Patents by Inventor Bu Gon Shin

Bu Gon Shin has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8541093
    Abstract: A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d<<D, and the hit ink droplets are flowed in an anisotropic form within the region.
    Type: Grant
    Filed: January 19, 2012
    Date of Patent: September 24, 2013
    Assignee: LG Chem, Ltd.
    Inventors: Tae-Su Kim, Jae-Jin Kim, Bu-Gon Shin, Duk-Sik Ha, Jung-Ho Park
  • Publication number: 20130050798
    Abstract: The present invention relates to a privacy filter and its preparation method and, more particularly to a privacy filter and its preparation method in which the privacy filter comprises: a first transparent substrate; a second transparent substrate positioned a predetermined distance apart from and opposite to the first transparent substrate; an electrolyte filled between the first and second transparent substrates; and a second transparent conductive layer disposed between the electrolyte and the second transparent substrate.
    Type: Application
    Filed: April 22, 2011
    Publication date: February 28, 2013
    Applicant: LG CHEM. LTD.
    Inventors: Jae-Jin Kim, Bu-Gon Shin, Won-Jong Kwon
  • Publication number: 20120212816
    Abstract: Provided are a substrate including a base with a pattern on at least one side thereof, in which a refractive index in a lower region of the pattern and a refractive index in an upper region of the pattern are different from each other according to a shape of the pattern; and a water repellent coating layer provided on at least one side with the pattern of the base, an optical product including the same, and a manufacturing method of the substrate. The substrate according to the present invention has both an excellent anti-reflective property and an excellent water repellent property.
    Type: Application
    Filed: October 28, 2010
    Publication date: August 23, 2012
    Inventors: Tae-Su Kim, Jae-Jin Kim, Bu-Gon Shin, Young-Jun Hong, Hyeon Choi
  • Publication number: 20120183739
    Abstract: There are provided a UV high-transmittance double-layer wire grid polarizer for a photo-alignment film and a method for manufacturing the same. The UV high-transmittance double-layer wire grid polarizer for a photo-alignment film includes: a substrate; an anti-reflection layer disposed on the substrate; a patterned photoresist layer disposed on the anti-reflection layer; and metal thin films disposed on the photoresist layer and the anti-reflection layer.
    Type: Application
    Filed: August 24, 2010
    Publication date: July 19, 2012
    Inventors: Jae-Jin Kim, Sin-Young Kim, Bu-Gon Shin, Tae-Su Kim
  • Publication number: 20120183741
    Abstract: A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d<<D, and the hit ink droplets are flowed in an anisotropic form within the region.
    Type: Application
    Filed: January 19, 2012
    Publication date: July 19, 2012
    Inventors: Tae-Su KIM, Jae-Jin Kim, Bu-Gon Shin, Duk-Sik Ha, Jung-Ho Park
  • Patent number: 8213086
    Abstract: A coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.
    Type: Grant
    Filed: December 28, 2007
    Date of Patent: July 3, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Yeong-Rae Chang, Young-Jun Hong, Young-Eun Lee, Tae-Su Kim, Hyun-Woo Shin, Bu-Gon Shin
  • Patent number: 8113648
    Abstract: A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d<<D, and the hit ink droplets are flowed in an anisotropic form within the region.
    Type: Grant
    Filed: December 5, 2007
    Date of Patent: February 14, 2012
    Assignee: LG Chem, Ltd.
    Inventors: Tae-Su Kim, Jae-Jin Kim, Bu-Gon Shin, Duk-Sik Ha, Jung-Ho Park
  • Publication number: 20120026305
    Abstract: An optical filter for stereoscopic image display device and a stereoscopic image display device may be provided. In one embodiment, the optical filter for stereoscopic image display device may include a plastic substrate; an alignment layer; and a retardation layer, and the stereoscopic image display device may include the optical filter.
    Type: Application
    Filed: October 7, 2011
    Publication date: February 2, 2012
    Inventors: Sin-Young KIM, Moon-Soo Park, Byoung-Kun Jeon, Sang-Choll Han, Bu Gon Shin, Hyuk Yoon
  • Patent number: 8062836
    Abstract: The present invention relates to a method for manufacturing an optical filter for a stereoscopic image display device, which forms an alignment layer having different orientating directions along a fine region via a one-time continuous photo orientation process. The method comprising: forming a polymer layer on a substrate; a photo-orienting step comprising positioning a patterned mask above the polymer layer, the patterned mask having alternating light transmission regions and light shield regions arranged in both horizontal and a vertical directions to selectively transmit different polarized light, positioning a polarizer above the patterned mask where the polarizer has two distinguishable regions that transmit different polarized light, and downwardly irradiating UV light onto the polymer layer from above the polarizer, thereby forming an alignment layer having different orientating directions in fine regions of the polymer layer; and forming a retardation layer on the orientation layer.
    Type: Grant
    Filed: February 2, 2010
    Date of Patent: November 22, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Sin-Young Kim, Moon-Soo Park, Byoung-Kun Jeon, Sang-Choll Han, Bu Gon Shin, Hyuk Yoon
  • Patent number: 8054417
    Abstract: An LCD (Liquid Crystal Display) device includes a backlight unit, a lower polarizer positioned on the backlight unit, a liquid crystal layer positioned on the lower polarizer, and an upper reflection polarizer positioned on the liquid crystal layer. The upper reflection polarizer is configured such that a regularly arranged metallic line lattice is formed on a support. this LCD device may give a good mirror effect when power is intercepted, and also give a clear display with high brightness even at a bright place when power is supplied to operate the LCD device.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: November 8, 2011
    Assignee: LG Chem, Ltd.
    Inventors: Tae-Su Kim, Hyun-Woo Shin, Bu-Gon Shin, Jac-Jin Kim
  • Publication number: 20110217638
    Abstract: The present invention relates to a method for manufacturing an optical filter for a three-dimensional image display device, which forms an alignment layer having different orientating directions along a fine region via a one-time continuous optical orientation process. The method comprising: forming a polymer layer on a substrate; a photo-orienting step comprising positioning a pattern mask above the polymer layer, the pattern mask having alternating light transmission regions and light shield regions arranged in both horizontal and a vertical directions to selectively transmit different polarized light, positioning a polarizer above the pattern mask where the polarizer has two distinguishable regions that transmit different polarized light, and downwardly irradiating UV light onto the polymer layer from above the polarizer, thereby forming an alignment layer having different orientating directions in fine regions of the polymer layer; and forming a retardation layer on the orientation layer.
    Type: Application
    Filed: February 2, 2010
    Publication date: September 8, 2011
    Inventors: Sin-Young Kim, Moon-Soo Park, Byoung-Kun Jeon, Sang-Choll Han, Bu Gon Shin, Hyuk Yoon
  • Publication number: 20110104439
    Abstract: The present invention relates to water-repellent glass including: glass including pores formed to have a diameter of 200 nm or less on a surface; and a water-repellent coating layer disposed at least on one side of the glass, and a method of manufacturing the water-repellent glass.
    Type: Application
    Filed: July 3, 2009
    Publication date: May 5, 2011
    Inventors: Hyeon Choi, Jee-Seon Kim, Jea-Jin Kim, Young-Jun Hong, Bu-Gon Shin, Tae-Su Kim
  • Publication number: 20100213174
    Abstract: A method for manufacturing a glass cliché using laser etching includes a dipping step for dipping a glass cliché, which will be etched, into an etching solution, a patterning step for irradiating laser to the glass cliché dipped in the etching solution to form a pattern therein, and a washing step for washing the patterned glass cliché. This method allows making a cliché with a high aspect ratio and fine line widths in comparison to a conventional cliché manufacturing method using photoresist for etching, and also ensures more efficient energy consumption and higher etching efficiency rather than an etching method using laser only.
    Type: Application
    Filed: September 26, 2008
    Publication date: August 26, 2010
    Inventor: Bu-Gon Shin
  • Publication number: 20100055396
    Abstract: A method for high resolution ink-jet print using a pre-patterned substrate employs an ink-jet printing device including an ink-jet head for discharging conductive ink droplets and a driving stage for supporting a substrate to which the conductive ink droplets are hit, to draw a fine line width pattern on the substrate. The method includes (A) forming a stripe pattern with repeated stripes on a substrate surface on which a fine line width pattern will be formed, thereby preparing a pre-patterned substrate; (B) loading the substrate to the ink-jet printing device; and (C) injecting conductive ink droplets to a substrate region where the stripe pattern is formed. An equivalent interval (d) of the stripe pattern and a fine line width (D) of the drawn fine line width pattern satisfy a relation of d<<D, and the hit ink droplets are flowed in an anisotropic form within the region.
    Type: Application
    Filed: December 5, 2007
    Publication date: March 4, 2010
    Applicant: LG CHEM, LTD.
    Inventors: Tae-Su Kim, Jae-Jin Kim, Bu-Gon Shin, Duk-Sik Ha, Jung-Ho Park
  • Publication number: 20100027146
    Abstract: The present invention relates to a method of manufacturing a color filter, which includes forming a light-shielding portion and a pixel portion on a substrate, and reforming the pixel portion to be ink-philic by using a laser ablation. In the method of manufacturing the color filter, the laser ablation is used to prevent ink particles from being agglomerated in the pixel portion, uniformly filling with the ink, and selectively performing surface reformation of the pixel portion. The color filter manufactured by using the method has desirable pixels without color mixing.
    Type: Application
    Filed: December 6, 2007
    Publication date: February 4, 2010
    Inventors: Hyun-Sik Kim, Bu-Gon Shin, Hyun-Woo Shin, Joon-Hyung Kim
  • Publication number: 20100020272
    Abstract: A LCD (Liquid Crystal Display) device includes a backlight unit, a lower polarizer positioned on the backlight unit, a liquid crystal layer positioned on the lower polarizer, and an upper reflection polarizer positioned on the liquid crystal layer. The upper reflection polarizer is configured such that a regularly arranged metallic lattice is formed on a support this LCD device may give a good mirror effect when power is intercepted, and also give a clear display with high brightness even at a bright place when power is supplied to operate the LCD device.
    Type: Application
    Filed: September 7, 2007
    Publication date: January 28, 2010
    Inventors: Tae-Su Kim, Hyun-Woo Shin, Bu-Gon Shin, Jac-Jin Kim
  • Publication number: 20090315069
    Abstract: Disclosed is a light emitting diode (LED) device that comprises a crystal structure of a sapphire substrate-free gallium nitride (GaN) LED, wherein the crystal structure is mounted on a first surface of a sub-mount substrate in the form of a unit chip, and the first surface of the sub-mount substrate has a surface area greater than the surface area of a region in which the unit chip is bonded. Preforms for manufacturing the LED device and a method for manufacturing the LED device are also disclosed. The sapphire substrate, on which the crystal structure of the light emitting diode has grown, is processed into a unit chip before being removed. Thus, any crack in the crystal structure of the light emitting diode that may occur during the removal of the sapphire substrate can be prevented. Therefore, a thin light emitting diode device can be manufactured in a mass production system.
    Type: Application
    Filed: August 28, 2009
    Publication date: December 24, 2009
    Applicant: HANBEAM CO., LTD.
    Inventors: Jae Seung LEE, Bu Gon SHIN, Min Ho CHOI, Jong Hoon KANG, Min A YU, Byung Du OH
  • Publication number: 20090296219
    Abstract: The present invention provides a coating composition for antireflection that includes a low refraction-thermosetting resin having a refractive index of 1.2 to 1.45, a high refraction-ultraviolet curable resin having a refractive index of 1.46 to 2, and an ultraviolet absorber; an antireflection film manufactured using the coating composition; and a method of manufacturing the antireflection film. The antireflection film according to the present invention has excellent abrasion resistance and antireflection characteristic. Further, since the antireflection film can be manufactured in one coating process, it is possible to reduce manufacturing cost.
    Type: Application
    Filed: December 28, 2007
    Publication date: December 3, 2009
    Inventors: Yeong-Rae Chang, Young-Jun Hong, Young-Eun Lee, Tae-Su Kim, Hyun-Woo Shin, Bu-Gon Shin
  • Patent number: 7576008
    Abstract: Disclosed is a method for manufacturing an optoelectronic semiconductor device having a p-n junction diode, which includes the steps of: (a) etching at least one surface of the p-n junction diode in a depth direction to form a plurality of continuous, isolated or mixed type electrode pattern grooves with a certain array; and (b) filling the formed grooves with a conductive ink containing a transparent conducting particle through an inkjet and then performing heat treatment to form a buried transparent electrode, the optoelectronic semiconductor device, and an apparatus for manufacturing the optoelectronic semiconductor device. In the present invention, covering loss is significantly reduced due to a buried transparent electrode so that the high efficiency of photoelectric conversion can be implemented, and there can be provided the easiness of a manufacturing process and the enhancement of productivity through the unification of etching and electrode forming processes.
    Type: Grant
    Filed: September 26, 2006
    Date of Patent: August 18, 2009
    Assignee: LG Chem Ltd.
    Inventors: Tae Su Kim, Bu Gon Shin, Jae Sung You, Hyun Woo Shin
  • Patent number: 7510951
    Abstract: A patterning method comprising (a) providing a substrate having a sacrificial layer made of a first material, partially or totally formed on the substrate, (b) forming pattern grooves, which are free from the first material and have a line width of a first resolution or lower, on the sacrificial layer by using a first means, by which the sacrificial layer is directly processed to form a line, (c) filling the pattern grooves with a second material to a second resolution by using a second means, to form a pattern of the second material on the substrate. This method provides a high-resolution pattern with little or no waste of the second material, thereby reducing production costs. The method uses first high resolution means, such as focused energy beams of laser, combined with a low resolution means, such as ink-jet, to efficiently provide a high-resolution pattern.
    Type: Grant
    Filed: May 11, 2006
    Date of Patent: March 31, 2009
    Assignee: LG Chem, Ltd.
    Inventors: Dong-Youn Shin, Bu Gon Shin