Patents by Inventor Bum-Young Myoung

Bum-Young Myoung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8206634
    Abstract: Disclosed are a method of manufacturing a light guiding panel by means of carving fine engravings on a surface of a transparent substrate by plasting fine particles and an apparatus for the same. A distributed degree of the engravings gradually increases as they become far away from a light source position. The light guiding panel which has been so manufactured does not need a diffusion sheet and has a good brightness uniformity and a good light effectiveness.
    Type: Grant
    Filed: November 26, 2002
    Date of Patent: June 26, 2012
    Inventor: Bum Young Myoung
  • Patent number: 7453045
    Abstract: Disclosed are a rigid-flexible PCB and a method for fabricating the rigid-flexible PCB. Characterized by using a liquid crystalline polymer for the formation of coverlay over flexible regions, the all-layer processing method has the advantage of preventing interlayer delamination, thereby providing a highly reliable rigid-flexible PCB which thus meets the recent requirements of electric appliances for low energy consumption, high frequency adoption, and slimness.
    Type: Grant
    Filed: May 25, 2006
    Date of Patent: November 18, 2008
    Assignee: Samsung Electro-Mechanics Co. Ltd
    Inventors: Bum-Young Myoung, Dek-Gin Yang, Dong-Kuk Kim
  • Patent number: 7192174
    Abstract: Disclosed is a light guiding plate formed with fine recesses and a backlight unit utilizing the same. There are formed on a bottom surface of a transparent acryl resin substrate a number of fine recesses, which are unable to be distinguished with the naked eye, in order to reflect on front surface of the plate a source light introduced through at least one side surface. The fine recesses are formed by means of a sandblasting process. The amount of the fine recesses jetted per unit hour is uniformly maintained. The number of sands collided into unit area per unit hour and impact energy of the sands are higher the further away from the side through the source light is introduced. Accordingly, density, average depth and average size of the recesses are gradually higher the further away from the light introduced side. Also, area, average complexity of the contour of the recesses and average complexity of the surface profile of the recesses are increased.
    Type: Grant
    Filed: January 1, 2003
    Date of Patent: March 20, 2007
    Assignee: Hunatech Co., Ltd.
    Inventor: Bum Young Myoung
  • Publication number: 20060213683
    Abstract: Disclosed are a rigid-flexible PCB and a method for fabricating the rigid-flexible PCB. Characterized by using a liquid crystalline polymer for the formation of coverlay over flexible regions, the all-layer processing method has the advantage of preventing interlayer delamination, thereby providing a highly reliable rigid-flexible PCB which thus meets the recent requirements of electric appliances for low energy consumption, high frequency adoption, and slimness.
    Type: Application
    Filed: May 25, 2006
    Publication date: September 28, 2006
    Inventors: Bum-Young Myoung, Dek-Gin Yang, Dong-Kuk Kim
  • Patent number: 7084098
    Abstract: Disclosed herein are a brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface, and a method for improving adhesion of a polyimide surface by applying the composition to a brown oxide process. The brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface comprises, 5˜15 g/L of an amine; 190˜210 g/L of a hydroxide compound; at least one additive selected from 3˜6 g/L of a cleaner adjuvant, 0.1˜5 g/L of a antifoaming agent and 1˜10 g/L of a precipitation inhibitor; and the balance of water. When the brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface is applied to a pretreatment step of a brown oxide process, it can clean a copper surface and improve adhesion of a polyimide surface.
    Type: Grant
    Filed: January 15, 2004
    Date of Patent: August 1, 2006
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Bum-Young Myoung, Byoung-Ho Rhee, Yang-Je Lee, Dek-Gin Yang
  • Patent number: 7082679
    Abstract: Disclosed are a rigid-flexible PCB and a method for fabricating the rigid-flexible PCB. Characterized by using a liquid crystalline polymer for the formation of coverlay over flexible regions, the all-layer processing method has the advantage of preventing interlayer delamination, thereby providing a highly reliable rigid-flexible PCB which thus meets the recent requirements of electric appliances for low energy consumption, high frequency adoption, and slimness.
    Type: Grant
    Filed: October 20, 2004
    Date of Patent: August 1, 2006
    Assignee: Samsung Electro-Mechanics Co., Ltd.
    Inventors: Bum-Young Myoung, Dek-Gin Yang, Dong-Kuk Kim
  • Publication number: 20050054548
    Abstract: Disclosed herein are a brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface, and a method for improving adhesion of a polyimide surface by applying the composition to a brown oxide process. The brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface comprises, 5˜15 g/L of an amine; 190˜210 g/L of a hydroxide compound; at least one additive selected from 3˜6 g/L of a cleaner adjuvant, 0.1˜5 g/L of a antifoaming agent and 1˜10 g/L of a precipitation inhibitor; and the balance of water. When the brown oxide pretreatment composition for cleaning a copper surface and improving adhesion of a polyimide surface is applied to a pretreatment step of a brown oxide process, it can clean a copper surface and improve adhesion of a polyimide surface.
    Type: Application
    Filed: January 15, 2004
    Publication date: March 10, 2005
    Inventors: Bum-Young Myoung, Byoung-Ho Rhee, Yang-Je Lee, Dek-Gin Yang
  • Patent number: 6818029
    Abstract: A conditioner for polishing pad and a method for manufacturing the same are disclosed. The conditioner comprises a substrate having formed with a plurality of geometrical protrusions of an uniformed height on at least one of its sides, and a cutting portion having a diamond layer of an uniformed thickness formed substantially on a whole surface of the side of the substrate having the geometrical protrusions. The geometrical protrusions have a flat upper surface or the upper surface may comprise a plurality of smaller geometrical protrusions formed by recessed grooves. The substrate is made from ceramic or cemented carbide materials and has a shape of a disk, a plate having multiple corner, a cup, a segment, or a doughnut with flattened upper and lower surfaces. The conditioner may further comprise a body portion being fixedly attached to the substrate at a side opposite to the side having formed with geometrical protrusions for linking the cutting portion to conditioning equipment.
    Type: Grant
    Filed: October 11, 2002
    Date of Patent: November 16, 2004
    Assignee: Hunatech Co., Ltd.
    Inventors: Bum Young Myoung, Su Nam Yu
  • Patent number: 6699106
    Abstract: A conditioner for polishing pad and a method for manufacturing the same are disclosed. The conditioner includes a substrate having formed with a plurality of geometrical protrusions of an uniformed height on at least one of its sides, and a cutting portion having a diamond layer of an uniformed thickness formed substantially on a whole surface of the side of the substrate having the geometrical protrusions. The geometrical protrusions have a flat upper surface or the upper surface may comprise a plurality of smaller geometrical protrusions formed by recessed grooves. The substrate is made from ceramic or cemented carbide materials and has a shape of a disk, a plate having multiple corner, a cup, a segment, or a doughnut with flattened upper and lower surfaces. The conditioner may further include a body portion being fixedly attached to the substrate at a side opposite to the side having formed with geometrical protrusions for linking the cutting portion to conditioning equipment.
    Type: Grant
    Filed: August 14, 2002
    Date of Patent: March 2, 2004
    Assignee: Hunatech Co., Ltd.
    Inventors: Bum Young Myoung, Su Nam Yu
  • Publication number: 20030114094
    Abstract: A conditioner for polishing pad and a method for manufacturing the same are disclosed. The conditioner includes a substrate having formed with a plurality of geometrical protrusions of an uniformed height on at least one of its sides, and a cutting portion having a diamond layer of an uniformed thickness formed substantially on a whole surface of the side of the substrate having the geometrical protrusions. The geometrical protrusions have a flat upper surface or the upper surface may comprise a plurality of smaller geometrical protrusions formed by recessed grooves. The substrate is made from ceramic or cemented carbide materials and has a shape of a disk, a plate having multiple corner, a cup, a segment, or a doughnut with flattened upper and lower surfaces. The conditioner may further include a body portion being fixedly attached to the substrate at a side opposite to the side having formed with geometrical protrusions for linking the cutting portion to conditioning equipment.
    Type: Application
    Filed: August 14, 2002
    Publication date: June 19, 2003
    Applicant: Hunatech Co., Ltd.
    Inventors: Bum Young Myoung, Su Nam Yu
  • Publication number: 20030036341
    Abstract: A conditioner for polishing pad and a method for manufacturing the same are disclosed. The conditioner comprises a substrate having formed with a plurality of geometrical protrusions of an uniformed height on at least one of its sides, and a cutting portion having a diamond layer of an uniformed thickness formed substantially on a whole surface of the side of the substrate having the geometrical protrusions. The geometrical protrusions have a flat upper surface or the upper surface may comprise a plurality of smaller geometrical protrusions formed by recessed grooves. The substrate is made from ceramic or cemented carbide materials and has a shape of a disk, a plate having multiple corner, a cup, a segment, or a doughnut with flattened upper and lower surfaces. The conditioner may further comprise a body portion being fixedly attached to the substrate at a side opposite to the side having formed with geometrical protrusions for linking the cutting portion to conditioning equipment.
    Type: Application
    Filed: October 11, 2002
    Publication date: February 20, 2003
    Applicant: Hunatech Co., Ltd.
    Inventors: Bum Young Myoung, Su Nam Yu
  • Patent number: 6439986
    Abstract: A conditioner for polishing pad and a method for manufacturing the same are disclosed. The conditioner includes a substrate having formed with a plurality of geometrical protrusions of an uniformed height on at least one of its sides, and a cutting portion having a diamond layer or an uniformed thickness formed substantially on a whole surface of the side of the substrate having the geometrical protrusions. The geometrical protrusions have a flat upper surface or the upper surface may comprise a plurality of smaller geometrical protrusions formed by recessed grooves. The substrate is made from ceramic or cemented carbide materials and have a shape of a disk, a plate having multiple corner, a cup, a segment, or a doughnut with flattened upper and lower surfaces. The conditioner may further include a body portion being fixedly attached to the substrate at a side opposite to the side having formed with geometrical protrusions for linking the cutting portion to conditioning equipment.
    Type: Grant
    Filed: March 8, 2000
    Date of Patent: August 27, 2002
    Assignee: Hunatech Co., Ltd.
    Inventors: Bum Young Myoung, Su Nam Yu