Abstract: Provided is a method of limiting exposure of a dispense chemical to air and meet dispense objectives in a dispense nozzle system, the method comprising: providing a sample requiring a dispense process of a dispense chemical using a dispense nozzle system; performing an opening cycle of dispense process steps to get the dispense nozzle system ready; dispensing a dispense chemical onto the sample; and performing a closing cycle of dispense process steps to prepare the nozzle system for non-use; repeating the operations of performing the opening cycle of dispense process steps, dispensing the chemical, and performing the closing cycle of dispense process steps a prescribed number of times depending on an application.

Abstract: A method is provided for depositing a planarization layer over features on a substrate using sequential polymerization chemical vapor deposition. According to one embodiment, the method includes providing a substrate containing a plurality of features with gaps between the plurality of features, delivering precursor molecules by gas phase exposure to the substrate, adsorbing the precursor molecules on the substrate to at least substantially fill the gaps with a layer of the adsorbed precursor molecules, and reacting the precursor molecules to form a polymer layer that at least substantially fills the gaps.

Abstract: A method is provided for depositing a planarization layer over features on a substrate using sequential polymerization chemical vapor deposition. According to one embodiment, the method includes providing a substrate containing a plurality of features with gaps between the plurality of features, delivering precursor molecules by gas phase exposure to the substrate, adsorbing the precursor molecules on the substrate to at least substantially fill the gaps with a layer of the adsorbed precursor molecules, and reacting the precursor molecules to form a polymer layer that at least substantially fills the gaps.

Abstract: Provided is a method of limiting exposure of a dispense chemical to air and meet dispense objectives in a dispense nozzle system, the method comprising: providing a sample requiring a dispense process of a dispense chemical using a dispense nozzle system; performing an opening cycle of dispense process steps to get the dispense nozzle system ready; dispensing a dispense chemical onto the sample; and performing a closing cycle of dispense process steps to prepare the nozzle system for non-use; repeating the operations of performing the opening cycle of dispense process steps, dispensing the chemical, and performing the closing cycle of dispense process steps a prescribed number of times depending on an application.