Patents by Inventor Bryan James Kaehr

Bryan James Kaehr has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Additive manufacturing of crystalline materials
    Patent number: 10214833
    Abstract: The present invention relates to additive manufacturing methods, in which crystalline materials can be formed by using a liquid precursor. In particular embodiments, the crystalline material is a perovskite. The methods include the use of a thermal voxel, which can be translated to form any arbitrary pattern of initial crystalline seed structure(s). Then, the seed structure can be incubated to promote crystal growth and/or crystal dissolution, thereby providing a patterned crystalline material.
    Type: Grant
    Filed: July 22, 2016
    Date of Patent: February 26, 2019
    Assignee: National Technology & Engineering Solutions of Sandia, LLC
    Inventors: Bryan James Kaehr, Stanley Shihyao Chou
  • BATTERY CELL WITH SAFETY LAYER
    Publication number: 20190058182
    Abstract: A battery cell comprising a composite water-responsive safety layer and/or composite water- and pH-responsive safety layer to protect against tissue damage and/or electrolysis, when the battery cell is exposed to aqueous solution or tissue, is provided.
    Type: Application
    Filed: June 22, 2018
    Publication date: February 21, 2019
    Applicants: DURACELL U.S. OPERATIONS, INC., NATIONAL TECHNOLOGY & ENGINEERING SOLUTIONS OF SANDIA, LLC
    Inventors: Michael Pozin, Walter Fred Paxton, Bryan James Kaehr
  • Method to create gradient index in a polymer
    Patent number: 8859190
    Abstract: Novel photo-writable and thermally switchable polymeric materials exhibit a refractive index change of ?n?1.0 when exposed to UV light or heat. For example, lithography can be used to convert a non-conjugated precursor polymer to a conjugated polymer having a higher index-of-refraction. Further, two-photon lithography can be used to pattern high-spatial frequency structures.
    Type: Grant
    Filed: September 4, 2013
    Date of Patent: October 14, 2014
    Assignee: Sandia Corporation
    Inventors: Shawn M. Dirk, Ross Stefan Johnson, Robert Boye, Michael R. Descour, William C. Sweatt, David R. Wheeler, Bryan James Kaehr