Abstract: There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

Abstract: There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

Abstract: There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

Abstract: There is provided a UV-reflective interference layer system for transparent substrates with broadband anti-reflection properties in the visible wavelength range. The interference layer system includes at least four individual layers. Successive layers have different refractive indices and the individual layers contain UV and temperature-stable inorganic materials.

Abstract: The invention concerns a UV-reflecting interference layer system for transparent substrates with broadband antireflection coating in the visible wavelength region. The invention is characterized by the fact that the interference layer system has at least four individual layers. The sequential layers have different indices of refraction and the individual layers have inorganic materials that are stable to UV and temperature.

Abstract: A coating for the structured production of conductors on the surface of electrically insulating substrates, in particular for producing sensor elements and printed circuit boards. The coating is formed from a doped tin oxide layer having the composition Sn.sub.1-(y+z) A.sub.y B.sub.z O.sub.2, in which A is Sb or F and B is In or Al. The relative proportions in the coating of the dopants antimony (or fluorine) and indium (or aluminum) are defined by the limits 0.02<y+z<0.11 and satisfy the condition 1.4<y/z<2.2. The coating can be structured by ablation using electromagnetic laser radiation in the wavelength range 157-1064 nm. The creates an economical means for high resolution and waste-free structuring of insulating channels in thin, electrically conductive layers having high chemical, mechanical and thermal resistance on glass or ceramic substrates.

Abstract: The optical interference filter is assembled from alternating amorphous SiO.sub.2 layers and layers made of mixed oxides chosen from88-95 mole.% TiO.sub.2 and 5-12 mole.% ZrO.sub.2,88-95 mole.% TiO.sub.2 and 5-12 mole.% HfO.sub.2,TiO.sub.2 .ZrO.sub.2 .HfO.sub.2, TiO.sub.2 .Nb.sub.2 O.sub.5TiO.sub.2 .Ta.sub.2 O.sub.5 and Ta.sub.2 O.sub.5 . 2TiO.sub.2.The mixed oxides have a crystal structure which corresponds to the crystal structure obtained after a heat treatment between 700 and 1100.degree. C. The filter is stable, also after a long period at an elevated temperature.

Abstract: A thin-film heating element is formed of a temperature-stable, electrically insulating substrate having a thin, electrically conductive metal oxide film which is doped with foreign atoms which compensate each other in pairs and which each consist of at least one acceptor-forming element and one donor-forming element the metal oxide film being provided with connecting electrodes; the metal oxide film being doped with maximally 10% of each of the foreign atoms compensating each other in pairs, the quantity of the atoms differing maximally 10%.