chain ring center cavity and is connected to the structure center portion; and a Forward Descaling Article (FDA), wherein the FDA includes an FDA structure having an FDA structure first end, an FDA structure second end and an FDA structure center portion, wherein the FDA structure center portion includes a plurality of FDA anchor structures distributed along the circumference of the FDA structure center portion, and wherein FDA further includes a plurality of FDA descaling links having a plurality of FDA descaling link cutting teeth.

Abstract: A conduit cleaning device is provided and includes a center structure having a center structure wall, a center structure top and a center structure bottom, wherein the center structure wall and center structure top define a center structure cavity and a center structure opening communicated with the center structure cavity. Additionally, a plurality of outer structures is provided, wherein the plurality of outer structures are associated with the center structure wall to extend out of and away from an outer surface of the center structure wall, wherein the plurality of outer structures are disposed in an inclined fashion between the center structure bottom and the center structure top and arranged along the outer surface of the center structure wall to form a helical pattern.

Abstract: A monofilament is particularly suited for use as a component in an industrial textile such as a papermachine clothing (PMC) fabric. The monofilament is formed from a composition including more than 70 weight % to 99 weight % polyamide and from 1 weight % to less than 30 weight % polyphenylene ether.

Abstract: A conduit cleaning device is provided and includes a center structure having a center structure wall, a center structure top and a center structure bottom, wherein the center structure wall and center structure top define a center structure cavity and a center structure opening communicated with the center structure cavity. Additionally, a plurality of outer structures is provided, wherein the plurality of outer structures are associated with the center structure wall to extend out of and away from an outer surface of the center structure wall, wherein the plurality of outer structures are disposed in an inclined fashion between the center structure bottom and the center structure top and arranged along the outer surface of the center structure wall to form a helical pattern.

Abstract: A monofilament is particularly suited for use as a component in a spiral fabric. The monofilament is formed from a resin composition including a thermoplastic polymer. The thermoplastic polymer has an average molecular weight of less than 14200 g/mol. Alternatively, the monofilament is formed from a resin composition including a thermoplastic polymer, the thermoplastic polymer having a free thermal shrinkage of less than 1%. According to yet another embodiment, the monofilament is formed from a resin composition including a thermoplastic polymer, the thermoplastic polymer having an intrinsic viscosity of less than 0.72 dl/g. Yet alternatively, the monofilament is formed from a resin composition including a thermoplastic polymer, the thermoplastic polymer having a melt viscosity of less than 3000 P.

Abstract: A paper machine clothing (PMC) fabric includes a plurality of monofilament yarns, at least some of the monofilament yarns having a composition formed of polyethylene terephthalate (PET). The PET monofilament yarns have an abrasion resistance of greater than 6,000 cycles.

Abstract: A paper machine clothing (PMC) fabric includes a plurality of monofilament yarns, at least some of the monofilament yarns having a composition formed of polyethylene terephthalate (PET). The PET monofilament yarns have an abrasion resistance of greater than 6,000 cycles.

Abstract: A paper machine clothing (PMC) fabric includes a plurality of monofilament yarns, at least some of which have a composition which is a thermoplastic resin. The thermoplastic resin yarns have physical properties including a water absorption of less than approximately 6% and a loop tenacity of greater than approximately 8.0 grams/denier.

Abstract: A paper machine clothing (PMC) fabric includes a plurality of monofilament yarns, at least some of the monofilament yarns having a composition formed of polyethylene terephthalate (PET). The PET monofilament yarns have an abrasion resistance of greater than 6,000 cycles.

Abstract: A paper machine clothing (PMC) fabric including a plurality of monofilament yarns, at least some of the monofilament yarns having a composition which includes an additive for detecting a defect on the paper machine clothing fabric.

Abstract: A PMC fabric includes a plurality of monofilament yarns. At least some of the monofilament yarns have a composition which is a mixture of a thermoplastic resin and an additive to improve yarn visibility. The additive may be, e.g., a UV additive, an IR additive and/or a metal powder additive.

Abstract: A paper machine clothing (PMC) fabric includes a plurality of monofilament yarns. At least some of the yarns have a composition which is a mixture of between 90% to 99.8% thermoplastic resin, and between 0.2% to 10% nano-graphene. The thermoplastic resin is preferably polyethylene terephthalate (PET).

Abstract: A paper machine clothing (PMC) fabric including a plurality of monofilament yarns, at least some of the monofilament yarns having a composition which includes an additive for detecting a defect on the paper machine clothing fabric.

Abstract: A seaming process for a PMC fabric includes the steps of: providing a PMC fabric including a plurality of monofilament yarns, at least some of the monofilament yarns having a composition including between approximately 100 to 10,000 parts per million (ppm) of an additive to improve yarn visibility for the fringed ends of an illuminated PMC fabric.

Abstract: A PMC fabric yarn, for use in a PMC fabric, has a composition which is a mixture of between 75% to 99% PET, 1% to 20% polymeric siloxane, and with a remainder of the composition being between 0.1% to 5% compatibilizer.

Abstract: By providing a gear assembly employing drive gears which engage at least two associated gears for simultaneous rotation, with the gear assembly being constructed for axially driving the bush-bearing shaft/cable member, a new fully automatic, portable tube/conduit cleaning system is attached, with the components forming the system being capable of being easily held and carried to any desired job site. By employing this construction, the cleaning system of the present invention enables the shaft/cable carrying the rotating brush to be driven in both a forward and reverse direction, along the axis of the tube or conduit, making it easier for an operator to clean extremely difficult pipes and conduits, while also controlling the relative speed of the brush rotation. In the present invention, the elongated flexible shaft/cable is controllably fed at a low rate of speed, while the cleaning brush is rotated at a relative very high rate of speed, thereby achieving superior cleaning results.

Abstract: A shielding assembly for use in a semiconductor manufacturing apparatus, such as an ion implantation apparatus, includes one or more removable shielding members configured to cover inner surfaces of a mass analyzing chamber. The shielding assembly reduces process by-products from accumulating on the inner surfaces. In one embodiment, a shielding assembly includes first and second shielding members, each having a unitary construction and configured to cover a magnetic area in the mass analyzing chamber. The shielding members desirably are made entirely of graphite or impregnated graphite to minimize contamination of the semiconductor device being processed caused by metal particles eroded from the inner surfaces of the mass analyzing chamber.

Abstract: By providing a gear assembly employing drive gears which engage at least two associated gears for simultaneous rotation, with the gear assembly being constructed for axially driving the bush-bearing shaft/cable member, a new fully automatic, portable tube/conduit cleaning system is attached, with the components forming the system being capable of being easily held and carried to any desired job site. By employing this construction, the cleaning system of the present invention enables the shaft/cable carrying the rotating brush to be driven in both a forward and reverse direction, along the axis of the tube or conduit, making it easier for an operator to clean extremely difficult pipes and conduits, while also controlling the relative speed of the brush rotation. In the present invention, the elongated flexible shaft/cable is controllably fed at a low rate of speed, while the cleaning brush is rotated at a relative very high rate of speed, thereby achieving superior cleaning results.

Abstract: A shielding assembly for use in a semiconductor manufacturing apparatus, such as an ion implantation apparatus, includes one or more removable shielding members configured to cover inner surfaces of a mass analyzing chamber. The shielding assembly reduces process by-products from accumulating on the inner surfaces. In one embodiment, a shielding assembly includes first and second shielding members, each having a unitary construction and configured to cover a magnetic area in the mass analyzing chamber. The shielding members desirably are made entirely of graphite or impregnated graphite to minimize contamination of the semiconductor device being processed caused by metal particles eroded from the inner surfaces of the mass analyzing chamber.