Patents by Inventor Bruce Lee Coulter
Bruce Lee Coulter has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20230357056Abstract: According to various aspects and embodiments, a system and method for polishing ultrapure water (UPW) is disclosed. The water polishing system includes a source of ultrapure water (UPW), an ultrafiltration (UF) module having an inlet and a permeate outlet, a recirculation conduit communicating the permeate outlet with the inlet and forming a recirculation loop, a recirculation pump disposed along the recirculation conduit upstream from the inlet of the UF module and fluidly coupled to the source of UPW, a supply conduit fluidly coupled to the recirculating conduit and a demand source, the supply conduit positioned downstream from the permeate outlet, and a pressure control valve disposed along the recirculation conduit downstream from the supply conduit and configured to maintain pressure of permeate at a predetermined value.Type: ApplicationFiled: June 29, 2023Publication date: November 9, 2023Inventors: Boris Eliosov, Bruce Lee Coulter, Glen P. Sundstrom
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Publication number: 20230312386Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: June 5, 2023Publication date: October 5, 2023Inventors: Christopher Hall, Bruce Lee Coulter
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Patent number: 11697607Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: GrantFiled: March 11, 2021Date of Patent: July 11, 2023Assignee: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
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Publication number: 20210380451Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: March 11, 2021Publication date: December 9, 2021Applicant: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
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Patent number: 10961143Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: GrantFiled: May 4, 2016Date of Patent: March 30, 2021Assignee: Evoqua Water Technologies LLCInventors: Christopher Hall, Bruce Lee Coulter
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Publication number: 20180273412Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate a continuously variable intensity of the actinic radiation.Type: ApplicationFiled: May 4, 2016Publication date: September 27, 2018Inventors: Christopher Hall, Bruce Lee Coulter
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Patent number: 9764968Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: March 8, 2013Date of Patent: September 19, 2017Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 9725343Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: June 16, 2014Date of Patent: August 8, 2017Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 9365435Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 14, 2016Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 9365436Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A to control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 14, 2016Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 8961798Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: February 24, 2015Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Publication number: 20140291253Abstract: A method and system of treating a liquid stream is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The water may be further treated by utilizing ion exchange media and degasification apparatus. A control system may be utilized to measure and regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: June 16, 2014Publication date: October 2, 2014Inventor: Bruce Lee Coulter
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Patent number: 8753522Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 17, 2014Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 8741155Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: GrantFiled: January 17, 2011Date of Patent: June 3, 2014Assignee: Evoqua Water Technologies LLCInventor: Bruce Lee Coulter
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Patent number: 8591730Abstract: An ultraviolet reactor for treating a fluid. The reactor includes a vessel having an inlet for receiving fluid and an outlet for discharging fluid. The reactor further includes an ultraviolet light source and baffle plates. The baffle plates include holes arranged in a predetermined pattern for providing plug flow in areas in the reactor near the ultraviolet light source.Type: GrantFiled: July 28, 2010Date of Patent: November 26, 2013Assignee: Siemens Pte. Ltd.Inventors: Zhee Min Jimmy Yong, David Stibitz, Bruce Lee Coulter, Michael Scott Hoosier
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Publication number: 20130186835Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: March 8, 2013Publication date: July 25, 2013Applicant: SIEMENS INDUSTRY, INC.Inventor: Bruce Lee Coulter
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Publication number: 20110210048Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: January 17, 2011Publication date: September 1, 2011Applicant: SIEMENS WATER TECHNOLOGIES CORP.Inventor: Bruce Lee Coulter
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Publication number: 20110210266Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A to control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: January 17, 2011Publication date: September 1, 2011Applicant: SIEMENS WATER TECHNOLOGIES CORP.Inventor: Bruce Lee Coulter
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Publication number: 20110209530Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: January 17, 2011Publication date: September 1, 2011Applicant: SIEMENS WATER TECHNOLOGIES CORP.Inventor: Bruce Lee Coulter
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Publication number: 20110210077Abstract: A method and system of providing ultrapure water for semiconductor fabrication operations is provided. The water is treated by utilizing a free radical scavenging system and a free radical removal system. The free radical scavenging system can utilize actinic radiation with a free radical precursor compound, such as ammonium persulfate. The free radical removal system can comprise use of a reducing agent. The ultrapure water may be further treated by utilizing ion exchange media and degasification apparatus. A control system can be utilized to regulate addition of the precursor compound, the to intensity of the actinic radiation, and addition of the reducing agent to the water.Type: ApplicationFiled: January 17, 2011Publication date: September 1, 2011Applicant: SIEMENS WATER TECHNOLOGIES CORP.Inventor: Bruce Lee Coulter